Title of Invention	A METHOD OF MARKING THE SURFACE OF A GEMSTONE
Abstract	The present invention relates to a method of marking the surface of gemstone , comprising forming a mark with a focused ion beam , wherin the mark is invisible to the naked eye.

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Diamond Marking Background to the Invention The present invention relates to a method of marking a surface of a diamond or gemstone The mark may be any mark, but the invention is particularly though not exclusively directed to applying an information mark to the diamond or gemstone. The diamond may be for instance an industrial diamond such as a wire-drawing die or diamond optical component, though the invention is of particular interest in marking gemstone diamonds, for instance for applying a mark which is invisible to the naked eye or invisible to the eye using a xlO loupe, when the mark can be applied to a polished facet of the gemstone without detracting from its clarity or color grade When a loupe is used, the visibility is assessed under the internationally accepted conditions for clarity grading, i.e. using a lOx magnifying achromatic, planate loupe under normal light, this being a white diffuse light, not a spot light. The marks can be used to uniquely identify the gemstone by a serial number or as a brand or quality mark In general, the mark should be capable of being viewed under suitable magnification and viewing conditions, and, if applied to a gemstone, should not detract from the value or appearance of the stone and should preferably not exhibit blackening / J There 15 a detailed description of the nature of the marks that can be applied in in which the marks are applied by irradiating a diamond gemstone with ultraviolet laser radiation using a projection mask. It is generally desirable to produce marks of improved resolution and to reduce the time required to apply the marks so that for instance serial numbers can be applied The Inveation According to a first aspect of the present invention, the surface of a diamond or gemstone is marked with a focused ion beam, the mark being invisible to the naked eye The invention extends to a diamond or gemstone which has been marked by the method of the invention, and to apparatus for carrying out the method. The marking can be carried out by direct writing on the diamond or gemstone surface with a focused ion beam. Typically Gallium ions are used, but a beam of other suitable ions may alternatively be used. By limiting the dose, sputtering of carbon atoms can be substantially avoided, sputtering causing direct material removal; this enables a mark to be applied with a good resolution. By limiting the dose, and providing there is sufficient dose, the Incident ions cause disordering of the crystal lattice. In the case of diamond, this converts the diamond to a graphite-like or other non-diamond structure that can then be cleaned, e.g. using an acid or potassium nitrate dissolved in acid, to leave a shallow mark say not less than 10 nm deep and/or not more than 70 nm deep, more preferably say not less than 20 nm deep and/or not more than about 50 nm deep, typically about 30 nm deep, with no evidence of blackening Plasma etching may be used as an alternative to acid cleaning. However, in a preferred embodiment, the disordered layer produced on the diamond or gemstone by the ion beam is removed by means of a powerful oxidizing agent, such as molten potassium nitrate This method allows a mark to be produced at a lower dose and therefore in less time at a given beam current. Alternatively, a lower beam current, giving a smaller spot size may be used to produce marks with higher resolution features, such as diffraction gratings The depth of the lattice disordering is determined by the range of the ions. For 50 keV Gallium, this range is about 30 nm. The minimum dose may be as low as lO"/cm , but \as measure in KCV ; in ion beam arose ions per unit area at the sample surface, during the marking. The beam current may be about 1 nA. and the beam energy not less than about 10 keV or about 30 keV and/or not greater than about 100 keV or about 50 keV, It has been found that if depth of mark is plotted against ion beam dose for a series of "different beam energies, there is an increase of depth of mark with increasing beam energy. Characteristics of the mark may be optimised by selecting from the dose/energy combinations which will result in the desired depth of mark. The region to be marked and/or the surrounding area may be coated with an electrically-conducting layer, for instance gold, prior to forming the mark, so that an electrical connection can be provided before marking with the ion beam, to prevent charging. The thickness of the gold, or other, coating alters the variation of depth of \ \ ^-—— - ■• " beam energy and dose, and may thus be chosen to optimize the mark ti"produced. Other suitable methods to reduce charging may be used. One method is to irradiate the region to be marked with a low energy ion beam, e.g. about 3 to about 10 keV, prior to forming the mark, to modify the diamond surface to cause it to become electrically conductive, the electrical connection being made to that region. In a preferred embodiment, the ion beam used for marking may be used in conjunction with a charge device, such as an electron flood gun, such as that described in US patent number US-4639301, to prevent charging of the diamond surface accordance with a second aspect of the present invention, there is provided a method ranking the surface of a diamond or gemstone, comprising the steps of irradiating at least a potion of said diamond or gemstone to form a damaged or crystal lattice disordered layer thereon, and removing said disordered layer using an oxidizing agent A further advantage of the second aspect of the present invention over acid-cleaning is that no acid fumes are produced and also that spent acid does not have to be disposed of, thereby improving the safety of the process as well as offering environmental and economic benefits. The oxidizing agent is preferably molten potassium nitrate. The diamond or gemstone is preferably covered with potassium nitrate and heated to a temperature of around 380-550 Centigrade for a period of between a few minutes and several hours, preferably approximately one hour In a preferred embodiment, the diamond or gemstone is irradiated with an ion beam as in the first aspect of the present invention, and most preferably a Gallium ion beam The preferred embodiment of the method of the second aspect resulting in a remarkably efficient process, with each incident Gallium ion ultimately resulting in the removal of approximately 2,700 carbon atoms. In most materials other than diamond, this figure would be around 1-10. It is this property of diamond that allows the relatively large structures such as alphanumeric characters covering an area of 0.43 mm by 0 16 mm to be machined in a reasonably economic time of about 10 seconds. The method of the present invention may also be used to mark the surface of a synthetic gemstone, such as the silicon carbide gemstones described in WO 97/09470 Example A diamond gemstone is mounted in a suitable holder and a facet is coated with a layer of gold. The sample is placed in a vacuum chamber equipped with a focused ion beam " source such as supplied by FEI or Micrion, the holder making an electrical connection to the gold layer to prevent the diamond becoming charged. Using a focused beam with a raster scan or similar to scan the beam for instance with electrostatic deflection (as an alternative, the diamond may be moved, but this is less practical), a mark is written on the diamond facet with ions to a dose of lO to lO2/cm2, the ion source being Gallium, the beam current I nA and the beam entirety 30 to 50 keV, The sample is removed from the vacuum chamber and acid cleaned to remove the disordered layer and the gold layer. There is a shallow mark typically about 30 nm deep, with no evidence of blackening, The present invention has been described above purely by way of example, and modifications can be made within the spirit of the invention, which extends to the equivalents of the features described. The invention also consists in any individual features described or implicit herein or shown or implicit in the drawings or any combination of any such features or any generalization of any such features or combination, We Claim: 1. A method of marking the surface of a gemstone, comprising forming a mark with a focused ion beam, wherein the mark is invisible to the naked eye. 2. A method of marking the surface of a gemstone, comprising forming a mark with a focused ion beam whilst substantially avoiding sputtering, wherein the mark is invisible to the naked eye. 3. The method of Claim 1 or 2, wherein the gemstone is a silicon carbide gemstone. 4. A method of marking the surface of a diamond, comprising forming a mark with a focused ion beam, wherein the mark is invisible to the naked eye. 5. A method of marking the surface of a diamond, comprising forming a mark with a focused ion beam whilst substantially avoiding sputtering, wherein the mark is invisible to the naked eye. 6. A method of marking the surface of a gemstone, comprising the steps of irradiating at least a portion of said gemstone to form a disordered layer thereon, and removing said disordered layer using an oxidizing agent. 7. The method of Claim 6, wherein the gemstone is a silicon carbide gemstone. 8. A method of marking the surface of a diamond, comprising the steps of irradiating at least a portion of the diamond to form a disordered layer thereon, and removing said disordered layer using an oxidizing agent. 9. The method of any of Claims 6 to 8, wherein the gemstone or diamond is irradiated using an ion beam. 10. The method of Claim 9, wherein the gemstone or diamond is irradiated using a focused ion beam. 11. The method of Claim 9, wherein the gemstone or diamond is irradiated using a focused ion beam whilst substantially avoiding sputtering. 12. The method of any of Claims 1 to 5, wherein the surface of the gemstone or diamond is irradiated by means of said focused ion beam to form a disordered layer thereon, and said disordered layer is removed using an oxidizing agent. 13. The method of any of Claims 6 to 12, wherein the oxidizing agent is at least one compound in the form Xn Ym where the group X is Li+, Na+, K+, Rb+, Cs+, 0 0 0 or other cation and the group Y is OH", NO3", O2 "., 0 "., CO3 " or other anion; the integers n and m being used to maintain charge balance. 14. The method of any of Claims 6 to 12, wherein the oxidizing agent is potassium nitrate. 15. The method according to any of the preceding Claims, comprising the steps of irradiating at least a portion of a gemstone or diamond with an ion beam to form a disordered layer thereon and removing said disordered layer by substantially covering the disordered layer with molten potassium nitrate. 16. The method of any of Claims 1 to 5, wherein the surface of the gemstone or diamond is irradiated by means of said focused ion beam to form a disordered layer thereon, and said disordered layer is removed using an acid. 17. The method of any of Claims 6 to 12, wherein said disordered layer is removed using an oxidizing agent dissolved in acid. 18. The method of Claim 17, wherein said disordered layer is removed using potassium nitrate dissolved in acid. 19. The method of any of Claims 1 to 5 and 9 to 18, including coating said surface with an electrically-conductive layer prior to forming the mark. 20. The method of Claim 19, wherein the layer is gold. 21. The method of any of Claims 1 to 5 and 9 to 18, wherein the region to be marked is irradiated with a low energy ion beam prior to forming the mark, to modify the diamond surface to cause it to become electrically conductive. 22. The method of any of Claims 1 to 5 and 9 to 28, wherein the region to be marked is simultaneously irradiated using a charge neutralising device. 23. The method of any of Claims 1 to 5 and 9 to 22, wherein the mark is formed at a dose of not more than 10 /cm . 24. The method of Claim 23, wherein the mark is formed at a dose of not more than 1016/CM2 25. The method of any of claims 1 to 5 and 9 to 22, wherein the mark is formed at a dose of not more than 10 /cm . 26. The method of any of claims 1 to 5 and 9 to 22, wherein the mark is formed at a dose of not more than 10 /cm and not less than 10 /cm . 27. The method of any of Claim 1 to and 9 to 22, wherein the mark is formed at a 17 9 1 J. 9 dose of not more than 10 /cm and not less than 10 /cm . 28. The method of any of claims 1 to 5 and 9 to 22, wherein the mark is formed at a dose of not less than 10 /cm . 29. The method of any of the preceding Claims, wherein the depth of the mark is not less than 10 nm. 30. The method of Claim 29, wherein the depth of the mark is not less than 20 nm. 31. The method of any of Claims 1 to 30, wherein the depth of the mark is not greater than 100 nm. 32. The method of Claim 31, wherein the depth of the mark is not greater than 70 nm. 33. The method of Claim 31, wherein the depth of the mark is not greater than 50nm. 34. The method of Claim 31, wherein the depth of the mark is not greater than 30 nm. 35.The method of any of the preceding Claims, wherein the mark comprises characters whose height is 50 microns. 36. The method of any of the preceding Claims, wherein the mark comprises at least one line of a width of 2 to 3 microns. 37. The method of any of the preceding Claims, wherein the mark comprises at least one line the ratio of the width to depth of which is greater than 20: 1. 38. The method of any of the preceding Claims, wherein the mark is an information mark. 39. The method of any of the preceding Claims, wherein the mark is invisible to the eye using a X 10 loupe. 40. The method of any of Claims 4, 5 and 8 to 39, wherein the diamond is a gemstone diamond. 41. The method of any of the preceding Claims, wherein the focused ion beam is moved relative to the gemstone, thereby directly writing on the gemstone. 42. A gemstone which has been marked by the method of any of the preceding Claims. 43. A diamond which has been marked by the method of any of Claims 1 to 42. 44. A method of marking the surface of a gemstone, substantially as herein described in the foregoing Examples. 45. A method of marking the surface of a diamond, substantially as herein described in any of the foregoing Examples

Documents:

1097-mas-1998 abstract.pdf

1097-mas-1998 claims-duplicate.pdf

1097-mas-1998 claims.pdf

1097-mas-1998 correspondence-others.pdf

1097-mas-1998 correspondence-po.pdf

1097-mas-1998 description (complete)-duplicate.pdf

1097-mas-1998 description (complete).pdf

1097-mas-1998 form-19.pdf

1097-mas-1998 form-2.pdf

1097-mas-1998 form-26.pdf

1097-mas-1998 form-4.pdf

1097-mas-1998 form-6.pdf

1097-mas-1998 petition.pdf