| Title of Invention | "EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD'' |
|---|---|
| Abstract | Exposure equipment (EX) exposes a board (P) by irradiating the board (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ). The exposure equipment (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined plane (2), which faces the front plane of the board (P) and is inclined against the front plane of the board (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed on the inclined plane (2). A flat part (75) is provided between the board (P) and the projection optical system (PL). A liquid immersion area can be maintained small. |
| Full Text | Exposure equipment (EX) exposes a board (P) by irradiating the board (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ). The exposure equipment (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined plane (2), which faces the front plane of the board (P) and is inclined against the front plane of the board (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed on the inclined plane (2). A flat part (75) is provided between the board (P) and the projection optical system (PL). A liquid immersion area can be maintained small. |
|---|
| Patent Number | 272634 | ||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Indian Patent Application Number | 3821/KOLNP/2006 | ||||||||||||||||
| PG Journal Number | 16/2016 | ||||||||||||||||
| Publication Date | 15-Apr-2016 | ||||||||||||||||
| Grant Date | 13-Apr-2016 | ||||||||||||||||
| Date of Filing | 19-Dec-2006 | ||||||||||||||||
| Name of Patentee | NIKON CORPORATION | ||||||||||||||||
| Applicant Address | 15-3, Konan 2- chome, Minato-kuTokyo 108-6290 | ||||||||||||||||
Inventors:
|
|||||||||||||||||
| PCT International Classification Number | G03F7/20; H01L21/027 | ||||||||||||||||
| PCT International Application Number | PCT/JP2005/010576 | ||||||||||||||||
| PCT International Filing date | 2005-06-09 | ||||||||||||||||
PCT Conventions:
|
|||||||||||||||||