Title of Invention

IMAGE SENSOR ARCHITECTURE EMPLOYING ONE OR MORE FLOATING GATE DEVICES

Abstract A circuit for use in an image sensor as well as an image sensing system using the circuit are set forth. The circuit comprises a floating gate semiconductor device having a floating gate, a control gate, a drain and a source. The circuit also employs a photosensitive semiconductor device that is positioned for exposure to electromagnetic radiation from an image. A pixel control circuit is connected to these components to direct the floating gate semiconductor device and the photosensitive semiconductor device to a plurality of controlled modes. The controlled modes may include an erase mode and an exposure mode. In the erase mode, at least a portion of an electric charge is removed from the floating gate to place the floating gate semiconductor device in an initialized state. In the exposure mode, the floating gate is charged at least partially in response to a voltage at a terminal of the photosensitive semiconductor device. The voltage at the terminal of the photosensitive semiconductor device corresponds to exposure of the photosensitive semiconductor device to the electromagnetic radiation from the image. The pixel control circuit may also direct the floating gate semiconductor device and the photosensitive semiconductor device to further modes including a read mode and a data retention mode. In the read mode, current flow between the source and drain of the floating gate semiconductor device is detected as an indicator of the charge on the floating gate. In the data retention mode, the charge on the floating gate of the floating gate semiconductor device that was acquired during the exposure mode is maintained notwithstanding further exposure of the photosensitive semiconductor device to the electromagnetic radiation from the image. The circuit, and one or more peripheral support circuits, may be implemented in a monolithic substrate using, for example, conventional CMOS manufacturing processes.
Full Text WO 2007/001688
PCT/US2006/019724
IMAGE SENSOR ARCHITECTURE EMPLOYING ONE OR MORE
FLOATING GATE DEVICES
TECHNICAL FIELD
[0001] The present invention is generally directed to image sensor
technology. More particularly, the present invention includes an image sensor
architecture employing one or more floating gate devices.
BACKGROUND OF THE INVENTION
[0002] CMOS and CCD image sensors have found a wide range of
applications in both consumer and industrial products. Such applications include
stand-alone digital cameras, night time driving displays for automobiles, computer
peripherals, integrated cell phone cameras, etc.
[0003] Mobile technology has traditionally focused on the use of CMOS
image sensors for image capture. Consumer expectations, however, have driven
the market to use high-resolution CMOS image sensor arrays thereby giving rise
to a number of problems to the image sensor developer. First, size constraints
imposed by mobile technologies require a greater number of pixels per unit area of
the array. Pixel size must therefore be decreased in comparison to traditional
CMOS pixels. Such decreases in pixel size result in a corresponding reduction in
the dynamic range and sensitivity of the pixel. Second, image readout time from
such high-resolution image sensor arrays increases with the number of pixels
employed in the array. To reduce image degradation resulting from this increase
in readout time, an electronic global shutter mechanism should be employed.
Pixels employing an electronic global shutter, however, require a large number of
components resulting in a corresponding reduction of the pixel fill factor.
Accordingly, the present inventors have found a need in the industry for an
improved pixel architecture that addresses one or more of these shortcomings.
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BRIEF DESCRIPTION OF SEVERAL VIEWS OF THE DRAWINGS
[0004] The accompanying figures, where like reference numerals refer to
identical or functionally similar elements throughout the separate views and
which together with the detailed description below are incorporated in and
form part of the specification, serve to further illustrate various embodiments
and to explain various principles and advantages all in accordance with the
present invention.
[0005] Fig. 1 is a system block diagram of an exemplary embodiment of an
image acquisition circuit.
[0006] Fig. 2 is an exemplary schematic diagram of one embodiment of an
improved pixel architecture.
[0007] Fig. 3 is an exemplary schematic diagram of the pixel architecture
shown in Fig. 2 operating in the erase mode.
[0008] Fig. 4 is an exemplary schematic diagram of the pixel architecture
shown in Fig. 2 operating in the exposure mode.
[0009] Fig. 5 is an exemplary schematic diagram of the pixel architecture
shown in Fig. 2 operating in the data retention mode.
[0010] Fig. 6 is an exemplary schematic diagram of the pixel architecture
shown in Fig. 2 operating in the read mode.
[0011] Fig. 7 is an exemplary plan layout for the components of the pixel
architecture Fig. 2 in a monolithic substrate.
[0012] Figs. 8 and 9 illustrate an exemplary cellular phone having a camera
that employs the image acquisition circuitry shown in Fig. 1.
[0013] Skilled artisans will appreciate that elements in the figures are
illustrated for simplicity and clarity and have not necessarily been drawn to
scale. For example, the dimensions of some of the elements in the figures may
be exaggerated relative to other elements to help to improve understanding of
embodiments of the present invention.
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DETAILED DESCRIPTION OF THE DRAWINGS
[0014] Fig. 1 illustrates an image acquisition system, shown generally at
60, that employs an image array 65 comprising a plurality of pixel circuits 70
constructed in accordance with one exemplary embodiment of the present
invention. As shown, the pixel circuits 70 are arranged in the array 65 in a
plurality of rows and columns. Each row of pixel circuits 70 may be individually
addressed and, if desired, the output signals from an activated row may be read
concurrently.
[0015] In this exemplary embodiment, electromagnetic radiation 75 from
an image source is directed through a lens 80 and array overlay 85 onto
photosensitive components of the individual pixel circuits 70. Array overlay 85
may be constructed so that selected pixels are only exposed to certain wavelengths
within the spectrum of electromagnetic radiation 75. For example, array overlay
85 may selectively expose predetermined pixels 70 in the array 65 solely to red,
green or blue light pursuant to generating a color image.
[0016] A row selection circuit 90 is used to activate the readout of the pixel
circuits 70 in a given row of the image array 65. The output signals from the pixel
circuits 70 in the activated row are provided to a column read circuit 95. Column
read circuit 95 may be constructed in any number of different manners. For
example, column read circuit 95 may comprise a single correlated double
sampling (CDS) circuit that selectively reads individual columns of the array 65
when a single row of the array is selected through the row selection circuit 90. In
an alternate exemplary embodiment, a plurality of CDS circuits may be used so
that each column of the array 65 (or even fewer than all columns) may be
concurrently read by a respective CDS circuit. In other exemplary embodiments,
circuits providing a single readout from each pixel circuit 70 during a single read
cycle may be employed thereby negating the need for CDS circuitry. Preferably,
the analog signals from the pixel circuits 70 are converted by the column read
circuit 95 to a digital format which is then arranged into an image frame by a
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frame grabber 100. Timing for the various operations executed by system 60 is
preferably coordinated by a clock and timing generator circuit 105 or the like.
Frame grabber 100 may itself execute a number of image processing routines (i.e.,
image compression, enhancement, etc.) or provide image data at output 114
processing by one or more further systems.
[0017] One embodiment of a pixel circuit 70 suitable for use in the image
array 65 of system 60 is shown in Fig. 2. Generally stated, pixel circuit 70 is
comprised of a floating gate semiconductor device 115, a photosensitive
semiconductor device 117 and a pixel control circuit 120. The floating gate
semiconductor device 115 includes a drain 125, a source 130, a control gate 135
and a floating gate 140. In the illustrated exemplary embodiment, the
photosensitive semiconductor device 117 may be a pinned photodiode that is
positioned for exposure to electromagnetic radiation from an image that is to be
detected. The photodiode 117 of the illustrated exemplary embodiment includes an
anode 145 and a cathode 150.
[0018] The pixel control circuit 120 is connected to direct the floating gate
semiconductor device 115 and the photodiode 117 to a plurality of controlled
modes. These controlled modes include at least an erase mode and an exposure
mode. In the erase mode, at least a portion of an electric charge is removed from
the floating gate 140 of the floating gate semiconductor device 115. The voltage
across photodiode 117 may also be raised while in the erase mode. In this manner,
both the floating gate semiconductor device 115 and photodiode 117 are placed in
an initialized state.
[0019] In the exposure mode, the floating gate 140 of the floating gate
semiconductor device 115 is charged at least partially in response to a voltage at a
terminal of the photosensitive semiconductor device 117. In the illustrated
exemplary embodiment, the floating gate 140 is charged at least partially in
response to. the voltage at the anode 145 of photodiode 117. The voltage at anode
145 is dependent on the degree to which photodiode 117 is exposed to the
electromagnetic radiation from the image source. More particularly, there will be a
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voltage drop across photodiode 117 that corresponds to the electromagnetic
radiation exposure. The greater the exposure that photodiode 117 experiences, the
greater the voltage drop that will occur across photodiode 117 thereby reducing
the voltage at control gate 135.
[0020] Pixel control circuit 120 may also direct photodiode 117 and
floating gate semiconductor device 115 to a data retention mode. In the data
retention mode, the charge on the floating gate 140 acquired during the exposure
mode is maintained. Notably, the charge on the floating gate 140 remains
generally constant even though the voltage drop across photodiode 117 may
change. For example, once the floating gate 140 has been charged during the
exposure mode, the charge may be maintained on the floating gate 140 almost
indefinitely even if the photodiode 117 continues to be exposed to electromagnetic
radiation from the image source.
[0021] Pixel control circuit 120 may also direct photodiode 117 and
floating gate semiconductor device 115 to a read mode to effectively sense the
charge placed on floating gate 140 during the exposure mode. In the illustrated
exemplary embodiment, the charge on floating gate 140 alters the threshold
voltage Vj of the floating gate semiconductor device 115. Consequently, a
predetermined voltage VGS may be provided between the control gate 135 and
source 130 of the floating gate semiconductor device 115 to produce a current 155
between the drain 125 and source 130 that corresponds to the charge on floating
gate 140.
[0022] As shown, pixel control circuit 120 may include a transistor switch
160 and a diode 165. Transistor switch 160 may be a field effect transistor, such
as a MOSFET or the like, having a drain 170, source 175 and control gate 180.
Control gate 180 is connected to receive a row read signal from, for example, row
selection circuit 90 of Fig. 1. The drain 170 and source 175 of MOSFET 160 are
respectively connected to the cathode 150 and anode 145 of photodiode 117.
Diode 165 includes an anode 180 that is connected to a node 182 that includes the
source 175 of MOSFET 160 and the control gate 135 of floating gate
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semiconductor device 115. Diode 165 also includes a cathode 185 that is
connected to receive a reset/erase signal. Various components used to generate
the operating voltage levels at the drain 170, drain 125 and source 130 are not
illustrated in Fig. 3 but are well within the design capabilities of those skilled in
the art given the detailed description of the various controlled modes set forth
herein.
[0023] Figs. 3 through 6 show the pixel architecture 70 of Fig. 2 in the
various modes of operation discussed above. Exemplary voltage levels for
operating in these modes are identified. However, it will be recognized that the
specific voltage levels required to operate the pixel architecture 70 in the various
modes will depend on the characteristics of the individual devices that are
employed.
[0024] Fig. 3 shows the pixel architecture 70 in the erase mode of
operation. In this mode, drains 170 and 125 as well as source 130 are driven to +8
V while the row read signal at gate 180 and the reset/erase signal at cathode 185
are driven to -8 V. This places floating gate semiconductor 115 and MOSFET 160
into non-conductive states so that current 155 and current 195 are approximately
zero. The diode 165 is forward biased to discharge floating gate 140. At least a
portion of the resulting discharge current is depicted at arrow 200. Additionally,
photodiode 117 is charged to an initial state with a voltage drop of approximately
15.2 VDC thereacross.
[0025] Fig. 4 shows the pixel architecture 70 in the exposure mode of
operation. In this mode, drain 125 and cathode 185 are driven to +8 V while the
row read signal at gate 180 and source 130 are driven to 0 V. This places
MOSFET 160 and diode 165 into non-conductive states so that current 195 and
current 200 are approximately zero. Additionally, the voltage levels at drain 170
and cathode 150 are elevated to a "programming voltage" of+12 V. Photodiode
117 is exposed to electromagnetic radiation 75 which causes a corresponding
voltage drop between the cathode 150 and anode 145. The voltage at control gate
135 reflects this voltage drop and thus corresponds to the amount of
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electromagnetic radiation detected at photodiode 117. This control gate voltage, in
turn, determines the amount of charge placed on floating gate 140 during the
exposure mode.
[0026] Fig. 5 shows the pixel architecture 70 in the data retention mode of
operation. In this mode, drain 125 and cathode 185 are driven to +8 V while the
row read signal at gate 180 and source 130 are driven to 0 V. This places
MOSFET 160 and diode 165 into non-conductive states so that current 195 and
current 200 are approximately zero. The voltage level at cathode 150 of
photodiode 117 is reduced to +8 V thereby inhibiting further accumulation of
charge on the floating gate 140. Still further, drain 125 is open circuited or
otherwise connected to a high impedance load to prevent current flow through the
floating gate semiconductor device 115. Current 155 is therefore approximately
zero. In this state, the charge on floating gate 140 can remain relatively constant
over a prolonged period of time. Since the charge on floating gate 140 can be
retained within the individual pixel circuits 70 of the image array 65, the image
processing requirements imposed on peripheral circuits, if any, can be relaxed.
The cost and complexity of any such image processing peripheral circuits can
therefore be reduced, if desired.
[0027] Fig. 6 shows the pixel architecture 70 in the read mode of operation.
In this mode, drains 170 and 125, gate 180 and cathode 185 are driven to +8 V
while the source 130 is driven to 0 V. This places control gate 135 at a fixed
voltage of approximately +8 V with respect to source 130. As such, VGS is
approximately +8 V and the current 155 proceeding through the pixel output
corresponds to the charge on floating gate 140. Conversion of current 155 into an
appropriate digital signal may take place in the column read circuit 95, which may
be implemented in any number of different manners as understood by those of
ordinary skill in the art.
[0028] The pixel architecture 70 is easily implemented in a monolithic
substrate. More particularly, the pixel architecture 70 may be readily
manufactured using existing CMOS manufacturing processes to form the image
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array 65 shown in Fig. 1. An exemplary plan layout for the components of pixel
architecture 70 in a monolithic substrate is illustrated in Fig. 7. It will be
recognized, however, that other layouts may be employed. Further, any of the
peripheral components, such as row selection circuit 90, column read circuit 95,
frame grabber 100 and clocking and timing generator 105 of Fig. 1 may likewise
be integrated with the image array 65 in a monolithic substrate.
[0029] Because pixel architecture 70 is centered about a floating gate
semiconductor device 115, the pixel, including the components necessary to
implement the global reset function, can be implemented with fewer components
when compared to a 5T pixel architecture. In the specific pixel circuit architecture
shown in Fig. 2, only two transistors 115 and 160 and a single diode 165 are used
in conjunction with photodiode 117 thereby facilitating a 2T1D structure. By
employing a floating gate semiconductor device 115, it becomes possible to place
the pixel circuit 70 into various controlled modes by manipulating the voltage
levels provided to the pixel circuit components as opposed to adding further
switching transistors to achieve the same operations.
[0030] The reduction in the number of components employed to implement
the pixel circuit 70 can be used to achieve any number of different objectives. For
example, pixel circuit 70 may be manufactured so that its fill factor is comparable
to conventional 3T CMOS image sensor architectures. Further, circuit 70 can be
implemented so that it has a much higher sensitivity and larger dynamic range
when compared with 4T and 5T CMOS image sensor architectures. As disclosed
herein, the pixel circuit 70 may employ higher operating voltages during the
exposure mode thereby improving the performance of photodiode 117 and
rendering it comparable to the performance of similar CCD image sensors.
[0031] Pixel circuit 70 may also be implemented so that the read mode of
operation is similar to the readout methods employed in conventional CMOS
image sensors. For example, each pixel circuit 70 may be individually addressed
to achieve the same windowing and sub-sampling advantages that exist in
conventional CMOS sensors thereby obviating the need for substantial redesign of
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corresponding peripheral readout components. Further, the floating gate
semiconductor device 115 does not have charge leakage issue and it does not have
charge recombination issues as a result of under visible light illumination. Thus it
does not have the fading issues associated with the 5T CMOS architecture.
[0032] One embodiment of a cellular phone 205 that may include a camera
that employs the image acquisition system 60 is shown in Figs. 8 and 9. As shown,
phone 205 includes a camera system 210, a keyboard 215, control keys 220 and a
display 225. As noted above, image acquisition system 60 receives
electromagnetic radiation from the image source through lens 80. The acquired
image can be provided to an on-board image processing system 230 or directly to
display 225 (i.e., for viewfinder functionality, etc.). Processed images may be
stored in image storage 235 and provided to display 225 in response to user
commands. Further, the images in image storage 235 may be read out therefrom
for provision to a personal computer or the like via communication link 240.
[0033] Numerous modifications may be made to the foregoing system
without departing from the basic teachings thereof. Although the present
invention has been described in substantial detail with reference to one or more
specific embodiments, those of skill in the art will recognize that changes may be
made thereto without departing from the scope and spirit of the invention as set
forth in the appended claims.
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CLAIMS
1. A circuit for use in an image sensor, the circuit comprising:
a floating gate semiconductor device having a floating gate, a
control gate, a drain and a source;
a photosensitive semiconductor device positioned for exposure to
electromagnetic radiation from an image;
a pixel control circuit connected to direct said floating gate
semiconductor device and said photosensitive semiconductor device to a plurality
of controlled modes, said controlled modes including
an erase mode in which at least a portion of an electric
charge is removed from said floating gate to place said floating gate
semiconductor device in an initialized state,
an exposure mode in which said floating gate is charged at
least partially in response to a voltage at a terminal of said photosensitive
semiconductor device, said voltage at said terminal corresponding to
exposure of said photosensitive semiconductor device to said
electromagnetic radiation from said image.
2. A circuit as claimed in claim 1 wherein said controlled modes
further include a data retention mode in which the charge on said
floating gate of said floating gate semiconductor device acquired
during said exposure mode is maintained thereon notwithstanding
further exposure of said photosensitive semiconductor device to said
electromagnetic radiation from said image.
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3. A circuit as claimed in claim 1 wherein said controlled modes
further include a read mode in which current flow between said
source and drain of said floating gate semiconductor device is
detected as an indicator of the charge on said floating gate.
4. A circuit as claimed in claim 2 wherein said controlled modes
further include a read mode in which current flow between said
source and drain of said floating gate semiconductor device is
detected as an indicator of the charge on said floating gate.

5. A circuit as claimed in claim 1 wherein said photosensitive
semiconductor device is a photodiode having an anode and a
cathode.
6. A circuit as claimed in claim 4 wherein said photosensitive
semiconductor device is a photodiode having an anode and a
cathode.
7. A circuit as claimed in claim 6 wherein said pixel control circuit
comprises:
a transistor switch connected between said anode and cathode of
said photodiode, said transistor switch having a control terminal for controlling the
conductive state of said transistor switch;
a diode connected to drain at least a portion of a charge from said
floating gate of said floating gate semiconductor device in response to an erase
signal.
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8. A circuit as claimed in claim 6 wherein said pixel control circuit
comprises:
a FET transistor having a control gate, a drain connected to said
cathode of said photodiode, and a source connected to said anode of said
photodiode, said source of said FET transistor and said anode of said photodiode
being further connected to said control gate of said floating gate semiconductor
device;
a diode having an anode connected to said control gate of said
floating gate semiconductor device.
9. A circuit as claimed in claim 8 wherein said erase mode comprises
said FET switch and said floating gate semiconductor device in non-
conductive states, said photodiode at an initial voltage state, and
said floating gate of said floating gate semiconductor device
discharging through said diode.
10. A circuit as claimed in claim 8 wherein said exposure mode
comprises said FET switch and said diode each in a non-conductive
state, said cathode of said photodiode raised to an exposure voltage
level, and said drain and source of said floating gate semiconductor
device having a voltage thereacross sufficient to charge said floating
gate in response to voltage levels at said anode of said photodiode.
11. A circuit as claimed in claim 8 wherein said data retention mode
comprises said FET switch and said diode each in a non-conductive
state, said cathode of said photodiode at a retention voltage level,
and said source of said floating semiconductor device effectively
open circuited.
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12. A circuit as claimed in claim 8 wherein said read mode comprises a
predetermined voltage at said control gate of said floating gate of
said floating gate semiconductor device and a current flow between
said drain and said source of said floating gate semiconductor
device indicative of the charge placed on said floating gate during
said exposure mode.
13. A monolithic image sensor formed in a substrate, said image sensor
having a plurality of pixels, one or more of said plurality of pixels
comprising:
a floating gate semiconductor device formed in said substrate, said
floating gate semiconductor device having a floating gate, a control gate, a drain
and a source;
a photosensitive semiconductor device formed in said substrate and
positioned for exposure to electromagnetic radiation from an image;
a pixel control circuit formed in said substrate and connected to
direct said floating gate semiconductor device and said photosensitive
semiconductor device to a plurality of controlled modes, said controlled modes
including
an erase mode in which at least a portion of an electric
charge is removed from said floating gate to place said floating gate
semiconductor device in an initialized state,
an exposure mode in which said floating gate is charged at
least partially in response to a voltage at a terminal of said photosensitive
semiconductor device, said voltage at said terminal corresponding to
exposure of said photosensitive semiconductor device to said
electromagnetic radiation from said image.
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14. A monolithic image sensor as claimed in claim 13 wherein said
controlled modes further include a data retention mode in which the
charge on said floating gate of said floating gate semiconductor
device acquired during said exposure mode is maintained thereon
notwithstanding further exposure of said photosensitive
semiconductor device to said electromagnetic radiation from said
image.
15. A monolithic image sensor as claimed in claim 13 wherein said
controlled modes further include a read mode in which current flow
between said source and drain of said floating gate semiconductor
device is detected as an indicator of the charge on said floating gate.
16. An image sensor, said image sensor having a plurality of pixels
formed in a monolithic substrate, one or more of said plurality of
pixels comprising:
a floating gate semiconductor device having a floating gate, a
control gate, a drain and a source;
a photodiode positioned for exposure to electromagnetic radiation
from an image;
a FET transistor having a control gate, a drain connected to said
cathode of said photodiode, and a source connected to said anode of said
photodiode, said source of said FET transistor and said anode of said photodiode
being further connected to said control gate of said floating gate semiconductor
device;
a diode having an anode connected to said control gate of said
floating gate semiconductor device.
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17. An image sensor as claimed in claim 16 wherein said image sensor
is operable in an erase mode in which said FET switch and said
floating gate semiconductor device are in non-conductive states,
said photodiode is at an initial voltage state, and said floating gate of
said floating gate semiconductor device is discharged through said
diode.
18. An image sensor as claimed in claim 16 wherein said image sensor
is operable in an exposure mode in which said FET switch and said
diode are each in a non-conductive state, said cathode of said
photodiode is raised to an exposure voltage level, and said drain and
source of said floating gate semiconductor device have a voltage
thereacross sufficient to charge said floating gate in response to the
voltage at said anode of said photodiode.
19. An image sensor as claimed in claim 16 wherein said image sensor
is operable in a data retention mode in which said FET switch and
said diode are each in a non-conductive state, said cathode of said
photodiode is lowered to a retention voltage level, and said source
of said floating semiconductor device is effectively open circuited.
20. An image sensor as claimed in claim 18 wherein said image sensor
is operable in a read mode in which a predetermined voltage is
provided at said control gate of said floating gate of said floating
gate semiconductor device and a current flow between said drain
and said source of said floating gate semiconductor device is
indicative of the charge placed on said floating gate during said
exposure mode.
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21. A digital camera comprising:
an image sensor having an array of pixels, one or more of said
pixels including
a floating gate semiconductor device having a floating gate,
a control gate, a drain and a source,
a photosensitive semiconductor device positioned for
exposure to electromagnetic radiation from an image,
a pixel control circuit connected to direct said floating gate
semiconductor device and said photosensitive semiconductor device to a
plurality of controlled modes, said plurality of controlled modes including
an erase mode in which at least a portion of an electric charge is removed
from said floating gate to place said floating gate semiconductor device in
an initial state for exposure to said electromagnetic radiation, an exposure
mode in which said floating gate is charged at least partially in response to
a voltage at a terminal of said photosensitive semiconductor device, said
voltage at said terminal corresponding to exposure of said photosensitive
semiconductor device to said electromagnetic radiation from said image,
and a read mode in which a predetermined voltage is provided at said
control gate of said floating gate of said floating gate semiconductor device
and a current flow between said drain and said source of said floating gate
semiconductor device is indicative of the charge placed on said floating
gate during said exposure mode;
an image sensor readout circuit connected to obtain image data from
each of said pixels during said read mode;
a frame grabber connected to arrange image data obtained by said
image sensor readout into an image frame.
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22. A digital camera as claimed in claim 21 wherein said controlled
modes further include a data retention mode in which the charge on
said floating gate of said floating gate semiconductor device
acquired during said exposure mode is maintained thereon
notwithstanding further exposure of said photosensitive
semiconductor device to said electromagnetic radiation from said
image.
23. A method for operating a pixel in an image sensor, said pixel being
comprised of a floating gate semiconductor device having a floating
gate, a control gate, a drain and a source, and a photosensitive
semiconductor device positioned for exposure to electromagnetic
radiation from an image, said method comprising the steps of:
driving said floating gate semiconductor device and said
photosensitive semiconductor device into an erase mode in which at least a portion
of an electric charge is removed from said floating gate to place said floating gate
semiconductor device in an initial state for exposure to said electromagnetic
radiation; and
driving said floating gate semiconductor device and said
photosensitive semiconductor device into an exposure mode in which said floating
gate is charged at least partially in response to a voltage at a terminal of said
photosensitive semiconductor device, said voltage at said terminal corresponding
to exposure of said photosensitive semiconductor device to said electromagnetic
radiation from said image.
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24. A method as claimed in claim 23 and further comprising the step of
driving said floating gate semiconductor device and said
photosensitive semiconductor device into a data retention mode in
which the charge on said floating gate of said floating gate
semiconductor device acquired during said exposure mode is
maintained thereon notwithstanding further exposure of said
photosensitive semiconductor device to said electromagnetic
radiation from said image.
25. A method as claimed in claim 23 and further comprising the steps
of:
driving said floating gate semiconductor device and said
photosensitive semiconductor device into a read mode in which current flow
between said source and drain of said floating gate semiconductor device is
indicative of the charge on said floating gate; and
sensing said current flow between said source and drain of said
floating gate semiconductor device.
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26. A method as claimed in claim 23 wherein said photosensitive
semiconductor device is a photodiode having an anode and a
cathode, and wherein said pixel further comprises a FET transistor
having a control gate, a drain connected to said cathode of said
photodiode, and a source connected to said anode of said
photodiode, said source of said FET transistor and said anode of
said photodiode being further connected to said control gate of said
floating gate semiconductor device, said pixels still further
comprising a diode having an anode connected to said control gate
of said floating gate semiconductor device, said step of driving said
pixel to said erase mode comprising:
driving said FET switch and said floating gate semiconductor device
to non-conductive states;
driving said photodiode to an initial voltage state; and
at least partially discharging said floating gate of said floating gate
semiconductor device through said diode.
27. A method as claimed in claim 27 wherein said step of driving said
pixel in said exposure mode comprises:
driving said FET switch and said diode each into a non-conductive
state;
driving said cathode of said photodiode to an exposure voltage
level; and
driving the voltage across said drain and source of said floating gate
semiconductor device to a voltage sufficient to charge said floating gate in
response to voltage levels at said anode of said photodiode.
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28. A method as claimed in claim 27 wherein said step of driving said
pixel in said data retention mode comprises:
driving said FET switch and said diode into non-conductive states,
driving said cathode of said photodiode to a retention voltage level,
and
driving said source of said floating semiconductor device to an
effective open circuited state.
20


A circuit for use in an image sensor as well as an image sensing system using the circuit are set forth. The circuit comprises a floating gate semiconductor device having a floating
gate, a control gate, a drain and a source. The circuit also employs a photosensitive semiconductor device that is positioned for exposure to electromagnetic radiation from an image. A pixel control circuit is connected to these components to direct the floating gate
semiconductor device and the photosensitive semiconductor device to a plurality of controlled modes. The controlled modes may
include an erase mode and an exposure mode. In the erase mode, at least a portion of an electric charge is removed from the floating
gate to place the floating gate semiconductor device in an initialized state. In the exposure mode, the floating gate is charged at
least partially in response to a voltage at a terminal of the photosensitive semiconductor device. The voltage at the terminal of the
photosensitive semiconductor device corresponds to exposure of the photosensitive semiconductor device to the electromagnetic
radiation from the image. The pixel control circuit may also direct the floating gate semiconductor device and the photosensitive
semiconductor device to further modes including a read mode and a data retention mode. In the read mode, current flow between the source and drain of the floating gate semiconductor device is detected as an indicator of the charge on the floating gate. In the data retention mode, the charge on the floating gate of the floating
gate semiconductor device that was acquired during the exposure mode is maintained notwithstanding further exposure of the photosensitive semiconductor device to the electromagnetic radiation from the image. The circuit, and one or more peripheral support circuits, may be implemented in a monolithic substrate using, for example, conventional CMOS manufacturing processes.

Documents:

http://ipindiaonline.gov.in/patentsearch/GrantedSearch/viewdoc.aspx?id=7FgxNONe7FkZV1+h7rMiog==&loc=wDBSZCsAt7zoiVrqcFJsRw==


Patent Number 270557
Indian Patent Application Number 4800/KOLNP/2007
PG Journal Number 01/2016
Publication Date 01-Jan-2016
Grant Date 30-Dec-2015
Date of Filing 10-Dec-2007
Name of Patentee MOTOROLA, INC.
Applicant Address 1303 EAST ALGONQUIN ROAD, SCHAUMBURG, ILLINOIS
Inventors:
# Inventor's Name Inventor's Address
1 SHURBOFF CARL L 1778 FAIRPORT DRIVE, GRAYSLAKE, ILLINOIS 60030
2 HE FAN 133 MAINSAIL DRIVE, GRAYSLAKE, ILLINOIS 60030
PCT International Classification Number H04N 5/335
PCT International Application Number PCT/US2006/019724
PCT International Filing date 2006-05-23
PCT Conventions:
# PCT Application Number Date of Convention Priority Country
1 11/168945 2005-06-28 U.S.A.