Title of Invention | "A PROCESS FOR THE PREPARATION OF CHIRAL POLYMER METERIAL" |
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Abstract | The present relates to a chiral polymer material for EM wave attenuation and the process for the preparation thereof. A chiral polymer material is obtained, by copolymerizing synthesized chiral monomer with a vinyl monomer in an organic solvent. The chiral monomer is obtained by condensation reaction of an ethylenically unsaturated acid chloride with a chiral amine compound in presence of an alkali. The chiral monomer and the vinyl monomer are co-polymerized by free radical polymerization process using a thermal radical initiator in an inert atmosphere. |
Full Text | We claim: 1. A process for the preparation of a chiral polymer material, comprising the following steps: a) condensing an ethylenically unsaturated acid chloride of the formula: with a chiral amine compound of the formula : (Formula Removed) Wherein R= H, CH3) C2H5 R1 and R2 is C1-C4 alkyl group or phenyl or substituted phenyl or naphthyl and R1=R2 in presence of an alkali; b) pouring the reaction mixture of step (a) in distilled water and recrystallizing the reaction mixture to obtain the colourless crystal of chiral monomer of the formula (Formula Removed) Wherein R= H, CH3, C2H5 R1 and R2 is C1-C4 alkyl group or phenyl or substituted phenyl or naphthyl and R1=R2; c) copolymerizing the chiral monomer obtained in step (b) with a vinyl monomer in an organic solvent, wherein the vinyl monomer is selected from methyl methacrylate, ethyl methacrylate, 2-hydroxy ethyl methacrylate, ethyl acrylate, 2-hydroxy ethyl acrylate and butyl acrylate, in 1: 0.5-1: 8.8 mole ratio preferably 1:1 mole ratio in a hydrocarbon solvent by free radical polymerization process using a thermal radical initiator at 60-100° C in an inert atmosphere preferably nitrogen; and d) precipitating the reaction mixture obtained from step (c) in a non- solvent to obtain the chiral polymer material. 2. The process as claimed in claim 1 wherein the chiral polymer material is obtained in a form of white powder. 3. The process as claimed in claim 1 wherein the chiral copolymer material exhibit preferably optical rotation of +92° at 589 nm wave length. 4. The process as claimed in claim 1 wherein, the hydrocarbon solvent is selected from group consisting of xylene, toluene and heptane. 5. The process as claimed in claim 1 wherein, said alkali is an alkali metal hydroxide or triethyl amine. 6. The process as claimed in claim 1 wherein, said thermal radical initiator is selected from group consisting of benzoyl peroxide (BPO), tertiary- butyl hydroperoxide and 2, 2'-azo-bis- isobutyronitrile (AIBN). 7. A chiral polymer material for EM wave attenuation obtained by polymerizing synthesized chiral monomer as claimed in claim 1 having the formula- (Formula Removed) Wherein R= H, CH3, C2H5 R1 and R2 is C1-C4 alkyl group or phenyl or substituted phenyl or naphthyl and R1=R2; with a vinyl monomer in an organic solvent, wherein the vinyl monomer is selected from methyl methacrylate, ethyl methacrylate, 2-hydroxy ethyl methacrylate, ethyl acrylate, 2-hydroxy ethyl acrylate and butyl acrylate. |
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1265-DEL-2005-Abstract-(07-07-2011).pdf
1265-DEL-2005-Claims-(07-07-2011).pdf
1265-del-2005-Claims-(20-04-2011).pdf
1265-DEL-2005-Correspondence Others-(07-07-2011).pdf
1265-del-2005-Correspondence-Others-(20-04-2011).pdf
1265-DEL-2005-Form-1-(07-07-2011).pdf
1265-DEL-2005-Form-2-(07-07-2011).pdf
1265-DEL-2005-GPA-(07-07-2011).pdf
Patent Number | 249885 | ||||||||||||
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Indian Patent Application Number | 1265/DEL/2005 | ||||||||||||
PG Journal Number | 47/2011 | ||||||||||||
Publication Date | 25-Nov-2011 | ||||||||||||
Grant Date | 21-Nov-2011 | ||||||||||||
Date of Filing | 17-May-2005 | ||||||||||||
Name of Patentee | DIRECTOR GENERAL, DEFENCE RESEARCH & DEVELOPMENT ORGANIZATION (DRDO) | ||||||||||||
Applicant Address | MINISTRY OF DEFENCE, GOVT. OF INDIA, WEST BLOCK-VIII, WING 1, SECTOR-1,R.K.PURAM, NEW DELHI-110066, INDIA. | ||||||||||||
Inventors:
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PCT International Classification Number | C08F2/00 | ||||||||||||
PCT International Application Number | N/A | ||||||||||||
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PCT Conventions:
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