Title of Invention

METHOD FOR COATING A SUBSTRATE USING PLASMA

Abstract The invention discloses a method for forming a polymeric coating on a substrate surface, which method comprises the steps of i) Plasma treating a mixture comprising a free-radical initiated polymerisable monomer having one or more free-radical polymerisable groups in the presence of a free radical initiator, wherein said plasma treatment is a soft ionisation plasma process and the monomer and initiator are either premixed and introduced into the plasma, in the form of a monomer and initiator gaseous mixture or mixed atomised liquid or alternatively the monomer and initiator are introduced into a plasma chamber separately, and ii) depositing the resulting polymeric coating material produced during step (i) onto a substrate surface.
Full Text METHOD FOR COATING A SUBSTRATE USING PLASMA
[0001] The present application describes a deposition process for coating substrates with
a free-radical polymerised polymeric coating utilizing a combination of plasma technology
and catalytically active initiators. The addition of a catalytic agent to the free-radical
polymerisable monomers increases the deposition rate. Surprisingly the initiator also
increases the degree to which the functionality of the monomer is retained within a plasma
polymerised coating subsequent to polymerisation.
[0002] Plasma, which is sometimes referred to as the fourth state of matter, is an at least
partially ionised gaseous medium, made of excited, unstable and ionised atoms and
molecules which emit visible and UV radiation. When matter is continually supplied with
energy, its temperature increases and it typically transforms from a solid to a liquid and, then,
to a gaseous state. Continuing to supply energy causes the matter to undergo a yet further
change of state in which neutral atoms or molecules of the gas are broken up by energetic
collisions to produce negatively charged electrons and positive or negatively charged ions.
Other species generated in a plasma include high energy non-charged particles such as gas
molecules in excited states, metastable compounds, molecular fragments and or radicals.
The plasma is electrically neutral and therefore contains positive ions, negative ions and
electrons in amounts such that the algebraic sum of their charges is zero. A plasma phase
is obtained in the laboratory by subjecting a pure gas or a gaseous mixture to external
excitation, which is most generally electrical.
[0003] The term "plasma" covers a wide range of systems whose density and temperature
vary by many orders of magnitude. Some plasmas, commonly known as thermal equilibrium
plasmas are very hot and all their microscopic species (ions, electrons, etc.) are in
approximate thermal equilibrium, the energy input into the system being widely distributed
through atomic/molecular level collisions; examples include flame based plasmas. Flame
based plasmas operate at high gas temperature and are oxidative by nature which means they
have significant limitations when applied to deposition processes. In such high temperature
gases it is impossible to maintain the chemical structure and/or functionality of the precursor in
the deposited coatings. Furthermore, the high process temperatures involved are
incompatible with heat sensitive substrates

[0004] Other plasmas, however, particularly those at low pressure (e.g.100 Pa) where
collisions are relatively infrequent, have their constituent species at widely different
temperatures and are called "non-thermal equilibrium" plasmas. In non-thermal equilibrium
plasmas, free electrons are very hot with temperatures of many thousands of Kelvin (K)
whilst neutral and ionic species remain cool. Because the free electrons have almost
negligible mass, the total system heat content is low and the plasma operates close to room
temperature thus allowing the processing of temperature sensitive materials, such as
plastics or polymers, without imposing a damaging thermal burden. The hot electrons
create, through high energy collisions, a rich source of radicals and excited and/or unstable
species with a high chemical potential energy capable of profound chemical and physical
reactivity. It is this combination of low temperature operation plus high reactivity which
makes non-thermal equilibrium plasma technologically important and a very powerful tool for
manufacturing and material processing as it is capable of achieving processes which, if
achievable at all without plasma, would require very high temperatures or noxious and
aggressive chemicals.
[0005] The use of plasma polymerisation is well established. Typically, the substrate to be
coated is placed within a vessel, and a plasma is formed. Introducing a monomer into this
plasma will then give rise to a plasma polymerisation reaction and lead to the deposition of a
polymer onto the substrate. Many examples of such treatment are known in the art; for
example, US 5,876,753 discloses a process for attaching target materials to a solid surface
which process includes affixing carbonaceous compounds to a surface by low power
variable duty cycle pulsed plasma deposition, and EP 0896035 discloses a device having a
substrate and a coating, wherein the coating is applied to the substrate by plasma
polymerisation of a gas comprising at least one organic compound or monomer. Similarly,
WO 00/20130 describes a process for depositing a hydrophobic coating onto a solid
substrate by exposing the substrate to a plasma containing a suitably substituted alkyne.
EP 0095974 describes a process for the polymerisation of pre-prepared supported film
which have been applied onto a substrate surface prior to the application of a plasma in a
vacuum. Radical initiators may be used in the pre-prepared film as sensitizers. Similarly
WO 2003/089479 describes a process in which a composition including both a free-radical
polymerisable compound and a photoiatent compound, which may be a free-radical
photoinitiator, is applied in a liquid form onto a three-dimensional substrate surface and is
subsequently plasma treated in a vacuum chamber. Charles W. Paul, Alexis T. Bell and
David S. Soong, Macromolecules 1985, 18, 2312 - 2318, discuss the initiation of methyl

methacrylate polymerisation with a free-radical initiator. The free-radical initiator is
produced in a vacuum glow discharge process.
[0006] Yasuda, H. Plasma Polymerisation; Academic Press: Orlando, 1985 describes
how vacuum glow discharge has been used to polymerise gas phase polymer precursors
into continuous films. As an example, the plasma enhanced surface treatment and
deposition of fluorocarbons has been investigated for the preparation of oleophobic surfaces
since the 1970's. Initially, simple fluorocarbon gas precursors such as carbon tetrafluoride
were used; this improved hydrophobicity but did not significantly improve oleophobicity.
Subsequently, as described in EP 0049884 higher molecular weight fluorinated precursors such as the perfluoroalkyl substituted acrylates were used.
[0007] These early processes typically resulted in fragmentation of the precursor and
insertion of fluorine into the surface rather than formation of a polymerised fluorocarbon
coating. The development of pulsed plasma polymerisation (or modulated discharge) as
described in Ryan, M., Hynes, A., Badyal, J., Chem. Mater. 1996, 8(1), 37-42 and Chen, X.,
Rajeshwar, K., Timmons, R., Chen, J., Chyan, O., Chem. Mater. 1996, 8(5), 1067-77
produced polymerised coatings in which the properties and/or functionalities of the monomer
are substantially retained resulting in the production of a polymeric coating retaining many
properties of the precursor monomer. Coulson S.R., Woodward I.S., Badyal J.P.S., Brewer
S.A., Willis C, Langmuir, 16, 6287-6293, (2000) describe the production of highly
oleophobic surfaces using long chain perfluoroacrylate or perfluoroalkene precursors.
[0008] WO97/38801 describes a method for the molecular tailoring of surfaces which
involves the plasma deposition step being employed to deposit coatings with reactive
functional groups, which groups substantially retain their chemical activity on the surface of
a solid substrate, using pulsed and continuous wave plasma. Wu et al. discuss in their
related publication, Mat.Res.soc. Symp.Proc, vol. 544 pages 77 to 87 the comparison
between pulsed and continuous wave plasma for such applications.
[0009] Two significant drawbacks exist for such pulsed vacuum plasma methods, firstly
the necessity for a vacuum requires the coating process to be operated in a batch wise
format, secondly the monomer must be introduced into the plasma as a vapour if the
vacuum is to be maintained or the active is coated by conventional means and then in a
separate step coated with an encapsulating plasma coating.

[0010] One type of plasma is generally referred to as diffuse dielectric barrier discharge
(one form of which can be referred to as an atmospheric pressure glow discharge Sherman,
D.M. et al, J. Phys. D.; Appl. Phys. 2005, 38 547-554). This term is generally used to cover
both glow discharges and dielectric barrier discharges whereby the breakdown of the
process gas occurs uniformly across the plasma gap resulting in a homogeneous plasma
across the width and length of a plasma chamber. ( Kogelschatz, U. 2002 "Filamentary,
patterned, and diffuse barrier discharges" IEEE Trans. Plasma Sci. 30,1400-8) These
may be generated at both vacuum and atmospheric pressures. In the case of atmospheric
pressure diffuse dielectric barrier discharges , gases including helium, argon or nitrogen are
utilised as process gases for generating the plasma and a high frequency (e.g.> 1kHz)
power supply is used to generate a homogeneous or uniform plasma between the
electrodes at atmospheric pressure. The exact mechanism of formation of diffuse DBD is
still a matter of debate but there is mounting evidence that Penning ionisation plays a critical
roie, in combination with secondary electron emission from the cathode surface, (see for
example, Kanazawa et al, J.Phys. D: Appl. Phys. 1988, 21, 838, Okazaki et al, Proc. Jpn.
Symp. Plasma Chem. 1989, 2, 95, Kanazawa etal, Nuclear Instruments and Methods in
Physical Research 1989, B37/38, 842, and Yokoyama et al., J. Phys. D: Appl. Phys. 1990,
23, 374).
[0011] Atmospheric pressure plasmas offer industry open port or perimeter systems
providing free ingress into and exit from the plasma region by e.g. webbed substrates and,
hence, on-line, continuous processing of large or small area webs or conveyor-carried discrete
workpieces. Throughput is high, reinforced by the high species flux obtained from high
pressure operation. Many industrial sectors, such as textiles, packaging, paper, medical,
automotive, aerospace, etc., rely almost entirely upon continuous, on-line processing so that
open port/perimeter configuration plasmas at atmospheric pressure offer a new industrial
processing capability.
[0012] WO 02/28548 describes a process to overcome the limitations to vacuum and
some pulse type applications. By combining an atmospheric pressure plasma discharge,
such as a diffuse dielectric barrier discharge, and an atomised precursor, a range of
coatings may be deposited which retain the functionality of the precursor to a large degree.
Using this technique, a controlled free radical polymerisation takes place and the monomer
structure is significantly retained.

[0013] Post discharge plasma systems have been developed to produce plasmas using
gases passing between adjacent and/(or coaxial) electrodes at high flow rates. These gases
pass through the plasma region defined by the shape of the electrodes and exit the system in
the form of excited and/or unstable gas mixtures at around atmospheric pressure. These gas
mixtures are characterized by being substantially free of electrical charged species, which may
be utilized in downstream applications remote from the plasma region, i.e. the gap between
the adjacent electrodes in which plasma is generated. This "atmospheric pressure post
plasma discharge" (APPPD) has some of the physical characteristics of low pressure glow
discharge and APGD including, for example, glow, presence of active light emitting species
and chemical reactivity. However, some clear and unique differences exist including the
facts that APPPD has higher thermal energy, absence of boundary walls e.g. no electrodes,
substantial absence of electrically charged species, large choice of gases and mixture of
gases, large flow rate of gases. Systems of this type are described in US 5807615, US
6262523 and WO 2005/039753 which was published after the priority date of the present
application.
[0014] Hot-Filament Chemical Vapour Deposition (HFCVD) is an alternate method for
depositing polymeric coatings on substrates which, unlike plasma enhanced Chemical
Vapour Deposition (PECVD), does not use a plasma to initiate a free radical based CVD
process but uses a heated filament to initiate a thermal CVD reaction. Recent work using
HFCVD has shown that the addition of free radical initiators to a monomer vapour can result
in increased retention of the monomer functionality in the resulting polymerised coating
(Gleason et al, Langmuir, 2002, 18, 6424, and Gleason et al, J. Electrochem. Soc, 2001,
148, F212).
[0015] The use of catalysts to initiate free-radical polymerisation reactions is a well known
and commonly used technique. For example, WO 0034341 describes a heterogeneous
catalyst for the polymerisation of olefins. U.S. Pat. Nos. 5,064,802, 5,198,401, and
5,324,800 also describe selective catalysts for olefin polymerisation. U.S. Pat. No.
2,961,245 describes the polymerisation of cyclotrisiloxane containing fluorinated
hydrocarbon radicals, in the presence of a homogeneous initiator such as
perfluoroalkanesulphonic acid and of linear organosiloxanes with triorganosilyl ends that are
used as chain-blocking agents. A fluorinated silicone oil is thus obtained, after
devolatilization, whose viscosity is essentially determined by the M2/D 3 ratio. The catalyst

is optionally removed by distillation or washing. EP 0822240 describes a coating resin
composition formed from an acrylate, organosilane and a curing catalyst.
[0016] The present inventors found that, surprisingly, improvements in the retention of
functionality of free-radical polymerised polymeric coatings may be achieved by the addition
of a free-radical initiator to a free-radical polymerised monomer during plasma deposition
processes. Also, the deposition rate of the coatings was found to increase when an initiator
was used. The use of initiators is especially applicable in conjunction with liquid precursors
and atmospheric pressure plasma techniques such as that described in WO 0228548. The
addition of the initiator promotes free radical polymerisation through polymerisable groups
within the monomer in preference to the alternative plasma promoted destructive
fragmentation reactions which may take place.
[0017] According to the present invention there is provided a method for forming a
polymeric coating on a substrate surface, which method comprises the steps of
i. Plasma treating a mixture comprising a free-radical initiated polymerisable
monomer having one or more free-radical polymerisable groups in the
presence of a free radical initiator, wherein said plasma treatment is a soft
ionisation plasma process; and
ii. depositing the resulting polymeric coating material produced during step (i)
onto a substrate surface.
[0018] It shouid be understood that a soft ionisation plasma process is a process wherein
precursor molecules are not fragmented during the plasma process and as a consequence,
the resulting polymeric coating has the physical properties of the precursor or bulk polymer.
[0019] Plasma treatment of the mixture is to be understood to include interaction with
ionised and/or excited species both within the plasma or generated as a result of passing
through the plasma.
[0020] The form of plasma activation utilised may be any suitable type, provided it results
in a "soft" ionisation plasma process. Any plasma generating equipment suitable for
generating "soft" ionisation plasma may be utilised. Preferably, non-thermal equilibrium
plasma equipment may be used. Suitable non-thermal equilibrium plasmas which may be

utilised for the present invention include, diffuse dielectric barrier discharges such as
atmospheric pressure glow discharge and dielectric barrier discharge (DBD), low pressure
glow discharge, so called plasma knife type equipment (as described in WO 03/085693) or
post discharge plasma. Preferably, the non-thermal equilibrium plasma equipment may be
operated in either continuous mode or pulse mode. Preferred processes are "low
temperature" plasmas wherein the term "low temperature" is intended to mean below 200°C,
and preferably below 100 °C. These are plasmas where collisions are relatively infrequent
(when compared to thermal equilibrium plasmas such as flame based systems) which have
their constituent species at widely different temperatures (hence the general name "non-
thermal equilibrium" plasmas).
[0021] Suitable alternative plasma sources may for example comprise, microwave plasma
sources, corona discharge sources (where appropriate), arc plasmas sources, DC
magnetron discharge sources, helicon discharge sources, capacitatively coupled radio
frequency (rf) discharge sources, inductively coupled RF discharge sources, low pressure
pulsed plasma sources and/or resonant microwave discharge sources. Corona discharge
systems generate locally intense electric fields, i.e. non-uniform electric fields generated using
point, edge and/or wire sources. Corona systems have provided industry with an economic
and robust means of surface activation for more than 30 years. They typically operate in
ambient air resulting in an oxidative deposition environment, which renders control of
deposition chemistry difficult. The design of corona systems is such as to generate locally
intense plasmas which result in variations in plasma energy density across the plasma
chamber. In regions of high energy density the substrate is prone to damage from the plasma
whereas in low energy density areas the treatment rate is limited. Attempts to increase the
treatment rate in the low energy density areas result in unacceptable levels of substrate or
coating damage in the high energy regions. These variations in energy density lead to non-
uniform deposition chemistry and/or non-uniform deposition rate across the plasma chamber.
[0022] The choice of plasma source will generally be dictated by the dimensions of the
substrate, with glow discharge type sources being used for thin films or plates and other
more appropriate systems being used for three-dimensional substrates.
[0023] Any conventional means for generating an atmospheric pressure plasma or post
discharge may be used in the method of the present invention, for example atmospheric
pressure diffuse dielectric barrier discharge techniques such as atmospheric pressure

plasma jet, atmospheric pressure microwave glow discharge and atmospheric pressure
glow discharge. Typically, atmospheric pressure diffuse dielectric barrier discharge (such as
glow discharge processes) will employ helium as a process gas and a high frequency (e.g >
1kHz) power supply to generate a homogeneous plasma (e.g. a homogeneous glow
discharge) at atmospheric pressure via, it is believed, a Penning ionisation mechanism.
[0024] In the case of low pressure pulsed plasma, the monomers are preferably
introduced into the plasma in the form of vapours and polymerisation is initiated by the
plasma alone or, when present, in combination with the free radical initiator. The low
pressure pulsed plasma may be performed with substrate heating and/or pulsing of the
plasma discharge. Whilst for the present invention heating will not generally be required,
the substrate may be heated to a temperature substantially as high as its melting point
Substrate heating and plasma treatment may be cyclic, i.e. the substrate is plasma treated
with no heating, followed by heating with no plasma treatment, etc., or may be
simultaneous, i.e. substrate heating and plasma treatment occur together. The plasma may
be generated by any suitable means such as radio frequency, microwave or direct current
(DC). A radio frequency generated plasma of 13.56 MHz is preferred. A particularly
preferred plasma treatment process involves pulsing the plasma discharge at room
temperature or where necessary with constant heating of the substrate. The plasma
discharge is pulsed to have a particular "on" time and "off' time, such that a very low
average power is applied, for example of less than 10W and preferably less than 1W. The
on-time is typically from 10 to 10000µs, preferably 10 to 1000µs, and the off-time typically
from 1000 to 10000µs, preferably from 1000 to 5000jxs. The gaseous precursors may be
introduced into the vacuum with no additional gases; however additional plasma gases such
as helium or argon may also be utilized.
[0025] Examples of suitable atmospheric pressure diffuse dielectric barrier discharge
apparatus (e.g. glow discharge) include the apparatus described in the applicant's co-
pending applications WO 02/35576, WO 03/086031 and WO 2004/068916. In WO
02/35576 and WO 03/086031 the plasma is formed using pairs of electrode units. Any
suitable electrode units may be used, for example, each electrode unit may contain an
electrode and an adjacent a dielectric plate and a cooling liquid distribution system for
directing a cooling conductive liquid onto the exterior of the electrode to cover a planar face
of the electrode. Each electrode unit may comprise a watertight box having a side formed
by a dielectric plate having bonded thereto on the interior of the box the planar electrode

together with a liquid inlet and a liquid outlet. The liquid distribution system may comprise a
cooler and a recirculation pump and/or a sparge pipe incorporating spray nozzles. WO
2004/068916 describes a number of non-metallic based electrode systems. The
atmospheric pressure plasma assembly may also comprise a first and second pair of vertically
arrayed parallel spaced-apart planar electrodes with at least one dielectric plate between said
first pair, adjacent one electrode and at least one dielectric plate between said second pair
adjacent one electrode, the spacing between the dielectric plate and the other dielectric plate
or electrode of each of the first and second pairs of electrodes forming a first and second
plasma region which assembly further comprises a means of transporting a substrate
successively through said first and second plasma regions and is adapted such that said
substrate may be subjected to a different plasma treatment in each plasma region.
[0026] It should be understood that the term vertical is intended to include substantially
vertical and should not be restricted solely to electrodes positioned at 90 degrees to the
horizontal.
[0027] For typical atmospheric pressure diffuse dielectric barrier discharge generating
apparatus (e.g. glow discharge plasma generating apparatus), the plasma is generated
within a gap of from 3 to 50mm, for example 5 to 25mm. Thus, the method in accordance
with the present invention has particular utility for coating films, fibres and powders when
using atmospheric pressure glow discharge apparatus. The generation of steady-state glow
discharge plasma at atmospheric pressure is preferably obtained between adjacent
electrodes which may be spaced up to 5 cm apart, dependent on the process gas used.
The electrodes being radio frequency energised with a root mean square (rms) potential of 1
to 100 kV, preferably between 4 and 30 kV at 1 to 100 kHz, preferably at 15 to 40 kHz. The
voltage used to form the plasma will typically be between 2.5 and 30 kV, most preferably
between 2.5 and 10 kV however the actual value will depend on the chemistry/gas choice and
plasma region size between the electrodes. Each electrode may comprise any suitable .
geometry and construction. Metal electrodes may be used. The metal electrodes may be in
the forms of plates or meshes bonded to the dielectric material either by adhesive or by some
application of heat and fusion of the metal of the electrode to the dielectric material. Similarly,
the electrode may be encapsulated within the dielectric material.
[0028] Whilst the atmospheric pressure diffuse dielectric barrier discharge (e.g.glow
discharge) assembly may operate at any suitable temperature, it preferably will operate at a

temperature between room temperature (20° C) and 70° C and is typically utilized at a
temperature in the region of 30 to 50° C.
[0029] When using an atmospheric pressure diffuse dielectric barrier discharge assembly
such as an atmospheric pressure glow discharge system the polymerisable monomers and
initiators may be introduced into an atmospheric pressure glow discharge plasma as a
vapour by conventional means, or as an atomised liquid. Monomers are preferably supplied
to the relevant plasma region after having been atomised. When in liquid form, the coating-
forming material may be atomised using any suitable atomiser. Preferred atomisers include,
for example, ultrasonic nozzles, i.e. pneumatic or vibratory atomisers in which energy is
imparted at high frequency to the liquid. The vibratory atomisers may use an
electromagnetic or piezoelectric transducer for transmitting high frequency oscillations to the
liquid stream discharged through an orifice. These tend to create substantially uniform
droplets whose size is a function of the frequency of oscillation. The material to be
atomised is preferably in the form of a liquid, a solid or a liquid/solid slurry. The atomiser
preferably produces a coating-forming material drop size of from 10 to 100µm, more
preferably from 10 to 50µm. Suitable ultrasonic nozzles which may be used include
ultrasonic nozzles from Sono-Tek Corporation, Milton, New York, USA or Lechler GmbH of
Metzingen Germany. Other suitable atomisers which may be utilised include gas atomising
nozzles, pneumatic atomisers, pressure atomisers and the like. The apparatus of the
present invention may include a plurality of atomisers, which may be of particular utility, for
example, where the apparatus is to be used to form a copolymer coating on a substrate
from two different coating-forming materials, where the monomers are immiscible or are in
different phases, e.g. the first is a solid and the second is a gas or liquid. In a still further
embodiment the free radical initiator and the monomer may be separately plasma treated
(i.e. directed through separate plasma regions prior to inter-mixing and application onto a
substrate). In which case the initiator and the monomer will require separate atomisers.
[0030] An advantage of using an atmospheric pressure diffuse dielectric barrier discharge
assembly e.g. an atmospheric pressure glow discharge assembly) for the plasma treating
step of the present invention as compared with the prior art is that both liquid and solid
atomised polymerisable monomers may be used to form substrate coatings, due to the
method of the present invention taking place under conditions of atmospheric pressure.
Furthermore, the polymerisable monomers can be introduced into the plasma discharge or

resulting stream in the absence of a carrier gas, i.e. they can be introduced directly by, for
example, direct injection, whereby the monomers are injected directly into the plasma.
[0031] Preferably, deposition of the coating occurs whilst the substrate is in the plasma
activation region.
[0032] The process gas for use in either preferred plasma treatment of the method in
accordance with the present invention may be any suitable gas but is preferably an inert gas
or inert gas based mixture such as, for example helium, a mixture of helium and argon and
an argon based mixture additionally containing ketones and/or related compounds. These
process gases may be utilized alone or in combination with potentially reactive gases such
as, for example, nitrogen, ammonia, O2, H2O, NO2, air or hydrogen. Most preferably, the
process gas will be Helium alone or in combination with an oxidizing or reducing gas. The
selection of gas depends upon the plasma processes to be undertaken. When an oxidizing
or reducing process gas is required, it will preferably be utilized in a mixture comprising 90-
99% inert or noble gas and 1 to 10% oxidizjng or reducing gas.
[0033] The duration of the plasma treatment will depend upon the particular substrate and
application in question.
[0034] Preferably, where the method of the present invention utilises an atmospheric plasma
glow discharge plasma assembly, the means of transporting a substrate is a reel to reel
based process. Preferably in such a case the substrate may be coated on a continuous
basis by being transported through an atmospheric plasma glow discharge by way of a reel
to reel based process in which the substrate travels from a first reel, through a the plasma
region and on to a second reel at a constant speed to ensure that all the substrate has a
predetermined residence time within the respective plasma regions. The residence time in
the plasma region may be predetermined prior to coating and rather than varying the speed
of the substrate the length of the plasma region may be varied. The assembly may
additionally comprise one or more pairs of typically vertical parallel orientated electrodes
situated before or after the pair of electrodes in the first plasma zone.
[0035] Optionally where required the substrate may be cleaned and/or activated prior to or
after coating, using plasma generated from a suitable gas such as helium, nitrogen, oxygen,
argon or air. Preferably said cleaning and/or activation step will be carried out by subjecting

the substrate to exposure to a plasma treatment using the pair of parallel orientated
electrodes situated before or after the plasma zone in which the coating is applied to the
substrate. Preferably, the cleaning and/or activating step takes place prior to coating the
substrate. Further treatments applied in additional plasma regions formed by the additional
pairs of electrodes may be the same or different from that undertaken in the plasma regions
described above. In the case when additional plasma regions are provided for pre-treatment
or post-treatment the necessary number of guides and/or rollers will be provided in order to
ensure the passage of the substrate through the assembly. Similarly preferably the substrate
will be transported alternatively upwardly and downwardly through all neighbouring plasma
regions in the assembly.
[0036] In the case when further plasma regions are provided after the first and second
plasma regions said additional plasma regions may, further activate the surface, or apply a
coating;or might be utilised to activate the coated surface and then re-coat the surface, apply
one ormore further coatings or the like, dependent on the application for which the substrate
is intended.
[0037] Any appropriate combination of plasma treatments may be used, for example the
substrate may be initially plasma cleaned and/or activated using a helium gas plasma and then
has a coating applied, for example, by application of a liquid or solid spray through an atomiser
or nebuliser as described in the applicants co-pending application WO 02/28548.
[0038] Alternatively the substrate may be first oxidised (in for example, an oxygen/Helium
process gas) prior to coating.
[0039] Any suitable polymerisable group(s) may be contained in the free-radical initiated
poiymerisable monomer used in the method of the present. Preferably, each monomer
comprises at least one unsaturated group such as a linear or branched alkenyl group e.g.
vinyl, propenyl, hexenyl or an alkynyl group. Most preferably the monomer also comprises
at least one other type of functional group which is not polymerised via a free radical
polymerisation process, such groups may include, alcohol groups, carboxylic acid groups,
carboxylic acid derivative groups such as aldehydes and ketones, esters, acid anhydrides,
maleates, amides and the like, primary secondary or tertiary amino groups, alkyl halide
groups, carbamate groups, urethane groups, glycidyl and epoxy groups, glycol and
polyglycol groups, organic salts, organic groups containing boron atoms, phosphorus

containing groups such as phosphonates, and sulphur containing groups such as
mercapto, sulphido, sulphone and sulphonate groups, and grafted or covalently bonded
biochemical groups such as amino acids and/or their derivatives, grafted or covalently
bonded biochemical species such as proteins, enzymes and DNA. In view of the fact that
the plasma process which takes place is of a "soft ionisation" type, the latter groups are not
destroyed and therefore provide functionality to the resulting polymer coating on the
substrate surface.
[0040] Hence the monomers which may be utilised in the present invention may include
methacrylic acid, acrylic acid, alkylacrylic acid, fumaric acid and esters, maleic acid, maleic
anhydride, citraconic acid, cinnamic acid, itaconic acid (and esters), vinylphosphonic acid,
sorbic acid, mesaconic acid, and, citric acid, succinic acid, ethylenediamine tetracetic acid
(EDTA) and ascorbic acid and their derivatives, and/or unsaturated primary or secondary
amine, such as for example ally! amine, 2-aminoethylene, 3-aminopropylene, 4-
aminobutylene and 5-aminopentylene acrylonitrile, methacrylonitrile, acrylamide, such as N-
isopropylacrylamide, methacrylamide, epoxy compounds, for example allylglycidylether,
butadiene'monoxide, 2-propene-1-ol, 3-allyloxy-1,2-propanediol, vinylcyclohexene oxide,
and phosphorus-containing compounds, for example dimethylvinylphosphonate, diethyl allyl
phosphate and diethyl allylphosphonate, vinyl sulphonic acid, phenylvinylsulphonate,
vinylsulphone,.
[0041] Other monomers which may be used include methacrylates, acrylates, diacrylates,
dimethacrylates, styrenes, methacrylonitriles, alkenes and dienes, for example methyl
methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, and other alkyl
methacrylates, and the corresponding acrylates, including organofunctional methacrylates
and acrylates, including glycidyl methacrylate, trimethoxysilyl propyl methacrylate, allyl
methacrylate, hydroxyethyl methacrylate, hydroxypropyl methacrylate, dialkylaminoalkyl
methacrylates, and fluoroalkyl (meth)acrylates, and styrene, α-methylstyrene, halogenated
alkenes, for example, vinylidene halides, vinyl halides, such as vinyl chlorides and vinyl
fluorides, and fluorinated alkenes, for example perfluoroalkenes.
[0042] Any suitable initiator may be utilised. Examples include, hydrogen peroxide and
families of peroxides such as:

i) diacyls, for example benzoyl peroxide; lauroyl peroxide; decanoyl
peroxide and 3,3,5-trimethylhexanoy! peroxide;
ii) peroxydicarbonates, for example di-(2-ethylhexyl)peroxydicarbonate;
iii) monoperoxycarbonates, for example poly(tert-butyl peroxycarbonate),
and 00-tert-butyl-0-(2-ethylhexyl)monoperoxycarbonate;
iv) peroxyketals, for example ethyl 3,3-di(tert-butylperoxy)butyrate; n-
butyl 4,4-di-tert-(tert-butylperoxy)valerate; 2,2-di(tert-
butylperoxy)butane; 1,1,-di(tert-butylperoxy)cyclohexane and 1,1-
di(tert-amylperoxy)cyclohexane;
v) peroxyesters, for example tert-butyl peroxybenzoate; tert-butyl
peroxyacetate; tert-butyl peroxy-3,5,5-trimethylhexanoate; tert-amyl
peroxy-3,5,5-trimethylhexanoate; tert-butyl peroxyisobutyrate; tert-
butyl peroxy 2-ethylhexanoate; tert-butyl peroxypivalate; tert-amyl
peroxypivalate; tert-butyl peroxyneodecanoate; tert-amyl
peroxyneodecanoate; cumyl peroxyneodecanoate; 3-hydroxy-1,1-di-
methylbutylperoxyneodecanoate;
vi) dialkyls, for example 2,5-dimethyl2,5-di(tert-butylperoxy)hexyne; di-
tert-butyl peroxide; di-tert-amyl peroxide; 2,5-dimethyl-2,5-di(tert-
butylperoxy)hexane; dicumyl peroxide; and
vii) hydroperoxides, for example tert-butyl hydroperoxide; tert-amyl
hydroperoxide; cumene hydroperoxide; 2,5-dimthyl-2,5-
di(hydroperoxide) hexane; diisopropylbenzene monohydroperoxide;
paramenthane hydroperoxide.
[0043] Other initiators include hydrazines, polysulphides, azo compounds, for example
azobfsisobutyronitrile, metal iodides, and metal alkyls, benzoins, benzoin ethers such as
benzoin alkyl ethers and benzoin aryl ethers, acetophenones, Benzil, benzil ketals, such as
benzil dialkyl ketal, anthraquinones such as 2-alkylanthraquinones, 1-chloroanthraquinones
and 2-amylanthraquinone, triphenylphosphine, benzoylphosphine oxides, benzophenones,

thioxanones, xanthones, acridine derivatives, phenzine derivatives, quinoxaline derivatives,
phenylketones such as 1-aminophenylketones and 1-hydroxyphenylketones such as 1-
hydroxycyclohexylphenyl ketone and triazine compounds.
[0044] The monomer and initiator may be premixed and introduced into the plasma,
preferably in the form of a monomer and initiator gaseous mixture or preferably in the form
of a mixed atomised liquid. Alternatively they may be introduced into a plasma chamber
separately at an appropriate rate. Preferably the monomer and initiator are premixed.
[0045] The substrate to be coated may comprise any material, for example metal, ceramic,
plastics, siloxane, woven or non-woven fibres, natural fibres, synthetic fibres cellulosic
material and powder. Most preferably in the case of this invention the preferred substrate is
a plastic material, for example thermoplastics such as polyolefins e.g. polyethylene, and
polypropylene, polycarbonates, polyurethanes, polyvinylchloride, polyesters (for example
polyalkylene terephthalates, particularly polyethylene terephthalate), polymethacrylates (for
example polymethylmethacrylate and polymers of hydroxyethylmethacrylate), polyepoxides,
polysulphones, polyphenylenes, polyetherketones, polyimides, polyamides, polystyrenes,
phenolic, epoxy and melamine-formaldehyde resins, and blends and copolymers thereof.
[0046] Substrates coated by the deposition method of the present invention may have
various properties and/or applications such as for example barrier properties, the
enhancement of hydrophilic and hydrophobic coatings such as hydrophilic, biocompatible,
anti-fouling and controlled surface pH applications of substrates. Controlled surface pH
applications will include filtration (both gas and liquid) and separations media. The
substrates may also be utilised to trap or encapsulate active materials. Alternative
applications include the enhancement of the ability of additional materials to adhere to the
substrate surface; the improvements in hydrophobicity, oleophobicity, fuel and soil
resistance, and/or the release properties of the substrate; improvements in water resistance
and enhancement of the softness of fabrics; furthermore the inclusion of colloidal metal
species in the coatings may provide surface conductivity to the substrate, or enhance its
optical properties
[0047] The invention will be more clearly understood by reference to the following example
with Reference to the figures in which :-

Figure 1 is a general viewof)a plasma generating unit as used in the Examples hereinbelow

Example 1: Retention of acid functionality in polyacrylic acid deposition on to a
polypropylene film using a dichlorobenzoyl peroxide initiator.
[0048] Three liquid coating forming material compositions were prepared comprising
acrylic acid (AA) and 0, 0.6 and 3% by weight of a 2,4, dichlorobenzoyl peroxide, 50%
paste in poiydimethylsiloxane fluid (DCBP) sold as Perkadox® PD 50S-ps-a by Akzo Nobel
Chemicals Inc.

The compositions were used to form polyacrylic acid coatings on a polypropylene film being
passed through an atmospheric pressure glow discharge plasma unit of the type described
in the applicants co-pending patent application WO 03/086031 and as shown in Fig.1
herein.
[0049] Referring now to Fig.1, the flexible polypropylene and polyester fabric substrate was
transported through the plasma assembly by means of guide rollers 70, 71 and 72. A helium
process gas inlet 75, an assembly lid 76 and an atomiser such as an ultrasonic nozzle 74 for
introducing atomised liquid coating forming material compositions into plasma region 60 are
provided. Total plasma power applied to both plasma regions was 0.6 kW.
[0050] In use, a 100mm wide web of flexible substrate was transported through the plasma
assembly at a speed of speed of 4 m min-1. The substrate was initially directed to and over
guide roller 70 through plasma region 25 between electrodes 20a and 26. The plasma
generated between electrodes 20a and 26 in plasma region 25 was utilised as a cleaning
helium plasma, i.e. no liquid coating forming material compositions was directed into plasma
region 25. Helium was introduced into the system by way of inlet 75. Lid 76 is placed over the
top of the system to prevent the escape of helium, as it is lighter than air. Upon leaving
plasma region 25 the plasma cleaned substrate passes over guide 71 and is directed down
through plasma region 60, between electrodes 26 and 20b and over roller 72. Plasma region
60 however is utilised to coat the substrate with a polyacrylic acid coating derived from the

atomised liquid coating forming material compositions referred to above and introduced into
plasma region 60 through ultrasonic nozzle 74 at a rate of 50 µLmin-1 .
[0051] Each atomised liquid coating forming material composition is plasma treated when
passing through plasma region 60 generating a series of free radicals species arising from
both the DCBP initiator (when present) and the plasma. These free radicals undergo
polymerisation reactions and deposit onto the substrate to form a coating on the substrate as it
passes through plasma region 60. The resulting coated substrate is then transported over
roller 72 and is collected or further treated with additional plasma treatments. Rollers 70 and
72 may be reels as opposed to rollers.
XPS Analysis
[0052] A Kratos Axis Ultra electron spectrometer equipped with an Al Kα X-ray source,
and a concentric hemispherical analyser was used for XPS analysis of the resulting coated
substrate. Photo-emitted electrons were collected at a take-off angle of 90° from the
substrate surface. XPS spectra were accumulated on an interfaced PC computer and fitted
using a Simplex minimisation algorithm with mixed Gaussian:Lorentzian peaks having
variable full-width-at-half-maximum (FWHM), with binding energy values constrained.
Instrument sensitivity factors using Kratos library was taken as C(1s): O(1s) equals 0.278 :
0.78.
[0053] Using XPS analysis, the relative concentration of oxygen on the substrate surface
was found to increase in the presence of a polyacrylic acid coating as might be expected but
surprisingly further increases in Oxygen concentration were observed in the coatings
resulting from the liquid coating forming material compositions comprising acrylic acid and
DCBP. The use of a higher concentration of initiator led to an additional increase in oxygen
concentration, as shown in Table 1 which compares the relative concentrations of oxygen
with respect to polyacrylic acid coatings derived the different liquid coating forming material
compositions.


[0054] XPS Curve-fitting of the carbon (C 1s) core level provided information about the
chemical nature of the deposit by comparison to the curve-fit for conventionally polymerised
acrylic acid.
[0055] For a plasma polymerised polyacrylic acid (ppPAAc) deposit prepared without the
addition of an initiator using a 0.6 kW deposition power, the carbon (C 1s) core level shape
was similar to that for conventionally polymerised acrylic acid (PAAc) although the peak
associated with CO2X was lower in intensity than would be expected. By constraining the
areas of the peaks related with PAAc, to the intensity of the CO2X peak, it became apparent
that three additional peaks associated with the substrate were required: C-C (sub), C-OX,
and C=0. Some minor oxidation of the acrylic acid based precursor was noted by the
increased intensity of the C-OX peak, compared with its intensity on plasma treated
polypropylene (5%).
[0056] Addition of the initiator at a 0.6% level (10g acrylic acid / 0.062g DCBP) led to an
increase in the size of the carboxylic acid peak.
[0057] A further increase in CO2X peak intensity was observed on the addition of a higher
concentration of initiator of 3% by weight (11.5g acrylic acid / 0.358 g DCBP).
[0058] The relative concentrations of the functional groups making up the deposited
ppAAc layer are presented in Table 2. The increase in concentration of the carboxylic
function with increasing concentration of peroxide initiator is clearly seen. This indicates an

increase in deposit thickness, i.e. an enhanced deposition rate by the addition of initiator. It
was possible to estimate the thickness of the deposit using Hill's equation (JM Hill et al.,
Chem. Phys. Lett, 1976, 44, 225) by comparing the intensity of the CO2X peak with the
intensity of the synthetic peak related to C-C (sub).

Example 2: Retention of acid functionality in polyacrylic acid deposition on to a
polypropylene film using a diphenylethanedione Initiator.
[0059] The process described in example 1 was repeated using an alternative initiator,
diphenylethanedione (DPE), sold under the name Benzil by Sigma-Aldrich company Ltd,
Dorset, UK)
[0060] The addition of DPE initiator also led to noticeable improvements in the deposition
of plasma polymerised acrylic acid as shown in Table 3. In this case, concentrations of 0.5,
1.0,and 2.5% were compared to deposition with no initiator.


[0061] In the case of Example 2, Contact angle analysis was additionally undertaken in
order to assess the variation in hydrophilicity of resulting polyacrylic acid films prepared in
accordance with the present invention.
Contact Angle Analysis
[0062] Contact angle analysis was undertaken using a CAM 20 Optical Contact Angle
Meter apparatus (KSV Instruments LTD) which comprises a movable stage, an automated
syringe and an optical device for recording images of the drops. A 2µl drop of HPLC grade
water was deposited on each sample and an image of the droplet was recorded 30 seconds
after deposition. The contact angles of both sides of the drop were determined. In the
results provided in Table 4 below, it should be appreciated that the lower the water contact
angle, the more hydrophilic the deposited coating.


[0063] The water contact angle decreased from 99° for an untreated substrate, to 46° for a
substrate having a polyacrylic acid coating derived from an initiator-free acrylic acid
composition, however a very significant change is identified in the presence of the DPE
initiator whereby the angle drops to approximately 18° for each concentration showing a
significant improvement in hydrophilicity. It will be noted that the latter value is similar to the
value of water contact angle on conventionally polymerised polyacrylic acid of 15°.
Gas Phase Derivatisation (GPP)
[0064] Further analysis of the resulting coating was undertaken using GPD as described in
Chilkoti, A.; Ratner, B.D.; Briggs, D., Chem. Mater., 3, 1991, 51 -61 and further developed
by Alexander et al., Alexander, M.R.; Wright, P.V.; Ratner, B.D., Surf. Interface Anal., 24,
1996, 217-220 and Alexander, M.R.; Due, T.M., J. Mater. Chem., 8(4), 1998, 937 - 943.
GPD is frequently used to obtain unambiguous information about the chemical environment
of modified polymer surfaces. In the present case trifluoroethanol derivatisation was utilised
as a means of determining the retention of the carboxylic acid functional groups in the
polymer coating. The coating applied by the method in accordance with the present
invention was then derivatised with trifluoroethanol to distinguish between carboxylic acid
and carboxylic ester functionalities by the mechanism in Scheme 1 below:

[0065] Subsequent to GPD the resulting derivatised coating was analysed by XPS to
determine the retention of the carboxylic acid functional groups in the plasma polymerised
polyacrylic acid coatings. A comparison of the ratio of COOH: COOC is provided in Table 5.


[0066] As expected, conventionally polymerised polyacrylic acid has the highest
concentration of COOH retained in the coating (88%). The plasma polymerised acrylic acid
containing no benzil coating was seen to have 64% retention; indicating 36% of the acid
groups have been crosslinked to form carboxylic esters. The retention of carboxylic acid
increased with the use of initiator to 77%.
[0067] These results are in good agreement with previous observations from water contact
angle measurements and deposition rate, as shown by film thickness measurements.

WE CLAIM:
1. A method for forming a polymeric coating on a substrate surface, which method
comprises the steps of:
i. plasma treating a mixture comprising a free-radical initiated polymerisable
monomer having one or more free-radical polymerisabie groups in the
presence of a free radical initiator, wherein said plasma treatment is a soft
ionisation plasma process and the monomer and initiator are either premixed
and introduced into the plasma, in the form of a monomer and initiator gaseous
mixture or mixed atomised liquid or alternatively the monomer and initiator
are introduced into a plasma chamber separately, and
ii. depositing the resulting polymeric coating material produced during step (i)
onto a substrate surface.
2. A method as claimed in claim 1 wherein each monomer comprises at least one
unsaturated group.
3. A method as claimed in any one of the preceding claims wherein the monomer
comprises one or more functional groups selected from alcoholic groups, carboxylic
acid groups, carboxylic acid derivative groups, acrylate groups, alkylacrylate groups
and primary secondary or tertiary amino groups, alkyl halide groups, carbamate
groups, urethane groups, glycidyl and epoxy groups, glycol and polyglycol groups,
organic salts, organic groups containing boron atoms, phosphorus atoms, and sulphur
atoms, grafted or covalently bonded biochemical groups, grafted or covalently
bonded biochemical species.
4. A method as claimed in any one of the preceding claims wherein the monomer is
selected from one or more of acrylic acid, alkylacrylic acid, fumaric acid, maleic acid,
maleic anhydride, citraconic acid, cinnamic acid, itaconic acid, vinylphosphonic acid,
sorbic acid, mesaconic acid, citric acid, succinic acid, ethylenediamine tetracetic acid
(EDTA) and ascorbic acid and their derivatives; allyl amine, 2-aminoethylene, 3-

aminopropylene, 4-aminobutylene and 5-aminopentylene; acrylonitrile,
methacrylonitrile, acrylamide, alkylacrylamide, epoxy compounds, butadiene
monoxide, 2-propene-l-ol, 3-allyloxy-1,2,-propanediol, vinylcyclohexene oxide,
dimethylvinylphosphonate, diethyl allyl phosphate and diethyl allylphosphonate,
vinyl sulphonic acid, phenylvinylsulphonate, vinylsulphone, alkyl methacrylates,
glycidyl methacrylate, trimethoxysilyl propyl methacrylate, allyl methacrylate,
hydroxyethyl methacrylate, hydroxypropyl methacrylate, dialkylaminoalkyl
methacrylates, fluoroalkyl methacrylates and the corresponding acrylates, styrene, D-
methylstyrene and halogenated alkenes,.
5. A method as claimed in any one of the preceding claims wherein the substrate is
selected from metal, ceramic, plastics, siloxane, woven or non-woven fibres, natural
fibres, synthetic fibres cellulosic material and powder.
6. A method as claimed in any one of the preceding claims wherein the initiator is
selected from the group of diacyl peroxides, peroxydicarbonates
monoperoxycarbonates, peroxyketals, peroxyesters, dialkyl peroxides,
hydroperoxides, hydrazines, polysulphides, azo compounds, metal iodides, and metal
alkyls.
7. A method as claimed in any one of the preceding claims wherein the initiator is
selected from the group of benzoins, benzoin ethers, acetophenones, Benzil, benzil
ketals, anthraquinones, 1-chloroanthraquinones and 2-amylanthraquinone,
triphenylphosphine, benzoylphosphine oxides, benzophenones, thioxanones,
xanthones, acridine derivatives, phenzine derivatives, quinoxaline derivatives,
phenylketones, 1-aminophenylketones and 1-hydroxyphenylketones, 1-
hydroxycyclohexylphenyl ketone and triazine compounds.
8. A method as claimed in any one of the preceding claims wherein the plasma source
is non-thermal equilibrium plasma source, microwave plasma sources, corona
discharge sources, arc plasmas sources, DC magnetron discharge sources, helicon
discharge sources, capacitatively coupled radio frequency (rf) discharge sources,

inductively coupled rf discharge sources, low pressure pulsed plasma sources or
resonant microwave discharge sources.
9. A method as claimed in claim 8 wherein the plasma is generated by means of a non-
thermal equilibrium plasma selected from the group of atmospheric pressure glow
discharge, dielectric barrier discharge (DBD), low pressure glow discharge, plasma
jet, plasma knife and post discharge plasma.
10. A method as claimed in any one of the preceding claims wherein the monomer and
initiator may be premixed and introduced into the plasma in a single mixture.
11. A method as claimed in any one of the preceding claims characterised in that the
free radical initiator and the monomer may be separately plasma treated.
12. A substrate having a deposited coating obtainable by the method as claimed in any
one of claims 1 to 9.


ABSTRACT

METHOD FOR COATING A SUBSTRATE USING PLASMA
The invention discloses a method for forming a polymeric coating on a substrate surface,
which method comprises the steps of i) Plasma treating a mixture comprising a free-radical
initiated polymerisable monomer having one or more free-radical polymerisable groups in the
presence of a free radical initiator, wherein said plasma treatment is a soft ionisation plasma
process and the monomer and initiator are either premixed and introduced into the plasma, in
the form of a monomer and initiator gaseous mixture or mixed atomised liquid or
alternatively the monomer and initiator are introduced into a plasma chamber separately, and
ii) depositing the resulting polymeric coating material produced during step (i) onto a
substrate surface.

Documents:

01278-kolnp-2007-abstract.pdf

01278-kolnp-2007-assignment.pdf

01278-kolnp-2007-claims.pdf

01278-kolnp-2007-correspondence others 1.1.pdf

01278-kolnp-2007-correspondence others.pdf

01278-kolnp-2007-description complete.pdf

01278-kolnp-2007-form 1.pdf

01278-kolnp-2007-form 3.pdf

01278-kolnp-2007-form 5.pdf

01278-kolnp-2007-gpa.pdf

01278-kolnp-2007-international publication.pdf

01278-kolnp-2007-international search report.pdf

01278-kolnp-2007-pct request.pdf

1278-KOLNP-2007-(17-02-2012)-CORRESPONDENCE.pdf

1278-KOLNP-2007-ABSTRACT.pdf

1278-KOLNP-2007-AMANDED CLAIMS.pdf

1278-KOLNP-2007-ASSIGNMENT.pdf

1278-KOLNP-2007-CORRESPONDENCE.pdf

1278-KOLNP-2007-DESCRIPTION (COMPLETE).pdf

1278-KOLNP-2007-DRAWINGS.pdf

1278-KOLNP-2007-EXAMINATION REPORT.pdf

1278-KOLNP-2007-FORM 1.pdf

1278-KOLNP-2007-FORM 13.pdf

1278-KOLNP-2007-FORM 18.pdf

1278-KOLNP-2007-FORM 2.pdf

1278-KOLNP-2007-FORM 3.pdf

1278-kolnp-2007-form 5.pdf

1278-KOLNP-2007-GPA.pdf

1278-KOLNP-2007-GRANTED-ABSTRACT.pdf

1278-KOLNP-2007-GRANTED-CLAIMS.pdf

1278-KOLNP-2007-GRANTED-DESCRIPTION (COMPLETE).pdf

1278-KOLNP-2007-GRANTED-DRAWINGS.pdf

1278-KOLNP-2007-GRANTED-FORM 1.pdf

1278-KOLNP-2007-GRANTED-FORM 2.pdf

1278-KOLNP-2007-GRANTED-SPECIFICATION.pdf

1278-KOLNP-2007-MISCLLENIOUS.pdf

1278-KOLNP-2007-OTHERS 1.1.pdf

1278-KOLNP-2007-OTHERS.pdf

1278-KOLNP-2007-PETITION UNDER RULE 137-1.1.pdf

1278-KOLNP-2007-PETITION UNDER RULE 137.pdf

1278-KOLNP-2007-REPLY TO EXAMINATION REPORT.pdf


Patent Number 254963
Indian Patent Application Number 1278/KOLNP/2007
PG Journal Number 02/2013
Publication Date 11-Jan-2013
Grant Date 09-Jan-2013
Date of Filing 11-Apr-2007
Name of Patentee DOW CORNING IRELAND LIMITED
Applicant Address UNIT 12, OWENACURRA BUSINESS PARK, MIDLETON, CO CORK
Inventors:
# Inventor's Name Inventor's Address
1 O'NEILL, LIAM CLONMULT, DUNGOURNEY,MIDLETON, CO CORK
2 GOODWIN, ANDREW, JAMES 43 DEWBERRY, MOUNT OVAL VILLAGE, ROCHESTOWN, CO CORK
3 O'HARE, LESLEY, ANN 4 POPE'S QUAY COURT, CORK CITY
PCT International Classification Number B05D 3/14
PCT International Application Number PCT/GB2005/003929
PCT International Filing date 2005-10-12
PCT Conventions:
# PCT Application Number Date of Convention Priority Country
1 0423685.7 2004-10-26 U.K.