Title of Invention | A POLYURETHANE RESIN |
---|---|
Abstract | The present invention relates to a polyurethane resin being the reaction product of at least one diisocyanate and components having isocyanate reactive functional groups,. said components comprising a fIrst group of at least one polyol a second group of at least one polyol and a third group of at least one polyol, and optionally at least one amine and a reaction terminating agent, wherein all polyols of said first group are of an average molecular weight in the range of between 1000 to 10000gimol, wherein all polyols of said second group are of an average molecular weight in excess of 10000 up to 20000 gimol, wherein all polyols of said third group are of an average molecular weight of equal or less than 800 gimol and wherein in particular the ratio of the equivalent weights of the diisocyanate to the components having isocyanate reactive functional groups is selected that all of the isocyanate groups of the diisocyanate are present as the reaction product with one of said isocyanate reactive functional groups. |
Full Text | Het is a 5- or 6-membered heterocyclic ring containing one to three heteroatoms, each independently selected from oxygen, nitrogen and sulphur, provided that the ring is not 1,2,3-triazole, the ring being substituted by groups R4, R5 and R6; R1 and R are each, independently, hydrogen, halo or methyl; R is optionally substituted C2-12 alkyl, optionally substituted C2-12 alkenyl, optionally substituted C2-12 alkynyl, optionally substituted C3-12 cycloalkyl, optionally substituted phenyl or optionally substituted heterocyclyl; R4, R5 and R6 are each, independently, selected from hydrogen, halo, cyano, nitro, C1-4 alkyl, C1-4haloalkyl, C1-4alkoxy(Ci-4)alkylene and C1-4haloalkoxy(Ci-4)alkylene, provided that at least one of R4, R5 and R6 is not hydrogen; and R7 and R8 are each, independently, hydrogen, halogen, C1-4alkyl or C1-4 haloalkyl. 2. A compound of formul (I) as claimed in claim 1 where Het is pyrrolyl, pyrazolyl, thiazolyl, pyridinyl, pyrimidinyl, thienyl, furyl, isothiazolyl or isoxazolyl. 3. A compound of formula (I) as claimed in claim 1 or 2 where R and R are, independently, hydrogen or flupro. 4. A compound of formula (I) as claimed in claim 1,2 or 3 where R3 is C2-6 alkyl, optionally substituted C3-8 cycloalkyl, phenyl, thienyl or furyl. 5. A compound of formula (I) as claimed in claim 1,2, 3 or 4 where R4, R5 and R6 are, independently, selected from hydrogen, halogen, C1-4 alkyl, C1-4haloalkyl and C1-4 alkoxy(Ci-4)alkylene, provided that at least one ofR4,R5andR6 is not hydrogen. 6. A compound formula (II): *i 1 O "7 ft where X and R are as defined in claim 1; and R , R , R and R are each hydrogen. 7. A process for preparing a compound of formula (II) as claimed in claim 6 from a compound of formula (V): where X, R1, R3,R7, R8 and R° are as defined in claim 6, comprising either a transamination reaction of a compound of formula (V) with hydroxylamine hydrochloride in the presence of a base or a hydrolysis reaction of a compound of formula (V) with an acid. 8. A process for preparing a compound of formula (V) as defined in claim 7 from a compound of formula (IV): X-Br (IV) where X, R1, R2, R3, R7 and R8 are as defined in claim 6, comprising tris-dibenzylidenacetondipalladium-catalysed reaction of a compound of formula (IV) with benzophenonimine in the presence of a strong base and a ligand in a solvent at a temperature between 30°C and reflux temperature. 9. A composition for controlling microorganisms and preventing attack and infestation of plants therewith, wherein the active ingredient is a compound of formula (I) as claimed in claim 1 together with a suitable carrier. 10. A method of controlling or preventing infestation of cultivated plants by phytopathogenic microorganisms by application of a compound of formula (I) as claimed in claim 1 to plants, to parts thereof or the locus thereof. Dated this 29 day of April 2005 |
---|
0784-chenp-2004 abstract duplicate.pdf
0784-chenp-2004 claims duplicate.pdf
0784-chenp-2004 description(complete) duplicate.pdf
784-chenp-2004-assignement.pdf
784-chenp-2004-correspondnece-others.pdf
784-chenp-2004-correspondnece-po.pdf
784-chenp-2004-description(complete).pdf
784-chenp-2005-correspondnece-others.pdf
784-chenp-2005-correspondnece-po.pdf
784-chenp-2005-description(complete).pdf
Patent Number | 228813 | ||||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Indian Patent Application Number | 784/CHENP/2004 | ||||||||||||
PG Journal Number | 12/2009 | ||||||||||||
Publication Date | 20-Mar-2009 | ||||||||||||
Grant Date | 11-Feb-2009 | ||||||||||||
Date of Filing | 16-Apr-2004 | ||||||||||||
Name of Patentee | SIEGWERK BENELUX N V | ||||||||||||
Applicant Address | RIJKSWEG 10, 2880 BORNEM, | ||||||||||||
Inventors:
|
|||||||||||||
PCT International Classification Number | C08G 18/12 | ||||||||||||
PCT International Application Number | PCT/EP2002/00813 | ||||||||||||
PCT International Filing date | 2002-01-26 | ||||||||||||
PCT Conventions:
|