Title of Invention

A DISPERSION OF TITANIUM OXIDE PARTICLES, A TITANIUM OXIDE THIN FILM FORMED THEREFROM AND A SOLUTION FOR FORMING AN ORGANIC FUNCTIONAL FILM

Abstract

A dispersion of titanium oxide particle which can form a fine organic thin film having impurities and can be a titanium oxide thin film forming material, a titanium oxide thin film formed from the dispersion, a solution for forming an organic functional film obtained by adding a metallic compound solution having a hydrolyzable group in the dispersion, a substrate having an organic functional film formed thereon which is obtained by using the Solution, and a production method thereof are provided. A dispersion of a titanium oxide particle obtained by adding water to an organic solvent solution of titanium chelate compound composed of a hydrolyzable group or a hydroxyl group and a chelate ligand bonding to a titanium atom, in which the amount of the water is five-fold or more by mole to the titanium chelate compound, a titanium oxide thin film formed by contacting this dispersion with the substrate surface composed of plastics or the like, a solution for forming organic functional film obtained by adding the dispersion in the organic solvent solution of metallic compound having hydrolyzable group, a method for producing a substrate having an organic functional film formed thereon which is obtained by using this solution for forming an organic functional film are provided.

Full Text

DISPERSION OF TITANIUM OXIDE PARTICLES, TITANIUM OXIDE THIN FILM, SOLUTION FOR FORMING ORGANIC FUNCTIONAL FILM, SUBSTRATE HAVING ORGANIC FUNCTIONAL FILM FORMED THEREON, AND METHOD FOR PRODUCING THE SAME Technical Field [0001] The present invention relates a dispersion of titanium oxide particles obtained by adding excess amount of water to an organic solvent solution containing a titanium chelate compound and a method for producing the same. Also, the present invention relates to a titanium oxide thin film formed from the dispersion, a solution for forming an organic functional film obtained by adding a metallic compound solution having a hydrolyzable group to the dispersion, and a substrate having the organic functional film formed thereon obtained by using this solution and a method for producing the same. Priority is claimed to Japanese application No. 2005-037616, filed February 15, 2005, and Japanese application No. 2005-273905, filed September 21, 2005, which are incorporated herein by reference. Background of the Invention [0002] The biodification of surfaces of substrates composed of glass, metal, plastic, ceramics and so forth has been carried out for many purposes in various fields in the prior art. For exajmple, a fluorine-containing silane coupling agent has been coated onto a glass or plastib surface to impart water repellency and oil repellency thereto. [0003] Examples of methods for forming a coating film for modifying a substrate surface are described in Patent document 1, which discloses a method for forming a chemically adsorbed film covalently bonded by means of siloxane bonds by contacting a mixed solution containing at least an alkoxysilane surfactant, a non-aqueous solvent free of active hydrogen, and a silanol condensation catalyst with a substrate surface. Examples of the silanol condensation catalyst disclosed therein include at least one substance selected from the group consisting of a carboxylic acid metal salt, carboxylic acid ester metal salt, carboxylic acid metal salt polymer, carboxylic acid metal salt chelate, titanic acid ester, and titanic acid ester chelate. [0004] However, these methods had problems such as film formation requiring a long period of time, and the silanol condensation catalyst inhibiting adsorption if film formation is Carried out with the catalyst still present in the solution, thereby preventing the formation of a fine monolayer. Thus; there has been a desire for the development of a technology for rapidly forming a fine monolayer having few impurities in fields such as fine patterning for the design of electrical devices in particular. [0005] Relating to the present invention, Patent document 2 discloses a composition for forming a transparent ceramics coating in which an acetyl acetonate compound is uniformly dissolved or dispersed in a mixed solvent composed of water and an organic solvent. The art in this document shows a composition for forming a transparent ceramics coating which has high durability and is mar-proof to a substrate surface such as glass, plastics, or the like, can control the refractive index or the dielectric constant freely, and can be cured at a low temperature. [0006] Also, Patent document 3 discloses a composition for a coating obtained by mixing (a) an organosilane represented by the general formula RxSi(ORy)3, in which Rx represents an organic group having 1 to 8 carbon atoms and Ry represents an alkyl group having 1 to 5 carbon atoms (b) an organosilane represented by the general formula (Rx)2Si(ORy)2, in which Rx and Ry represent the same as described above, (c) at least one type selected from the group consisting of at least one type of metal alcoholate selected from the group consisting of the general formula Zr(ORz)4, Ti(ORz)4, and Al(ORz)3, in which Rz represents an alkyl group having 2 to 5 carbon atom, a chelate compound obtained by reacting the metal alcoholate and β-diketones and/or β-ketoesters, and a partial hydrolysate obtained by reacting the chelate compound with water, (d) hydrophilic organic solvent, and (e) water and co-condensation the above component (a) and the abbve component (b). The art in this document shows a composition for a coating in order to form a coating which has excellent water resistance, chemical resistance, crack resistance, weather resistance, and adhesive properties on the surface of the metal or plastics. [0007] Non-Patent document 1 discloses a solution having a composition of i Ti(OPr)3(acac)/PriOH/EtOKH=1/1/3 obtained by treating Ti(OPri)4 with acetyl acetone (acacH) followed by diluting with ethanol, this solution being a stabile photo-sensitive colloid solution, having a particle size of the colloid included in the solution of 30 to 60A. [0008] Also; non-Patent document 2 discloses a method in which a solution including a compound represented by Ti(OPr')4-x(L)x is obtained by adding a chelate agent such as acetyl acetone to Ti(OPr')4 solution, and dispersion of fine particles of titanium oxide is obtained by adding of a two-fold water equivalents to titanium atoms into the solution. [0009] However, the above Patent documents 2 and 3 and non-Patent documents 1 and 2 do not disclose that dispersion of titanium oxide particles suitable for forming a titanium oxide thin film is obtained by adding excess amount of water (five-fold or more equivalents to titanium atom). [0010] [Patent document 1] Japanese Laid-Open Patent Application No. H8-337654 [Patent document 2] Japanese Laid-Open Patent Application No. H2-048403 [Patent document 3] Japanese Patent publication Nos. 22924081 [Non-Patent document 1] Mat. Res. Symp. Proc., Vol. 121, P317-322, 1988 [Non-Patent document 2] Bull. Korean. Chem. Soc., Vol. 20, No. 12, 1999 Summary of the Invention [0011] In consideration of these circumstances, an object of the present invention is to provide a dispersion of titanium oxide particles capable of rapidly forming a fine organic thin film having few impurities and being a material for forming a titanium oxide thin film and a method for producing the same, a titanium oxide thin film formed from this dispersion, a solution for forming an organic functional film obtained by adding a solution of a metallic compound having a hydrolyzable group into the dispersion, and a substrate having an orginic functional film formed thereon which is obtained by using this solution and a method for producing the same. [0012] In order to solve the aforementioned problems, the inventors of the present invention extensively studied a method for forming a coating film on the surface of substrate by using an organic solvent solution containing (partial) hydrolysis products of titanium alkoxide. As a result, the inventors of the present invention found that excess amount of water to the titanium chelate compound can be added to the organic solvent solution including titanium chelate compound to obtain a dispersion in which fine particles of titanium oxide having a particle size of 1-20 nm are uniformly dispersed and this dispersion is applied on a substrate surface and dried to form a fine titanium oxide thin film having few impurities with speed and ease. [0013] Also, the inventors found that the dispersion and a solution of a metallic compound having a hydrolyzable group can be mixed in a prescribed ratio to obtain a solution for forming an organic functional film which is capable of quickly forming an organic functional film with suitable for a photo lithography method or the like and an organic functional film can be formed on a substrate with ease and efficiency by using this solution, and thus completed the present invention. [0014] According to a first aspect, dispersion of titanium oxide particles of the following (1) to (12) are provided. (1) dispersion of titanium oxide particle is obtained by mixing a titanium chelate compound formed by bonding a hydrolyzable group or hydroxyl group and a chelate ligand to a titanium atom and five-fold or more by mole of water to the titanium chelate compound, wherein the content of the titanium oxide is within the range of 0.1 to 10 % by weight as titanium oxide to the whole dispersion. (2) the dispersion according to (1), wherein the titanium oxide particles are a fine particles having the average particle size of 1 to 20 nm. (3) the dispersion according to (1) or (2), wherein the content of the titanium oxide is within the range of 0.1 to 5% by weight as titanium oxide to the whole dispersion. [0015] (4) the dispersion according to (1) to (3), wherein the titanium oxide particles have amphipathicity. (5) the dispersion according to (1) to (4), wherein the amount of mixed water is ten-fold or more by mol to the titanium chelate compound. (6) the dispersion according to (1) to (5), wherein the hydrolyzable group is an optionally substituted alkoxyl group. (7) the dispersion according to any one of (1) to (6), wherein the titanium chelate compound is represented by the formula (I), [0016] [Chemical Formula 1] [0017] | wherein X represents chelate ligand, R1 represents an optionally substituted alkoxyl group nl represents an integer of 1 to 3, when n 1 is 2 or more, R1 may be the same or different, and when (4-nl) is 2 or more, X may be the same or different. [0018] (8) aj dispersion of titanium oxide particles is obtained by mixing a solution obtained by adding a prescribed amount of a chelate compound to an organic solvent solution of titanium alkoxide compound and five-fold or more by mole of water to the titanium alkoxide compound. (9) the dispersion according to (8) , wherein the amount of the mixed water is ten-fold or moire by mole to the titanium alkoxide compound. (10) the dispersion according to (8) or (9), wherein the organic solvent is water-miscible solvent. (11) the dispersion according to (10), wherein the water-miscible solvent is a solvent including alcohols. [0019] According to a second aspect, methods for producing dispersion of the following (12) and (13) are provided. (12) a method for producing the dispersion of any one of (1) to (11) includes adding a prescribed amount of a chelate compound to an organic solvent solution of titanum alkoxide compound and further adding five-fold or more by mole of water to the titanum alkoxide compound. (13) the method for producing dispersion according to (12), wherein the amount of water added is ten-fold or more by mole to the titanum alkoxide compound. [0020] According to a third aspect, titanium oxide thin films of the following (14) to (26) are provided. (14) a titanium oxide thin film is formed by contacting the dispersion of any one of (1) to (11) with a surface of a substrate. (15) the titanium oxide thin film according to (14), wherein a film thickness is 500 nm or less. (16) the titanium oxide thin film according to (14) or (15), wherein the substrate is made of plastics. [0021] (17) the titanium oxide thin film according to any one of (14) to (16), wherein an organic material contacting with the thin film can be decomposed/removed by photo irradiation. (18) the titanium oxide thin film according to (17), wherein the organic material contacting with the thin film is a monolayer. (19) the titanium oxide thin film according to (18), wherein the monolayer is made of a silicon compound. [0022] (20) the titanium oxide thin film according to any one of (14) to (19), wherein the titanium oxide thin film becomes a hydrophilic film having the water contact angle of 20° or less by photo irradiation. (21) the titanium oxide thin film according to any one of (17) to (20), wherein an irradiation light using photo irradiation is ultraviolet rays. (22) the titanium oxide thin film according to (21), wherein an irradiation light using photo irradiation is ultraviolet rays having a wavelength of 250 to 350 nm. [0023] (23) the titanium oxide thin film according to any one of (17) to (22), wherein the amount of irradiation light is 40J/cm2 or less. (24) the titanium oxide thin film according to any one of (14) to (23), wherein the titanium oxide thin film includes an organic material. (25) me titanium oxide thin film according to any one of (14) to (24), wherein the content of carbon element is within the range of 2 to 40%. (26) the titanium oxide thin film according to any one of (14) to (25), wherein the average surface roughness Ra is 1 nm or less. [0024] Accoirding to a fourth aspect, solutions for forming an organic functional film of the following (24) to (40) are provided. (27) a solution for forming an organic functional film includes a metallic compound having a hydrolyzable group or hydroxyl group and a dispersion of any one of (l)to(ll). (28) the solution for forming an organic functional film according to (27), wherein the metallic compound is used in two-fold or more by mole to 1 mole of the titanium compound included in the dispersion. i (29) a solution for forming an organic functional film is obtained by mixing an organic solvent solution of a metallic compound having a hydrolyzable group or hydroxyl group, a solution of titanium chelate compound having a hydrolyzable group or hydroxyl group and a chelate ligand, and five-fold or more by mole of water to the total number of moles of the titanium chelate compound and metallic compound. [0025] (30) the solution for forming an organic functional film according to (29), wherein the mixed water is ten-fold or more by mole to the total number of moles of the titanium chelate compound and the metallic compound. (31) the solution for forming an organic functional film according to (29) or (30), wherein the hydrolyzable group of the titanium chelate compound is an optionally substituted alkoxyl group. (32) the solution for forming an organic functional film according to any one of (29) to (31), wherein the metallic compound is used in two-fold or more by mole to 1 mole of the titanium chelate compound. [0026] (33) the solution for forming an organic functional film according to any one of (29) to (32), wherein the total content of the titanium chelate compound and the metallic compound is within the range of 0.1 to 10% by weight as metal oxide. (34) a solution for forming organic functional film is obtained by mixing a solution obtained by adding a chelate compound and metallic compound having a hydrolyzable group to an organic solvent solution of titanium alkoxide compound in respectively prescribed amount and five-fold or more by mole of water to the total number of moles of the titanium alkoxide compound and metallic compound. (35) the solution for forming an organic functional film according to (34), wherein the amount of the mixed water is ten-fold or more by mole to the total number of moles of the titanium alkoxide compound and metallic compound. [0027] (36) the solution for forming an organic functional film according to any one of (27) to (35), wherein a metal of the metallic compound is at least one kind selected from the group consisting of titanium, zirconium, aluminum, silicon, germanium, indium, tin, tantalum, zinc, tungsten, and lead. (37) the solution for forming an organic functional film according to any one of (27) to (36), wherein the hydrolyzable group of the metallic compound is an optionally substituted alkoxyl group. (38) the solution for forming an organic functional film according to any one of (27) to (37), wherein the metallic compound is represented by the formula (II), [0028] [Chemical Formula 2] [0029] in which R2 represents an optionally substituted hydrocarbon group, optionally substituted halogenated hydrocarbon group, hydrocarbon group including a linking group, or a halogenated hydrocarbon group including a linking group, M represents at least a metal atom selected from the group consisting of a silicon atom, germanium atom, tin atom, titanium atom, and zirconium atom, R3 represents an optionally substituted alkoxyl group, m represents valence of M, n2 represents an integer of 0 to (m-1), when n2 is 2 or more, R2 may be the same or different, and when (m-1) is 2 or more, R3 may be the same or different. (39) the solution for forming an organic functional film according to any one of (27) to (38), Wherein the organic solvent is a water-miscible solvent. (40) the solution for forming an organic functional film according (39), wherein the organic solvent includes alcohols. [0030] According to the fifth aspect, substrates having the organic functional film formed thereon of the following (41) and (52) are provided. (41) a substrate having an organic functional film formed thereon has an organic thin film formed by contacting a solution for forming an organic functional film of any one of (27) to (40) with a substrate surface. (42) the substrate having an organic functional film formed thereon according to (41), wherein the substrate has a titanium oxide thin film formed from the dispersion of any one of (1) to (11). (43) the substrate having an organic functional film formed thereon according to (41) or (42), wherein the substrate is made of at least one kind selected from the group consisting of metal, ceramics, glass, and plastics. [0031] (44) the substrate having an organic functional film formed thereon according to (41) to (43), wherein the substrate is made of plastics. (45) the substrate having an organic functional film formed thereon according to any one of (41) to (44), wherein an organic material contacting with the organic functional film can be decomposed and/or removed by photo irradiation (46) the substrate having an organic functional film formed thereon according to any one of (41) to (45), wherein the organic functional film becomes a hydrophilic film having a water contact angle of 20° or less by photo irradiation. [0032] (47) the substrate having an organic functional film formed thereon according to (45) or (46), wherein an irradiation light using photo irradiation is ultraviolet rays. (48) the substrate having an organic functional film formed thereon according to (47), wherein an irradiation light using photo irradiation is ultraviolet rays having wavelength of 250 to 350 nm. (49) the substrate having an organic functional film formed thereon according to (47) or (48), wherein the amount of the irradiation light is 40 J/cm2 or less. [0033] (50) the substrate having an organic functional film formed thereon according to any one of (41;) to (49), wherein the organic functional film includes an organic material. (51) the substrate having an organic functional film formed thereon according to any one of (41) to (50), wherein the content of carbon element in the organic functional film is within the range of 2 to 40%. (52) the substrate having an organic functional film formed thereon according to any one of (41) to (51), wherein a film thickness of the organic functional film is 500 nm or less. [0034] According to a sixth aspect, a method for producing a substrate having an organic functional film formed thereon of the following (53) is provided. (53) a method for producing a substrate having an organic functional film formed thereon of any one of (41) to (52), wherein the organic functional film is formed on the titanium oxide thin film by contacting the substrate having the titanium oxide thin film formed thereon in which the titanium oxide thin film of any one of (14) to (26) is formed with the solution for forming an organic functional film of any one of (27) to (40). [0035] According to dispersion of titanium oxide particles of the present invention, a fine particle of titalnium oxide having an average particle size of nanometer-order is dispersed stably in the water solvent. The dispersion of the present invention is stable and is almost not changed even if left at room temperature for 3 months. The dispersion of the present invention can form a titanium oxide thin film which is a fine monolayer having few impurities with speed and ease. Also, the dispersion of titanium oxide particles of the present invention is useful as material for forming an organic functional film of the present invention. [0036] According to the solution for forming an organic functional film of the present invention, an organic functional film suitable for a photolithography method or the like can be formed: on the substrate with ease and speed. The substrate having an organic functional film formed thereon of the present invention includes an organic functional film formed on a substrate and is suitable for use for photolithography method. Brief Description of the accompanying Drawings [0037] FIG. 1 is a graph showing the particle size distribution of a titanium oxide particle included in A-3 solution. FIG. 2 is a graph showing the TG-DTA analysis result of powder obtained by drying the A-3 solution in a vacuum at room temperature. FIG. 3 is a graph showing a measurement result of zeta potential of the A-3 solution. FIG. 4 is observation graphs of a substrate by scanning probe microscopy before and after coating A-3 solution, (a) is an observation graph showing a surface of a polyester substrate before coating A-3 solution, (b) is an observation graph showing a surface of a thin film formed from A-3 solution. FIG. 5 is a graph showing an XPS analysis result of element distribution of thin film (C-1) formed by using A-1 solution. FIG. 6 is a graph showing an XPS analysis result of element distribution of thin film (C-8) formed by using A-4 solution. FIG.7 is a graph showing an XPS analysis result of element distribution of thin film (CH-1) formed by using H-1 solution. FIG. 8 is a graph showing an XPS analysis result of element distribution of thin film (CH-2) f6rmed by using CH-2 solution. Detailed Description of the Invention [0038] The following provides a detailed explanation of the present invention. 1) Dispersion of titanium oxide particles The first aspect of the present invention provides dispersion of titanium oxide particles obtained by mixing a titanium chelate compound, in which a hydrolyzable group and chelate ligand are bonded to a titanium atom, and excess amount of water to the titanium chelate compound. [0039] There is no particular limitation on the titanium chelate compound used in the present invention, provided that the titanium compound is formed by bonding a hydrolyzable group and chelate ligand to a titanium atom. [0040] A valence value of the titanium atom as a center metallic atom is normally 2 to 4 and preferably 4. There is no particular limitation on the hydrolyzable group, provided the group is decomposed by reacting with water. Specific hydrolyzable groups include an optionally substituted alkoxyl group, optionally substituted acyloxy group, halogen group, isocyanate group, cyano group, amino group, amide group, and the like. [0041] Examples of the optionally substituted alkoxyl group include a methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, sec-butoxy group, t-butoxy group, n-pentyloxy group, n-hexyloxy group, and the like. [0042] Examples of the optionally substituted acyloxy group include an acetoxy group, propionyloxy group, n-propylcarbonyloxy group, isopropylcarbonyloxy group, n-butylcarbonyloxy group, and the like. Examples of the substituent of the alkoxyl group and acyloxy group include a halogen group, carboxyl group, amide group, imide group, ester group, hydroxyl group, and the like. Examples of the halogen atom include a fluorine atom, chlorine atom, bromine atom, and iodine atom. [0043] Among them, an optionally substituted alkoxyl group, optionally substituted acyloxy group, halogen atom, or isocyanate group is preferable, an optionally substituted alkoxyl group is more preferable, and an alkoxyl group having 1 to 4 carbon atom is particularly preferable. [0044] There is no limitation on the chelate ligand, provided that the ligand can form a chelate by bonding metal. A neutral ligand and anion may be included. The chelate ligand may bond to a metallic atom on at least one part and may be a unidentate ligand or polydentate ligand. For example, in the case of a bidentate ligand, the bidentate ligand may not bond to one metallic atom. [0045] Specific examples of the chelate ligand include the following ligands. The following examples are described as chelate compounds capable of being chelate ligands. Specific examples of the chelate ligand include saturated aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, or sebacic acid; β-diketone such as acetylacetone, benzoyl acetone, or hexafluoro acetyl acetone; p-ketoesters such as methyl acetoacetate or ethyl acetoacetate; glycols such as ethylene glycol; glycol acids such as oxy acetic acid; nitrogen-including compounds such as ethylenediaminetetraacetato (EDTA) and sodium salt thereof, ethylenediamine, 1,3-propanediamine, diethylentriamine, pentamethyldiethylenetriamine, hexamethyltriethylenetetramine, tris[2-(dimethylamino)ethyl]amine, or tri(pyridinylmethyl)amine; [0046] other heterocyclic compounds such as furan carboxylic acid, thiophene carboxylic acid, nicotinic acid, isonicotinic acid, phenanthroline, diphenanthroline, substituted phenanthroline, 2,2':6',2"- terpyridine, pyridine imine, cross-1inking aliphatic diamine, 4-4'-di(5-nonyl)-2,2'-bipyridine, bipyridine coordinated with O, S, Se, or Te, alkyliminopyridine, alkylbipyridinylamine, alkyl substituted tripyridine, di(alkyIamino)alkylpyridine, or ethylenediaminedipyridine; and [0047] sulfur-including compounds such as mercapto alcohols such as 2-mercapto ethanol; dithiols such as ethane dithiol; mercapto amines such as 2-mercapto ethyl amine; or dithioketones such as 2,4-pentanedithione. These compounds can be used alone or two or more types can be used in combination. [0048] Preferable specific examples of the titanium chelate compound include one kind or two or more kinds of a compound represented by the formula (I). In the formula (I), R1 represents an optionally substituted alkoxyl group and X represents a chelate ligand. Specific examples of R1 include the same examples as the optionally substituted alkoxyl group of the hydrolyzable group previously described. Specific examples of X include the same examples as the chelate ligand previously described. [0049] n1 represents an integer of 1 to 3. n1 is preferably 1 for forming an organic thin film having high density. When nl is 2 or more, R1 may be the same or different. When (4-n1) is 2 or more, X may be the same or different. [0050] There is no limitation on a method for producing a titanium chelate compound and, for example, a method for adding a prescribed amount of chelate compound to an organic solvent solution of titanium alkoxide compound, as described later, and the like are included. The amount of chelate compound used is usually 1 to five-fold by mol and preferably 1 to three-fold by mol to 1 mol of titanium alkoxide compound. [0051] There is no limitation on the water used for adjusting the dispersion of the present invention, provided that the water is neutral. In view of obtaining a fine titanium oxide thin film haying few impurities, it is preferable to use pure water, distilled water, or ion-exchanged water. [0052] The amount of water used is excessive to the titanium chelate compound, and the specifically amount of water used is five-fold or more by mole, preferably ten-fold or more by mole, and more preferably twenty-fold or more by mole, to the titanium chelate compound. Also, the maximum amount of water used is determined according to the concentration of titanium chelate compound in dispersion to be adjusted. For example, in the case of adjusting dispersion having a concentration of 0.1% or more, the amount of water used is iten thousand-fold or less by mole and preferably five thousand-fold or less by mole to the titanium chelate compound. In the case of adjusting dispersion having a concentration of 0.1% or less, the maximum amount of water used is more. [0053] The water used may be diluted by an organic solvent. Also, the water may be added at once, may be added stepwise, and may be continuously added in a constant amount. [0054] Examples of the organic solvent used include the same examples as an organic solvent used as a solution of the titanium chelate compound described later. [0055] By mixing the titanium chelate compound and an excess amount of water, a hydrolysis reaction of titanium chelate compound is begun. Examples of the method for mixing the titanium chelate compound and an excess amount of water include a method for adding water to an organic solvent solution of the titanium chelate compound or a method for adding an organic solvent solution of the titanium chelate compound to water. [0056] There is no limitation on the organic solvent used in the organic solvent solution of the titaniurn chelate compound, for example, alcohols such as methanol, ethanol, or iso propanol; halogenated hydrocarbons such as methylene chloride, chloroform, or chlorobenzene; hydrocarbons such as hexane, cyclohexane, benzene, toluene, or xylene; ethers such as tetrahydrofuran, diethylether, or dioxane; ketones such as acetone, methylethylketone, or methylisobutylketone; amides such as dimethyl formamide or N-methyl pyrrolidone; sulfoxides such as dimethyl sulfoxide; silicones such as methylpolysiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentanesiloxane, methylphenylpolysiloxane, dimethylsilicone, phenylsilicone, alkyl-modified silicone, or polyethersilicone (Japanese Laid-Open Patent Application No. H9-208438); frons; and carbon fluorides such as CBr2ClCF3, CClF2CF2CCl3, CClF2CF2CHFCl, CF3CF2CHCl2, CF3CBrFCBrF2, CClF2CClFCF2CCl3, Cl(CF2CFCl)2Cl, Cl(CF2CFCl)2CF2CCl3, Cl(CF2CFCl)3Cl. [0057] Among them, because a hydrolysis reaction of titanium chelate compound or the like progresses with ease, a fine titanium oxide thin film can be uniformly formed, and dispersion which does not solidify at low temperature can be obtained, a water-miscible solvent is preferable and a solvent including alcohols is more preferable. [0058] Examples of the solvent including alcohols include a solvent consisting of at least one kind of alcohol or mixed solvent consisting of alcohols and another organic solvent, and a mixed solvent consisting of alcohols and another organic solvent is preferable. [0059] As the mixed solvent consisting of alcohols and another organic solvent, a mixed solvent which combines hydrocarbons such as toluene or xylene and lower alcohols such as methanol, ethanol, isopropanol, or t-butanol is preferable. Although there is no limitation on the mixing ratio of the mixed solvent, the mixing ratio of hydrocarbons and lower alcohols is preferably whithin the range of 99/1 to 50/50 by volume. [0060] There is no particular limitation on the concentration of the titanium chelate compound in the organic solvent, provided that the concentration is within the range in which rapid exothermic heat is inhibited when adding water and the organic solvent has flow properties capable of stirring. The concentration is preferably within the range of 1 to 50% by weight and more preferably the range of 5 to 30% by weight. [0061] Although a reaction temperature for the hydrolysis reaction of the titanium chelate compound depends on the reactivity, stability, or the like of the used titanium chelate compound, the reaction temperature is usually within the range of -100°C to the reflux temperature of the organic solvent used and preferably within the range of -20°C to room temperature. Also, the hydrolysis reaction and dehydration condensation reaction may be further conducted by raising the temperature of the reacting solution from room temperature to the reflux temperature of the solvent used following adding water to a solution of titanium chelate compound at a lower temperature and aging for a certain time. [0062] The stirring time is usually from several minutes to several hours. In this case, it is preferable to conduct ultrasonic wave treatment in order to obtain uniform dispersion. [0063] In addition, an acid, base, or dispersiontabilizer may be added during the hydrolysis reaction of the titanium chelate compound with water. There are no particular limitations on the acid or base, provided that it functions as a dispersing agent for redispersing coagulated precipitate, a catalyst for producing a dispersoid such as colloidal particles by hydrolyzing and dehydrating/condensing the titanium chelate, or a dispersant for the formed dispersoid. [0064] Examples of acids used include inorganic acids such as hydrochloric acid, nitric acid, boric acid or fluoroboric acid; organic acids such as acetic acid, formic acid, oxalic acid, carbonic acid, trifluoroacetic acid, p-toluenesulfonic acid or methanesulfonic acid; and, photoacid generators which generate acid by photoirradiation of diphenyliodinium hexafluorophosphate, triphenylphosphonium hexafluorophosphate, or the like. [0065] Examples of used bases include triethanolamine, triethylamine, l,8-diazabicyclo[5.4.0]-7-undecene, ammonia, dimethylformamide, phosphine, and the like. [0066] Dispersion stabilizers indicates agents having the effect of stably dispersing a dispersoid in a dispersion medium, examples of which include dispersing agents, protective colloids, and anticoagulation agents such as surfactants. Specific examples include multivalent carboxylic acids such as glycolic acid, gluconic acid, lactic acid, tartaric acid, citric acid, malic acid or succinic acid; hydroxycarboxylic acids; phosphoric acids such as pyrophosphoric acid or tripolyphosphoric acid; polydentate ligand compounds having a strong chelating ability with respect to metal atoms such as acetyl acetone, methyl acetoacetic acid, ethyl acetoacetic acid, n-propyl acetoacetic acid, isopropyl acetoacetic acid, n-butyl acetoacetic acid, sec-butyl acetoacetic acid, t-butyl acetoacetic acid, 2,4-hexanedione, 2,4-heptane-dione, 3,5-heptane-dione, 2,4-octane-dione, 2,4-nonane-dione or 5-methyl-hexane-dione; fatty acid amines, hydrostearic acids or polyester amines such as Solsperse 3000, 9000, 17000, 20000 or 24000 (all of the above are products of Zeneca Corp.) or Disperbyk-161, -162, -163 or -164 (all of the above are products of BYK-Chemie Corp.); and silicone compounds such as dimethylpolysiloxane-methyl(polysiloxyalkylene)siloxane copolymer, trimethylsiloxysilicic acid, carboxy-modified silicone oil or amine-modified silicone (see, for example, Japanese Laid-Open Patent Application No. H9-208438 and 2000-53421). [0067] The content of titanium oxide in the dispersion of the present invention is within the range of 0.1 to 10% by weight and preferably the range of 0.1 to 5% by weight as titanium oxide to the total dispersion. [0068] The dispersion of the present invention is a dispersion of titanium oxide particles in which the fine particles of titanium oxide being the hydrolysis product of the titanium chelate compound have the property of stably dispersing without aggregating in water solvent or organic solvent. Here, the state of stably dispersing without aggregating refers to the state in which a dispeirsoid of a hydrolysis product such as titanium chelate is not coagulated or non-uniformly separated in an organic solvent and preferably refers to a transparent, uniform state. In addition, transparent refers to the state of having high transmittance in visible light, and more specifically, refers to a state represented in terms of spectral transmittance as measured under conditions of a dispersoid concentration of 0.5% by weight as oxide, a quartz cell optical path length of 1 cm, the use of an organic solvent for the contrastive sample, and a! light wavelength of 550 nm, and preferably refers to transmittance of 80 to 100%. [0069] The titanium oxide particles included in the dispersion of the present invention preferably have amphipathic property. In other words, the particles of the titanium oxide preferably have affinity for water solvent and organic solvent in order to obtain uniformly stable dispersion. A dispersion including such titanium oxide particles provides a titanium oxide thin film in the form of a uniform film in which water is not repelled when coating on a substrate, even if the water content exceeds 50% by weight to the total dispersion. [0070] There is no particular limitation on a particle size of a titanium oxide particles included in the dispersion of the present invention, although the range is normally 1 to 100 nm, preferably 1 to 50 nm, and more preferably 1 to 20 nm. Also, a distribution of titanium oxide particles is preferably monodispersed. [0071] Dispersion of the present invention has excellent keeping quality. In other words, an average particle size of the included titanium oxide particles is almost unchanged and dispersion do not become clouded, even after the dispersion of the present invention is kept stoppered tightly for 3 months at room temperature. Also, a titanium oxide thin film in the form of a uniform film can be obtained if dispersion which has been kept for 3 months is used. [0072] The dispersion and thin film of the present invention are fine and sensitive, has few impurities, and therefore can be used for an inorganic film for pattern formation, a surface treatment film for printing plates, groundwork inorganic film for forming a SAM film, LCD, PDP, SED (Surface Conduction Electron Emission Display); functional film used for various displays such as electronic paper, such as an insulating film, oriented film, reflection film, or anti-reflection film; optical film such as a high refraction film for an anti-reflection film, or a low refraction film, a film for a semiconductor element, a photocatalyst film and precursor film thereof; an ink adhesion improvement film, formations such as modified films of plastics surfaces, groundwork materials which improve wettability and adhesion for forming these films, adhesion agents, hardening agents or crosslinking agents for paint or coating agents, a reaction catalyst such as an ester or the like, a production in an obscure glass, in which the glass substrate is coated, binders such as antimicrobial or mildewproofing agents, a carrier, or the like. The dispersion of the present invention is useful as production materials of the titanium oxide thin film and organic functional film of the present invention as described later. [0073] 2 ) Method for producing dispersion of the present invention The second aspect of the present invention provides a method for producing dispersion of the present invention including mixing a solution obtained by adding prescribed chelate compound to an organic solvent solution of titanium alkoxide compound and an excess amount of water to the titanium alkoxide compound. According to this method, a titanium alkoxide compound which is easily available can be used to produce the dispersion of the present invention with ease and effect. [0074] Examples of the titanium alkoxide compound of the present invention include a titanium alkoxide, hydrolysis product of titanium alkoxide, or composite alkoxide including a titanium atom, and the like. [0075] Specific examples of titanium alkoxide include Ti(OCH3)4, Ti(OC2H5)4, Ti(OC3H7-i)4, Ti(OC4H9)4, Ti[OSi(CH3)3]4, Ti[OSi(C2H5)3]4, and the like. These titanium alkoxides can be used alone or two or more types can be used in combination. [0076] A hydrolysis product of titanium alkoxide is a compound obtained by hydrolyzing all or part of titanium alkoxide with water. The amount of water used in order to obtain a partially hydrolysis product of titanium alkoxide is two-fold or more equivalents to the titanium alkoxide. [0077] Examples of the composite alkoxide include (i) a composite alkoxide obtained by reacting titanium alkoxide with metal alkoxide and (ii) a composite alkoxide obtained by reacting one kind or two or more kinds of titanium alkoxide with one kind or two or more kinds of metallic salt. [0078] Examples of (i) a composite alkoxide obtained by reacting titanium alkoxide with a metal alkoxide include a composite alkoxide and the like obtained by reacting an alkoxide of alkali metal or alkali earth metal with titanium alkoxide. Specific examples of a composite alkoxide of (i) include BaTi(OR)6, SrTi(OR)6, and the like, in which R represents an alkyl group or the like. [0079] Examples of a metallic salt used for synthesis of a composite alkoxide of (ii) include metallic chloride, nitrate, sulfate, acetate, formate, oxalic acid salt, and the like. Examples of the metal of metallic salt include metals of group 1 to 14 in the periodic law (long period type). [0080] There is no particular limitation on the chelate compound used in the present invention, provided that a compound is capable of coordination with a titanium atom. Particular examples include the same examples of a chelate compound capable of being a chelate ligand of the titanium chelate compound. The amount of chelate compound added is normally one- to five- fold by mole and preferably one- to three- fold by mole to 1 mole of the titanium atom. [0081] There is no particular limitation on an organic solvent used in the present invention, although specific examples of the organic solvents include alcohols such as methanol, ethanol or isopropanol; halogenated hydrocarbons such as methylene chloride, chloroform or chlorobenzene; hydrocarbons such as hexane, cyclohexane, benzene, toluene or xylene; ethers such as tetrahydrofuran, diethylether or dioxane; ketones such as acetone, methyl ethylketone or methylisobutylketone; amides such as dimethylformamide or N-methylpyrrolidone; sulfoxides such as dimethylsulfoxide; silicones such as methylpolysiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentane siloxane or methylphenylpolysiloxane (see, for example, Japanese Laid-Open Patent Application No. H9-208438); frons; and fluorinated carbons such as CBr2ClCF3, CClF2CF2CCl3, CClF2CF2CHFCl, CF3CF2CHCl2, CF3CBrFCBrF2, CClF2CClFCF2CCl3) Cl(CF2CFCl)2Cl, Cl(CF2CFCl)2CF2CCl3, or Cl(CF2CFCl)3Cl. [0082] Of these, the organic solvent used is preferably a water-miscible solvent and more preferably a solvent including alcohol because the hydrolysis reaction of the titanium chelate compound or the like easily progresses, a fine uniform titanium oxide thin film can be formed, and dispersion which does not solidify at low temperature can be obtained. [0083] Examples of the solvent including the alcohols include solvents consisting of one or more kinds of alcohols or a mixed solvent consisting of alcohols and other organic solvent and a mixed solvent consisting of alcohols and other organic solvent is preferable. [0084] The solvent consisting of alcohols and other organic solvent is preferably a mixed solvent combining hydrocarbons such as toluene or xylene and a lower alcohol such as methanol, ethanol, isopropanol, or t-butanol. There is no particular limitation on the mixing ratio of the mixed solvent, although the mixing ratio of a hydrocarbon solvent and lower alcohol solvent is preferably within the range of 99/1 to 50/50 by volume. [0085] There is no particular limitation on the water used, provided that water is neutral, although it is preferable that pure water, distilled water, or ion-exchanged water be used in view of obtaining a fine titanium oxide thin film having few impurities. [0086] The water may be diluted by an organic solvent. Also, the water may be added at once, may tie added stepwise, and may be continuously added in a constant amount. Examples of organic solvents used herein include the same examples as the organic solvent dissolving the titanium alkoxide compound. [0087] The amount of water used is excessive to the titanium alkoxide compound, and the specific amount of water used is five-fold or more by mole, preferably ten-fold or more by mole, and more preferably twenty-fold or more by mole, to the titanium chelate compound or titanium alkoxide compound. Also, the maximum amount of water used is determined according to the concentration of titanium chelate compound in dispersion to be adjusted. For example, in the case of adjusting dispersion having a concentration of 0.1% or more, the amount of water used is ten thousand-fold or less by mole and preferably five thousand-fold or less by mole to the titanium chelate compound. In the case of adjusting dispersion having a concentration of 0.1% or less, the maximum amount of water used is greater. [0088] Examples of the method for mixing the solution obtained by adding a chelate compound to an organic solvent solution of titanium alkoxide compound and water include a method for adding water or water diluted with an organic solvent to the solution obtained by adding a chelate compound to an organic solvent solution of a titanium alkoxide compound and a method for adding a solution obtained by adding a chelate compound to an organic solvent solution of titanium alkoxide compound to water or organic solvent in which water is suspended or dissolved, although the former is preferable because of obtaining a hydrolysis product of the target product with high yield. [0089] It is conceivable that a chelate compound be added to an organic solvent solution of titanium alkoxide compound to obtain an organic solvent solution of a titanium chelate compound and an excess amount of water be added to this solution to start the hydrolysis reaction of titanium chelate compound or the like. [0090] Although a reaction temperature of this hydrolysis reaction depends on reactivity, stability, or the like of the titanium alkoxide compound or chelate compound used, the reaction temperature is generally within the range of-100°C to the reflux temperature of the organic solvent used and preferably in the range of-20°C to room temperature. Also, the hydrolysis reaction and dehydration condensation reaction may be further conducted by raising the temperature of the reacting solution from room temperature to the reflux temperature of the solvent used following adding water to the solution obtained by adding the chelate compound to the organic solvent solution of titanium alkoxide at a lower temperature and aging for a certain time. [0091] The stirring time is usually from several minutes to several hours. In this case, it is preferable to conduct ultrasonic wave treatment in order to obtain a uniform solution for forming an organic thin film. Also, when conducting the hydrolysis reaction with water in which water is added to a solution obtained by adding a chelate compound to an organic solvent solution of titanium alkoxide compound, acid, base, or dispersion stabilizer may be added. Specific examples of acid, base, or dispersion stabilizer include the same examples as acid, base, or dispersion stabilizer which can be added when conducting the hydrolysis reaction of titanium chelate compound with water. [0092] As described above, a dispersion of titanium oxide particles of the present invention can be obtained. Also, in the present invention, the dispersion of the present invention can be produced by the method in which the titanium chelate compound is isolated from the solution obtained by adding the chelate compound to the organic solvent solution of titanium alkoxide compound, the isolated titanium chelate compound is re-dissolved in the organic solvent, and water is added. [0093] Although insoluble materials may be separated in the prepared dispersion, these separation materials can be removed by conducting filtration, decantation, or the like to obtain uniform dispersion. [0094] 3) Titanium oxide thin film The third aspect of the present invention provides a titanium oxide thin film which is formed by contacting the surface of the substrate including at least one kind selected from the group consisting of metals, ceramics, glass, and plastics with the dispersion of the present invention. [0095] The substrate used in the present invention is preferably a substrate consisting of at least one kind selected from the group consisting of metal, ceramics, glass, and plastics and a substrate consisting of plastics is preferable. [0096] Although there is no limitation on plastics, examples of the plastics include polyimide, polyamide, polyamideimide, polyphenyleneether, polyetherketone, polyetheretherketone, polyolefin, polyester, polycarbonate, polysulphone, polyether sulphone, polyphenylenesulfide, polyallylate, acrylic-series resin, cyclolefin-series polymer, aromatic-series polymer, and the like. [0097] Although there is no limitation on the substrate used of the present invention, a substrate having an active hydrogen such as a hydroxyl group or the like on the surface may be used for the purpose of improving adhesion properties with a thin film. [0098] Although there is no limitation on the method for contacting dispersion of the present invention with the substrate surface, generally known methods may be adopted. Specific examples of the method include a dipping method, spin coating method, spray method, roller coating method, mayer bar coater method, screen printing method, brush coating method, and the like. [0099] The titanium oxide thin film of the present invention can decompose and/or remove an organic compound contacting with the thin film by photoirradiation. Although there is no limitation on the organic compound contacting with this thin film, a monolayer is effective because high-speed decomposition can proceed. Especially, silicon compound such as a silane-series surfactant or the like is effective, because a self-assembled monolayer is formed on the titanium oxide thin film. [0100] Although examples of the method for forming a monolayer of the organic compound include various methods such as a vapor phase evaporation method, method of chemical adsorption from a solution in which an organic compound is dissolved, or LB method, any method may be used. [0101] When using the method of chemical adsorption from a solution, there is no limitation on a temperature used to contact the solution with the substrate surface, provided that the temperature is within the range that maintains the stability of the solution. The temperature is normally within the range of room temperature to reflux temperature of the organic solvent used. It is acceptable to heat the dispersion or the substrate itself in order to set the preferable temperature for contact. [0102] Also, after contacting the dispersion of the present invention with the substrate i surface, an ultrasonic wave may be used in order to facilitate film formation. The step of contacting the substrate surface may be conducted for a long time at once or may be divided into several short-time applications. [0103] After forming the monolayer, a cleaning step may be performed in order to remove excess agent, impurities, or the like adhered on the film surface. By providing the cleaning step, the film thickness can be further controlled. [0104] There is no limitation on the cleaning step, provided that the step can remove an I adhered material. Examples of the method include a method for immersing a substrate in a solvent able to dissolve the titanium chelate compound; a method for leaving the substrate under a vacuum or normal pressure to vaporize the adhered material; a method for spraying With inactive gas such as dried nitrogen gas and blowing out the adhered material; and the like. [0105] After contacting the dispersion of the present invention with the substrate or cleaning the substrate, it is preferable to heat the substrate in order to stabilize the film formed on the substrate surface. The heating temperature can be determined according to the kind of substrate, the stability of the formed monolayer, or the like. [0106] Although a mechanism for forming the monolayer of silicon compound is not obvious in detail, it is assumed that the surface is coated by forming the rigid band of Ti-O-Si after silicon compound physically adsorbs or chemically adsorbs to a titanium oxide thin film having active hydrogen on the surface. [0107] Although there is no limitation on film thickness of the titanium oxide thin film of the present invention obtained as above, the film thickness is normally 500 nm or less, preferably 1 to 100 nm, and more preferably 5 to 50 nm. [0108] The titanium oxide thin film of the present invention is preferably a thin film including an Organic compound and more preferably a thin film having a carbon element content of 2 to 40%. [0109] Also, a titanium oxide thin film of the present invention has excellent flatness. The average roughness Ra of the titanium oxide thin film is 2 nm or less and preferably 1 nm or less. Therefore, a flat organic functional film can be formed on this titanium oxide thin film as described later. [0110] A titanium oxide thin film generally has thin film properties which are changed by photoirradiation. It is preferable that the titanium oxide thin film of the present invention be a photocatalytically active film which can decompose and/or remove an organic compound contacting with the titanium oxide thin film by photoirradiation. [0111] The irradiation light using the photoirradiation is preferably ultraviolet rays and more preferably ultraviolet rays having a wavelength of 250 to 350nm. The amount of the irradiation light is 40 J/cm2 or less and preferably 5 J/cm2 or less. [0112] The titanium oxide thin film of the present invention is preferably a hydrophilic film having a Water contact angle of 20 ° or less by photoirradiation. When the titanium oxide thin film of the present invention has these properties, a resist film with a prescribed pattern can be formed and a specific part of the titanium oxide thin film can be changed to be a hydrophilic thin film by photoirradiation with a prescribed pattern. [0113] The titanium oxide thin film of the present invention is quickly formed on the substrate surface by using the dispersion of the present invention and is a fine film having few impurities regardless of a kind of substrate used. [0114] These titanium oxide thin films can be applied to design patterns for forming electric devices or the like, electronic products, and especially ultra thin film coating such as for electric appliances, automobiles, industrial equipment, mirrors, eyeglass lenses, or the like which require heat resistance, resistance to weather, and abrasion resistance, as well as a photocatalyst film. Also, as described later, this titanium oxide thin film is coated with an organic functional film by using a solution for forming an organic functional film or the like to act as a photo catalyst layer and conduct photo lithography with ease. [0115] 4) Solution f6r forming organic functional film The fourth aspect of the present invention provides a solution for forming an organic functional film obtained by adding the dispersion of the present invention to the organic solvent solution of a metallic compound having a hydrolyzable group. [0116] There is no limitation on a metallic compound used in the present invention, provided that the metallic compound has at least one hydrolyzable group. There is no limitation on the hydrolyzable group, provided that the hydrolyzable group can be decomposed by reacting with water. Specific examples include an optionally substituted alkoxyl group optionally substituted acyloxy group; a halogen atom such as a fluorine atom, chlorine atom, bromine atom, iodine atom, or the like; isocyanate group; cyano group; amino group; amide group; and the like. [0117] These specific examples include the same specific examples as the hydrolyzable group of the titanium chelate compound. Among them, an optionally substituted alkoxyl i group is preferable. Specific examples of an optionally substituted alkoxyl group include the same specific examples as the optionally substituted alkoxyl group of the titanium chelate compound. [0118] Although there is no limitation on the metal of the metallic compound used in the present invention, examples include at least one kind selected from the group consisting of titanium, zirconium, aluminum, silicon, germanium, indium, tin, tantalum, zinc, tungsten, and lead. [0119] Among them, the metallic compound used in the present invention is preferably the compound represented by formula (II). In the formula (II), R2 represents an optionally substituted hydrocarbon group, optionally substituted halogenated hydrocarbon group, hydrocarbon group including a linking group, or halogenated hydrocarbon group including a linking group. [0120] Examples of the base hydrocarbon group in the optionally substituted hydrocarbon group include an alkyl group having 1 to 30 carbon atoms such as a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, n-pentyl group, isopentyl group, neopentyl group, t-pentyl group, n-hexyl group, isohexyl group, n-heptyl group, n-octyl group, n-decyl group, n-octadecyl group, or the like; alkenyl group having 2 to 30 carbon atoms such as vinyl group, propenyl group, butenyl group, pentenyl group, n-decynyl group, n-octadecynyl group, or the like; and aryl group such as phenyl group, or naphthyl group. [0121] Examples of the base halogenated hydrocarbon group of the optionally substituted halogenated hydrocarbon group include a halogenated alkyl group having 1 to 30 carbon atoms, halogenated alkenyl group having 2 to 30 carbon atoms, halogenated aryl group, and the like. Specific examples include a group in which at least one hydrogen atom in the exemplified hydrocarbon group is substituted with a halogen atom such as a fluorine atom, chlorine atom, bromine atom, or the like. [0122] Among them, the group in which two hydrogen atoms or more in the alkyl group having 1 to 30 carbon atoms are substituted with a halogen atom is preferable and a fluorinated alkyl group in which two hydrogen atoms or more in the alkyl group having 1 to 30 carbon atoms are substituted with a fluorine atom is more preferable. Also, when the fluorinated alkyl group has a branched structure, the branched portion has preferably 1 to 4 carbon atoms and more preferably a short chain having 1 to 2 carbon atoms. [0123] A fluorinated alkyl group is preferably the group in which one fluorine atom or more bonds to the terminal carbon atom and more preferably the group in which three fluorine atoms bond to the terminal carbon atoms i.e., the group having a CF3 group, especially preferably is the group having perfluoro alkyl portion at a terminal portion in which all hydrogen atoms of the alkyl group are substituted with fluorine atoms and having an alkylene group represented by -(CH2)h- (wherein, h represents an integer of 1 to 6 and preferably 2 to 4) between the metal atom M described later and the terminal portion. When the number of fluorine atoms in the fluorinated alkyl group is expressed as [(the number of fluorine atoms in the fluorinated alkyl group)/(the number of hydrogen atom existing in alkyl group having the same number of carbon atoms as the fluorinated alkyl group) 100]%, the number is preferably 60% or more and more preferably 80% or more. [0124] Examples of the substituent of the optionally substituted hydrocarbon group or optionally substituted halogenated hydrocarbon group include a carboxyl group; amide group; imide group; ester group; alkoxyl group such as methoxy group, ethoxy group, or the like; and hydroxyl group. The number of these substituent is preferably 0 to 3. [0125] Specific examples of the base hydrocarbon group in the hydrocarbon group including a linking group include the same examples as the base hydrocarbon group of the optionally substituted hydrocarbon group. Specific examples of the base halogenated hydrocarbon group in the halogenated hydrocarbon group including a linking group include the same examples as the base halogenated hydrocarbon group of the optionally substituted halogenated hydrocarbon group. [0126] The linking group exists preferably between a carbon-carbon bond of the hydrocarbon group or the halogenated hydrocarbon group or between the carbon atom of the hydrocarbon group and the metal atom M described later. Specific examples of the linking group include -0-, -S-, -S02-,-CO-,-C(=0)0-, or -C(=0)NR -, wherein R represents an alkyl group such as a hydrogen atom; methyl group, ethyl group, n-propyl group, isopropyl group, or the like. [0127] Among them, R is preferably an alkyl group having 1 to 30 carbon atoms, fluorinated alkyl group having 1 to 30 carbon atoms, or fluorinated alkyl group having a linking group in view of water repellency and durability. [0128] to these. [0131] M represents at least one kind of metal atom selected from the group consisting of a silicon atom, germanium atom, tin atom, titanium atom, and zirconium atom, and a silicon atom is especially preferable. [0132] R3 represents an optionally substituted alkoxyl group. Specific examples of the optionally substituted alkoxyl group include the same as listed in the above paragraph of the optionally substituted alkoxyl group of the titanium chelate compound. [0133] m represents the valence of M. n2 represents an integer of 0 to (m-1) and when n2 is 2 or more, R2 may be the same or different and when (m-1) is 2 or more, R3 may be the same or different. [0134] A compound represented by the formula (II) is more preferably a compound represented by the formula (III). [0135] [0136] In formula, M, R , m, and n2 represent the same as described above. R4 and R5 represent independently a hydrogen atom or fluorine atom. [0137] R6 represents an alkylene group, vinylene group, ethynylene group, arylene group, or dihydric linking group including a silicon atom and/or oxygen atom. Specific examples of R6 are described as follows. [0138] ; [Chemical Formula 4] [0139] Wherein, a and b represent arbitrary natural numbers. W represents a hydrogen atom; alkyl group such as a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, n-pentyl group, isopentyl group, neopentyl group, t-pentyl group, n-hexyl group, isohexyl group, or the like; alkoxyl group such as a methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, sec-butoxy group, t-butoxy group, n-pentyloxy group, n-hexyloxy group, or the like; a fluorine-including alkyl group in which all or part of the hydrogen atoms of the alkyl group are substituted with a fluorine atom; or fluorine-including alkoxyl group in which all or part of the hydrogen atoms of the alkoxyl group are substituted with a fluorine atom; and the like. [0140] n2 is preferably 0 in order to form an organic thin film with a high density. When n2 is 2 or more, W may be the same or different and when (m-n2-1) is 2 or more, R may be the same or different. Also, p represents 0 or an integer and q represents 0 or 1. [0141] Preferable specific examples of the metallic compound are shown as follows. Although the; compounds in which the metallic atom is a silicon atom are shown as representative examples, the metallic compounds are not limited to those compounds. [0142] [0147] In order to prepare the solution for forming an organic functional film of the present invention, an organic solvent, water, and titanium chelate compound can be the same as the organic solvent, water, and titanium chelate as described in the above paragraph "dispersion", respectively. [0148] In the solution for forming an organic functional film of the present invention, the amount of the metallic compound used is two-fold or more by mole to 1 mole of titanium compound included in the dispersion. Also, the amount of metallic compound used which is two-fold or more by mole is thousand-fold or less by mole at maximum, preferably hundred-fold or less by mole, and more preferably twenty-fold or less by mole. [0149] In the solution for forming an organic functional film, the total content of titanium oxide and metallic compound preferably is 0.1 to 10% by weight as metallic oxide. [0150] The solution for forming an organic functional film of the present invention is, as described above, obtained by (a) adding the prescribed amount of dispersion of the present invention to an organic solvent solution of metallic compound having a hydrolyzable group. [0151] Also, the solution for forming an organic functional film of the present invention may be obtained by a method (b) of adding the prescribed amount of titanium chelate compound to the organic solvent solution of the metallic compound having a hydrolyzable group and excess amount of water to the metallic compound and the titanium chelate compound or a method (c) of adding the prescribed amount of the chelate compound and metallic compound to the organic solvent solution of the titanium alkoxide compound and excess amount of water to the metallic compound and titanium alkoxide compound. [0152] In the method (b), the dispersion of the present invention is prepared within the system in the presence of the metallic compound having a hydrolyzable group. Also, in the method (c), the titanium chelate compound is prepared within the system in the presence of the metallic compound having a hydrolyzable group and the dispersion of the present invention is prepared within the system by adding excess amount of water. [0153] In the method (b), the amount of water added is excessive, preferably five-fold or more by mole, more preferably ten-fold or more by mole, and particular preferably twenty-fold of more by mole to the total moles of the titanium chelate compound and the metallic compound. Also, the amount of water used is determined according to the density of the titanium chelate compound in the dispersion to be prepared, for example, when the dispersion has the density of 0.1% or more, the amount of water used is ten thousand-fold or less by mole and preferably five thousand-fold or less by mole to the titanium chelate compound. When the dispersion has the density of 0.1% or less, the maximum amount of the water is more. [0154] In the method (c), the amount of water added is excessive, preferably five-fold or more by mole, more preferably ten-fold or more by mole, and particular preferably twenty-fold or more by mole to the total moles of the titanium alkoxide compound and the metallic compound. Also, the amount of water used is determined according to the density of the titanium chelate compound in the dispersion to be prepared, for example, when the dispersion has the density of 0.1% or more, the amount of water used is ten thousand-fold or less by mole and preferably five thousand-fold or less by mole to the titanium chelate compound. When the dispersion has the density of 0.1% or less, the maximum amount of water is more. [0155] By adding water, the hydrolysis reaction and hydrolysis condensation polymerization can be started. Usually this reaction proceeds smoothly by adding water or water diluted with an organic solvent to an organic solvent solution of a metallic compound and titanium chelate compound. Also, the reaction may proceed by adding an organic solvent solution of a metallic compound and titanium chelate compound or a metallic compound and titanium chelate compound to an organic solvent in which water is suspended or dissolved. [0156] The reaction conditions such as reaction temperature, reaction time, or the like, can be the same as when preparing the dispersion of the present invention. Also in the reaction solution, the same acid, base, or dispersion stabilizer as described above may be added to conduct the reaction. [0157] 5) Substrate having organic functional film formed thereon and production method thereof The fifth aspect of the present invention provides a substrate having an organic functional film formed thereon which has an organic thin film formed from the solution for forming the organic functional thin film of the present invention on the substrate surface. [0158] The substrate having an organic functional film formed thereon of the present invention can be produced by contacting the solution for forming an organic functional film with the Substrate surface or the side of the titanium oxide thin film forming substrate where the titanium oxide thin film is formed. [0159] A method for forming an organic functional film by contacting the solution for forming an organic functional film can use the same method as for forming the titanium oxide thin film on the substrate surface. [0160] Although there is no limitation on the substrate used, examples of the substrate include the same examples as the substrate for forming the titanium oxide thin film and the substrate having a titanium oxide thin film thereon which has a titanium oxide thin film formed from the dispersion of the present invention on the substrate and the latter is preferable. [0161] When using the substrate having a titanium oxide thin film thereon, the substrate having the organic functional film formed thereon in which the organic functional film is formed on the titanium oxide thin film of the substrate can be applied to photo lithography or the like because of the photocatalyst activity function of the titanium oxide thin film. [0162] Although there is no limitation on the film thickness of the obtained organic functional film, the film thickness normally is 500 nm or less. Also the obtained organic functional film is preferably a thin film including the organic compound and more preferably a thin film including an organic compound in which the content of carbon element is within the range of 2 to 40%. [0163] It is preferable for the organic functional film to be able to decompose and/or remove an organic compound contacting with the organic functional film by photoirradiation. [0164] Also, it is preferable for the organic functional film to be a hydrophilic film having a contact angle of water of 20° or less by photoirradiation. By using these organic functional films, a resist film with a prescribed pattern can be formed and a specific part of the organic functional film can be changed to be a hydrophilic thin film by photoirradiation with a prescribed pattern. [0165] The irradiation light used in photoirradiation is preferably ultraviolet rays and more preferably ultraviolet rays having a wavelength of 250 to 350nm. The amount of irradiation light is 40 J/cm2 or less and preferably 5 J/cm2 or less. Examples [0166] The present invention will be explained below in more detail by reference to the following Examples, but the invention should not be construed as being limited thereto. (1) Solution for forming thin film (Example 1) preparation of solution for forming thin film (1) 181.8 g of diisopropoxy bisacetylacetonatetitanium (Trade name: "T-50" manufactured by Nippon Soda Co., Ltd., solid content of 16.5% by weight as titanium oxide) was dissolved in 2518.2 g of mixed solvent of ethanol/ethyl acetate=50/50 (volume ratio). 300 g (44.4-fold by mol to diisopropoxy bisacetylacetonatetitanium) of ion-exchanged water was slowly added dropwise into this solution at room teperature while stirring. Following completion of addition, the solution was hydrolyzed by stirring for 2 hours and left standing for 1 day to obtain a yellow, transparent solution for forming a thin film (hereinafter referred to as "Solution A-1") which included titanium oxide particles (average particle size of 4.3 nm) having a concentration of 2% by weight as titanium oxide. The above operations were conducted at room temperature. [0167] (Example 2) Preparation of solution for forming thin film (2) 363.6 g of diisopropoxybisacetylacetonatetitanium (Trade name: "T-50" manufactured by Nippon Soda Co., Ltd., solid content of 16.5% by weight as titanium oxide) was dissolved in 2336.4 g of 2-butanol. 300 g (22.2-fold by mol to diisopropoxy bisacetylacetonatetitanium) of ion-exchanged water was slowly added dropwise into this solution at room temperature while stirring. Following completion of addition, the solution was hydrolyzed by stirring for 2 hours and left standing for 2 days to obtain a yellow, transparent solution for forming a thin film (hereinafter referred to as "Solution A-2") which included titanium oxide particles (average particle size of 5.0 nm) having the concentration of 1% by weight as titanium oxide. The above operations were conducted at room temperature. [0168] (Example 3) Preparation of solution for forming thin film (3) 181.8 g of diisopropoxybisacetylacetonatetitanium (Trade name: "T-50" manufactured! by Nippon Soda Co., Ltd., solid content of 16.5% by weight as titanium oxide) was slowly added dropwise into 2818.2 g (417-fold by mol to diisopropoxy bisacetylacetonatetitanium) of ion-exchanged water at room temperature while stirring. Following completion of addition, the solution was hydrolyzed by stirring for 2 hours and left standing for 1 day to obtain a yellow, transparent solution for forming thin film (hereinafter referred to as "Solution A-3") which included titanium oxide particles (average particle size of 4.0 nm) having a concentration of 1% by weight as titanium oxide. The above operations were conducted at room temperature. [0169] (Example 4) Preparation of solution for forming thin film (4) After dissolving 47.12g of methyl silicate (Trade name "MS-56" manufactured by Mitsubishi Chemical Corporation, solid content of 57.3% by weight as silicon oxide) in 2634.7 g of mixed solvent of ethanol/ethyl acetate=50/50 (volume ratio), 18.2 g of diisopropoxy bisacetylacetonatetitanium (Trade name: "T-50" manufactured by Nippon Soda Co., Ltd, solid content of 16.5% by weight as titanium oxide) was added to obtain a solution. 300g (34.2-fold by mol to the total number of moles of methyl silicate and diisopropoxy bisacetylacetonatetitanium) of ion-exchanged water was slowly added dropwise into; the obtained solution at room temperature while stirring. Following completion of addition, the solution was hydrolyzed by stirring for 2 hours and left standing for 1 day to obtain a yellow, transparent solution for forming thin film (hereinafter referred to as "Solution A-4") which included titanium oxide particles (average particle size of 8.3 nm) having a concentration of 1% by weight as titanium oxide. The above operations were conducted at room temperature. [0170] (Example 5) Preparation of solution for forming thin film (5) 4 g of octadecyltrimethoxysilane (ODS) was dissolved in 396 g of toluene. This solution was added dropwise into 600 g of Solution A-1 at room temperature while stirring. Following completion of addition, the solution was hydrolyzed by stirring for 24 hours to obtain a yellow, transparent solution for forming a thin film (the solution was referred to as "Solution A-5" and the water content is 38.9-fold by moles to the total number of mole of titanium oxide and ODS) which included fine particles of reaction product obtained by reacting ODS with titanium oxide. The above operations ware conducted at room temperature. [0171] (Comparative {Example 1) Preparation of solution for forming thin film (6) 181.8 g of diisopropoxy diacetylacetonatetitanium (Trade name: "T-50" manufactured by Nippon Soda Co., Ltd., the solid content of 16.5% by weight as titanium oxide) was dissolved in 2818.2 g of mixed solvent of ethanol/ethyl acetate=50/50 (volume ratio) to obtain a yellow, transparent solution for forming a thin film (hereinafter referred to as "Solution H-1") having a concentration of 1% by weight as titanium oxide. The above operations were conducted at room temperature. [0172] (Comparative Example 2) Preparation of solution for forming thin film (7) 181.8 g of diisopropoxydisacetylacetonatetitanium (Trade name: "T-50" manufactured by Nippon Soda Co., Ltd., solid content of 16.5% by weight as titanium oxide) was dissolved in 2794.6 g of mixed solvent of ethanol/ethyl acetate=50/50(volume ratio). 24.31 g (3.6-fold by mol to diisopropoxy bisacetylacetonatetitanium) of ion-exchanged water was slowly added dropwise into this solution at room temperature while stirring io obtain a yellow, transparent solution for forming a thin film (hereinafter referred to as "Solution H-2") having a concentration of 1% by weight as titanium oxide. The above operations were conducted at room temperature. [0173] (2) Evaluation method of solution Physical properties of the solution for forming a thin film (Solution A-1 to Solution A-5) prepared in Examples 1 to 5 and the solution for forming a thin film (Solution H-1 and Solution H-2) prepared in Comparative Examples 1 and 2 were evaluated by the following evaluation methods. [0174] (i) Measurement of particle size of metallic compound in solution The particle size of the metallic compound in the solution was measured by using a particle diameter measurement apparatus (HPPS, manufactured by Malvern Instruments Ltd.). Also, the particle size of the metallic compound in the solution for forming a thin film (Solution A-1 to A-5, H-1, and H-2) which had kept at room temperature for 3 months was measured. The measurement results are shown in Table 1. In Table 1, "particle size" indicates an average particle size. [0175] [Table 1] [0176] As shown in Table 1, the titanium chelate compounds in Solution A-1 to A-5 proceeded with the hydrolysis-condensation by adding a large amount of water and were polymerized to particles of titanium oxide having a particle size of 4 to 10 nm and were extremely similar structure to titanium oxide. [0177] A particle size distribution of titanium oxide particles included in Solution A-3 is shown in Fig. 1. In Fig. 1, the horizontal axis shows average particle size (nm) and the vertical axis shows peak strength (Intensity). The titanium oxide particles included in Solution A-3 show a monodispersed distribution with extremely sharp peak. [0178] Also, as shown in Table 1, the keep stability was excellent. Even the solution which had been kept for 3 months had particles having the particle size of 13 nm or less and was transparent. This showed that the examples of the present invention have excellent keeping stability. [0179] On the other hand, in case of Comparative Example 1 in which water was not added at all, particles of titanium compound were not formed and the particle size could not be measured, because the hydrolysis reaction did not occur. In the case of Comparative Example 2 in which the amount of the water added was 3.6-fold by mole to the titanium, the isopropoxy group proceeded with hydrolysis-condensation to produce particles having a particle size of about 1 nm. However, the! chelate portion did not sufficiently proceed with hydrolysis-condensation and, as a result, an aggregation occurred to form a large agglomerate having a size of 86 nm and the stability was poor. [0180] (ii) TG/DTA measurement of titanium oxide particles in Solution A-3 Solution A-3 was concentrated at 50°C under reduced pressure and dried at 50°C in a vacuum, to be a powder. TG/DTA (diffential thermogravimetric analysis) was measured under the condition in which the rate of temperature increase was 20°C/min under nitrogen gas. A result of measurement analysis is shown in Fig. 2. In Fig. 2, a sharp endothermic peak according to decomposition of the propoxy group and acetylacetonate group, which was observed in the case of diisopropoxy diacetylacetoriatetitanium (T-50) as raw material, was not observed in the case of Solution A-3. For this reason, it was suggested that almost all of the isopropoxy group and acetylacetonate group in Solution A-3 were hydrolyzed. It was assumed that the weight was reduced by elimination of moisture adsorbing to particles, isopropanol, acetyl acetone alcohol, and hydroxyl group surface. Also, in FT-IR analysis and H-NMR analysis, isopropoxy group and acetylacetonate group bonding to titanium atom were not observed. [0181] (iii) Measurement of zeta potential of solution in pH titration The zeta potential was measured by changing pH of Solution A-3 in Example 3 from 2 to 12 by using hydrochloric acid of 0.2 mol/L and aqueous sodium hydroxide of 0.2 mol/L. The measurement results are shown in Fig. 3. The measurement results of zeta potential of Solution A-3 shown in Fig.3 showed pH of the isoelectric point of 6.29 and almost the same results as anatase-type titanium oxide. It was suggested that the particles were charged positively to be stable, because pH of Solution A-3 was about 5. [0182] (iv) Amphipathic property evaluation of titanium oxide particles Each of Solutions A-1 to A-3 was added to a solution in either of 0.1 g or 1 g in which 1 g of toluene was added to 9 g of water and dispersed with supersonic waves, and whether or not the stably dispersed emulsification products were obtained was evaluated. In all cases of Solutions A-1 to A-3, stably, dispersed emulsification products were obtained. It seems that the outer surface of toluene drops was encircled with amphiphilic nanoparticles. [0183] In analysis results of 'H-NMR, the total of alkoxyl group and chelate group bonding to Ti was four-fold by mole in the case of the Comparative Example 1 and 0.8 -fold by mole in case of the Comparative Example 2. In Solution H-1 of the Comparative Example 1 and Solution H-2 of the Comparative Example 2, the hydrolysis of titanium chelate compound was insufficient. Also, no obvious zeta potential was observed in Solutions H-1 and H-2. [0184] (3) Forming thin film (Examples 6 to 17, Comparative Examples 3 and 4) The following substrates for forming a thin film were prepared and the surfaces thereof were cleaned by ethanol and dried. Next, each substrate surface was coated with each solution (Solution A-1 to Solution A-5) prepared in the above Examples 1 to 5 and solution (Solution H-1 and Solution H-2) prepared in the above Comparative Examples 1 and 2 by mayer bar coater (using bar No. 3) and dried at 60°C for 10 minutes to form a thin film. The obtained thin films were referred as to C-1 to C-12, CH-1, and CH-2. Because the film is obtained by drying at 60°C, the solution could be applied to the substrate such as plastics having no heat resistance. [0185] The following substrate was used as the substrate for forming a thin film. B-1: polyester sheet (Trade name "Lumirror" manufactured by Toray Industries, INC.) B-2: polyimide sheet (Trade name "Kapton" manufactured by DU PONT-TORAY CO.,LTD) B-3: Soda lime glass substrate plate (SLG) B-4: aluminum plate A kind of substrate and solution for forming a thin film are shown together in Table 1. [0186] (4) Evaluation method of thin film Next, the physical properties of the thin film (C-1 to C-12, CH-1, CH-2) formed in the above (3) were measured by the following test methods and evaluated. [0187] (i) Crystallizability of thin film The crystallizability of the thin film was evaluated by measuring with an X-ray diffraction instrument. All of thin films (C-1 to C-12) were amorphous films having a film thickness of 10 to 40 ran. [0188] (ii) Film appearance The shifts of haze degree by coating the thin film were measured, the appearances of the thin films were observed by viewing, and the thin films were evaluated as follows. Evaluation O: transparent, shift of haze degree of 0.5% or less, film spot absence Evaluation X: shift of haze degree of 0.5% or more, film spot presence [0189] (iii) Adhesion properties (tape peeling test) After cellophane-tape was applied to each sample and rubbed a few times with a finger cushion, when the tape was peeled, whether or not the thin films on the substrate were separated was evaluated by elemental analysis with XPS and evaluated as follows. Evaluation O: no separation Evaluation X: separation [0190] The above evaluation results are shown in Table 2. In Table 2, the film appearances of the thin films (C-1 to C-12) were excellent and the adhesion properties were also excellent. The thin film (CH-1) of theComparative example 3 and the thin film (CH-2) of the Comparative Example 4 had fogging and the adhesion properties thereof were not excellent. [0191] (iv) Surface smoothness of thin film The average surface roughness (Ra) by scanning probe microscopy before and after coating bf Solution A-3 is shown in Fig. 4. Fig. 4 shows that while the average surface roughness of polyester substrate was 1.37 ran, the average surface roughness Ra was 0.70 ran after coating of the film, and thus the surface roughness was improved to provide surface smoothness. [0192] (v) Element distribution in thin film The element distribution along the depth direction of the films was measured by using an XPS analyzer (Quantum 2000 manufactured by Ulvac-Phi, Inc). The film was removed by argon sputtering at 1 kV at 0.25 minute intervals and measured by X ray photoelectron spectroscopy to obtain the content rates by percentage of carbon atom, oxygen atom, titanium atom, or the like in the film by using the following formula. [0193] [Formula 1] Content ratio of carbon element by percentage (%) =(Concentration of carbon atom)/{(Concentration of oxygen atom) + (Concentration of carbon atom) + (Concentration of the total metal atom)}* 100 [0194] The element distribution in the thin film (C-1) formed from Solution A-1 was evaluated by XPS and the results thereof are shown in Fig. 5. In the analysis result, the samples obtained by coating the substrate of polyester with Solution A-1 and drying at 60°C were measured along the depth direction. In the thin film, the content rate of the carbon by percentage depending on the organic compound was extremely low, 10% or less by weight, showing that the thin film was almost an titanium oxide. [0195] The element distribution in the thin film (C-8) formed from Solution A-4 was evaluated by XPS and the results thereof are shown in Fig. 6. Even in this case, the content rate of residual carbon in the thin film was extremely low, 10% or less by weight, despite drying at 60°C. [0196] On the other hand, the thin film (CH-1) similarly formed by using Solution H-1 of the Comparative Example 1, in which, as shown in Fig. 7, the hydrolysis proceeded by moisture in the air at the film surface (the depth of 0 to 100 nm) to be a comparatively low carbon content with a large amount of carbon remaining at the inside of the film (the depth of 10 to 40 nm) was non-uniform weak film having low hardness. [0197] Also, the thin film similarly formed by using Solution H-2 of the Comparative Example 2 in which, as shown in Fig. 8, the carbon content by percentage depending on the organic compound was high and titanium oxide was not formed, was a weak film. [0198] (vi) Measurement of Water Contact Angle After adding 5 ul of water and toluene onto the surface of each sample from a microsyringe, the contact angle was measured 30 seconds later using a contact angle measuring instrument (Model 360S manufactured by Erma Inc.). The measurement results are shown in Table 2. [0199] (vii) Evaluation of ultraviolet (UV) sensitivity I As a lamp for UV irradiation, the following two kinds of lamp were used. UV1: Bactericidal lamp (Trade name "GL-15" manufactured by Toshiba Corporation: UV of 254 nm), Intensity of 4 mW/cm2 UV2: Black light (Trade name "FL15BLB" manufactured by Toshiba Corporation: UV of 365 nm), Intensity of 2 mW/cm2 [0200] The film was irradiated with the above ultraviolet and the water contact angle was measured to evaluate the change of the surface wettability. The UV irradiation energy was calculated until the water contact angle became 20° or less (the thin film became hydrophilic). The calculated results are shown in Table 2. An example in which Solution A-1 of Example 1 and UV2 as a light source was used, was defined as the Reference Example 1. [0201] The thin film obtained in examples immediately showed hydrophilicity by irradiation of UV of 254 nm to show the contact angle of 20° or less. The contact angle of the thin film of Example 13 was about 20° showing hydrophilicty, even before irradiation of UV. By the irradiation of UV of 254 nm, the hydrophilicity; of the thin film increased. [0202] The thin films (C-10 to C-12) formed by using Solution A-5 showed extremely high water repellency and showed hydrophilicity by irradiation of UV of 254 nm having low energy. Because of this, it is possible that a hydrophilic-hydrophobic pattern is produced by irradiation with a photomask, and the use in which a functional film is individuated by coating ink or plating can be expected. [0203] When the thin film was treated with UV ozone for 3 minutes by using a UV ozone device (Eyeozon cleaning device, manufactured by Eyegraphics CO., LTD., low-pressure marcury lamp) instead of irradiation of UV of 254 nm by UV 1, the thin film had hydrophilicity and the water contact angle of 10° or less. The thin film provided the same effects as the film when using UV1. [0204] However, the thin film formed from Solution H-1 could not active hydrophilicity by irradiation, because of the residual organic compound in the thin film. The thin film formed from Solution H-2 of the Comparative Example 2 showed hydrophilicity, although it needed a long time until the thin film showed hydrophilicity (i.e. the thin film needed a large energy for hydrophilicity). Also; the thin film of Example 1 did not show hydrophilicity by irradiation of UV of 365 nm and therefore it is different from the film having a normal anatase-type titanium oxide photo icatalyst which showed hydrophilicity by irradiation of UV of 365 nm (Reference Example 1). [0205] [Table 2] [0206] (Example 18) The thin film C-13 was formed on the substrate B-1 by using Solution A-3. This substrate was set on the belt conveyer at the top of which a high pressure mercury vapor lamp (manufactured by Eyegraphics CO., LTD., 160 W/cm of lamp intensity, lamp height of 10 cm, wavelength distribution referring the following table 3) was provided so as to take the surface of the thin film C-13 at the upper side and passed at a rate of 16.67 cm/sec under the high pressure mercury vapor lamp by the belt conveyer. At this time, the irradiation time was 0.6 seconds by the high pressure mercury vapor lamp. This operation was repeated 10 times and the water contact angle of the thin film C-13 was measured each time. The measurement results are shown in Table 4. [0208] [0207] [0209] From Table 4, when the pass time was 7 times (4.2 seconds of the total irradiation time), the water contact angle of the thin film C-13 was 7.0°. The result shows that according the substrate of Example 18, the irradiated surface of the thin film C-13 can show hydrophilicity (the water contact angle of 20° or less) by irradiation of ultraviolet light for an extremely short time (about 3.0 seconds). [0210] The dispersion of titanium oxide particles of the present invention is composed of fine particles of titanium oxide having an average particle size of nanometer-order dispersed in water solvent. The dispersion of the present invention is stable and is almost not changed even after the dispersion is kept at room temperature for 3 months. By using the dispersion of the present invention, a titanium oxide film of a fine monolayer having few impurities can be formed with ease and speed. Also, the dispersion of titanium oxide particles of the present invention is useful as material for forming an organic functional film. [0211] By using the solution for forming an organic functional film of the present invention, an organic functional film which can be applied to a photolithography method or the like can be formed on a substrate with speed and ease. The substrate having an organic functional film formed thereon of the present invention includes an organic functional film formed on a substrate and is suitable for photolithography method. WE CLAIM ; 60 1. A dispersion of titanium oxide particles obtained by mixing a titanium chelate compound formed by bonding a hydrolyzable group or a hydroxyl group and chelate ligand to a titanium atom and five-fold or more by mole of water to the titanium, chelate compound, wherein the content of the titanium oxide is within the range of 0.1 to 10% by weight as titanium oxide to the whole dispersion, and the titanium chelate compound proceeds with hydrolysis-condensation polvmerization. 2. The dispersion as claimed in claim 1, wherein the titanium oxide particles are fine particles having an average particle size of 1 to 20 nm. 3. The dispersion as claimed in claim 1, wherein the content of the titanium oxide is within the range of 0.1 to 5% by weight as titanium oxide to the whole dispersion. 4. The dispersion as claimed in claim 1, wherein the hydrolyzable group is an optionally substituted alkoxyl group. 5. A titanium oxide thin film which is formed by contacting the dispersion as claimed in claim 1 with a substrate surface. 6. A solution for forming an organic functional film comprising: a metallic compound having a hydrolyzable group or a hydroxyl group and the dispersion as claimed in claim 1. 7. The solution for forming an organic functional film as claimed in claim 6, wherein the metallic compound is used in two-fold or more by mole to 1 mole of the titanium compound included in the dispersion. 8. A solution for forming an organic functional film obtained by mixing an organic solvent solution of a metallic compound having a hydrolyzable group or a hydroxyl group, a solution of a titanium chelate compound having a hydrolyzable group or a hydroxyl group and a chelate ligand, and water of five-fold or more by mole to the total number of moles of the titanium chelate compound and metallic compound, wherein the titanium chelate compound proceeds with hydrolysis-condensation polymerization. 9. The solution for forming an organic functional film as claimed in claim 8, wherein the hydrolyzable group of the titanium chelate compound is an optionally substituted alkoxyl group. 10. The solution for forming an organic functional film as claimed in claim 8 or 9, wherein the metallic compound is used in two-fold or more by mole to 1 mole of the titanium chelate compound. 11. The solution for forming an organic functional film as claimed in claim 8 or 9, wherein the total content of the titanium chelate compound and the metallic compound is within the range of 0.1 to 10% by weight as metal oxide. 12. The solution for forming an organic functional film as claimed in claim 6 or 8, wherein a metal of the metallic compound is at least one selected from the group consisting of titanium, zirconium, aluminum, silicon, germanium, indium, tin, tantalum, zinc, tungsten, and lead. 13. The solution for forming an organic functional film as claimed in claim 6 or 8, wherein the hydrolyzable group of the metallic compound is an optionally substituted alkoxyl group. 14. A substrate having an organic functional film formed thereon comprising: an organic thin film formed by contacting the solution for forming an organic functional film as claimed in claim 6 or 8 with a substrate surface. Abstract A dispersion of titanium oxide particle which can form a fine organic thin film having impurities and can be a titanium oxide thin film forming material, a titanium oxide thin film formed from the dispersion, a solution for forming an organic functional film obtained by adding a metallic compound solution having a hydrolyzable group in the dispersion, a substrate having an organic functional film formed thereon which is obtained by using the Solution, and a production method thereof are provided. A dispersion of a titanium oxide particle obtained by adding water to an organic solvent solution of titanium chelate compound composed of a hydrolyzable group or a hydroxyl group and a chelate ligand bonding to a titanium atom, in which the amount of the water is five-fold or more by mole to the titanium chelate compound, a titanium oxide thin film formed by contacting this dispersion with the substrate surface composed of plastics or the like, a solution for forming organic functional film obtained by adding the dispersion in the organic solvent solution of metallic compound having hydrolyzable group, a method for producing a substrate having an organic functional film formed thereon which is obtained by using this solution for forming an organic functional film are provided.

Documents:

02944-kolnp-2007-abstract.pdf

02944-kolnp-2007-claims.pdf

02944-kolnp-2007-correspondence others 1.1.pdf

02944-kolnp-2007-correspondence others.pdf

02944-kolnp-2007-description complete.pdf

02944-kolnp-2007-drawings.pdf

02944-kolnp-2007-form 1.pdf

02944-kolnp-2007-form 18.pdf

02944-kolnp-2007-form 3.pdf

02944-kolnp-2007-form 5.pdf

02944-kolnp-2007-gpa.pdf

02944-kolnp-2007-international publication.pdf

02944-kolnp-2007-international search report.pdf

02944-kolnp-2007-others.pdf

02944-kolnp-2007-priority document.pdf

2944-KOLNP-2007-(02-03-2012)-CORRESPONDENCE.pdf

2944-KOLNP-2007-(11-04-2012)-CORRESPONDENCE.pdf

2944-KOLNP-2007-(14-06-2012)-CORRESPONDENCE.pdf

2944-KOLNP-2007-ASSIGNMENT 1.3.pdf

2944-KOLNP-2007-ASSIGNMENT.1.2.pdf

2944-kolnp-2007-correspondence 1.1.pdf

2944-KOLNP-2007-CORRESPONDENCE 1.3.pdf

2944-KOLNP-2007-CORRESPONDENCE.1.2.pdf

2944-KOLNP-2007-CORRESPONDENCE.pdf

2944-KOLNP-2007-EXAMINATION REPORT 1.3.pdf

2944-KOLNP-2007-EXAMINATION REPORT.1.2.pdf

2944-KOLNP-2007-FORM 13 1.3.pdf

2944-KOLNP-2007-FORM 13.1.2.pdf

2944-KOLNP-2007-FORM 18 1.3.pdf

2944-KOLNP-2007-FORM 18.1.2.pdf

2944-KOLNP-2007-FORM 3 1.3.pdf

2944-KOLNP-2007-FORM 3.1.2.pdf

2944-KOLNP-2007-FORM 5 1.3.pdf

2944-KOLNP-2007-FORM 5.1.2.pdf

2944-KOLNP-2007-GPA 1.3.pdf

2944-KOLNP-2007-GPA.1.2.pdf

2944-KOLNP-2007-GRANTED-ABSTRACT.pdf

2944-KOLNP-2007-GRANTED-CLAIMS.pdf

2944-KOLNP-2007-GRANTED-DESCRIPTION (COMPLETE).pdf

2944-KOLNP-2007-GRANTED-DRAWINGS.pdf

2944-KOLNP-2007-GRANTED-FORM 1.pdf

2944-KOLNP-2007-GRANTED-FORM 2.pdf

2944-KOLNP-2007-GRANTED-SPECIFICATION.pdf

2944-KOLNP-2007-OTHERS 1.3.pdf

2944-KOLNP-2007-OTHERS.1.2.pdf

2944-KOLNP-2007-PA.pdf

2944-KOLNP-2007-REPLY TO EXAMINATION REPORT 1.3.pdf

2944-KOLNP-2007-REPLY TO EXAMINATION REPORT.1.2.pdf

abstract-02944-kolnp-2007.jpg