Title of Invention	PROCESS FOR PREPARING PALLADIUM (0) COMPOUNDS
Abstract	The present invention relates to a process for preparing a palladium (0) compound, comprising the reaction of a palladium compound with one or more compounds of the general formula I, II or III in the presence of a base: The palladium (o) compounds are suitable as homogeneous catalysts, as a precursor for preparing homogeneous catalysts, as a precursor for preparing homogeneous catalysts in situ or as a precursor for preparing heterogeneous catalysts.

Title of Invention

PROCESS FOR PREPARING PALLADIUM (0) COMPOUNDS

Abstract

The present invention relates to a process for preparing a palladium (0) compound, comprising the reaction of a palladium compound with one or more compounds of the general formula I, II or III in the presence of a base: The palladium (o) compounds are suitable as homogeneous catalysts, as a precursor for preparing homogeneous catalysts, as a precursor for preparing homogeneous catalysts in situ or as a precursor for preparing heterogeneous catalysts.

Full Text	Process for preparing palladium(0) compounds The present invention relates to a process for preparing palladium(0) compounds. In the form of its compounds, palladium finds use as a catalyst in numerous industrial processes. More than 80% of the industrially produced chemicals are prepared by catalytic processes. Catalytic processes are generally more economically viable and environmentally friendly than corresponding stoichiometric organic reactions. For the attainment of high yields and selectivities in homogeneous catalytic processes, a wide range of ligand systems has to be used, which in turn requires precursor metal compounds having a wide range of uses. This makes clear the need for constant improvement in the catalyst systems and their preparation processes. For these applications, one possibility is in particular palladium compounds which contain palladium in the 0 oxidation state. In general, palladium(0) compounds are stabilized by compounds which can provide a free electron pair for coordination. This free electron pair may be provided, for example, by an unsaturated hydrocarbon or by heteroatoms such as phosphorus or nitrogen. Stably storable compounds are commercially obtainable principally only in solid form. However, compounds which are in liquid form are desired in catalysis. This greatly eases their usability. Often, solid compounds are dissolved in a solvent for this purpose, but solutions of solid Pd(0) compounds are usually unstable and have to be used immediately. In homogeneous catalysis applications, the precursors used are preferably compounds which can be mixed in a simple manner with ligands, for example different phosphines, so as to be able to prepare a wide range of catalysis systems. This is realized, for example, in the case of the Pd(0) compounds stabilized with unsaturated hydrocarbon ligands. Numerous Pd(0) complexes with unsaturated compounds in the ligands sphere are known and are described, for example, in Wilkinson, Abel "Comprehensive Organometallic Chemistry", Vol. 6, p. 243ff "Complexes of Palladium(0)". Pd(0) compounds stabilized by unsaturated hydrocarbons may be differentiated according to the ligands into complexes stabilized by monodentate and by multidentate (chelating) ligands. An example of a Pd(0) complex stabilized by monodentate hydrocarbon ligands is Pd(ethylene)3, which decomposes at room temperature and under air. Stabler Pd(0) compounds are obtained by chelating, for example bidentate, unsaturated hydrocarbon ligands such as dienes. Dienes are classified according to the separation of the two diene functions into 1,4-diene ligands, 1,5-diene ligands, 1,6-diene ligands, 1,7-diene ligands, etc. 1,4-Diene-stabilized palladium(O) finds wide use as a ligand, for example, in the form of 1,5-diphenyl-1,4- pentadien-3-one (dba). One description of the synthesis is given by M.F. Rettig et al. in Inorg. Synth., 1990, 28. The product is isolated from the synthesis solution as a sparingly soluble precipitate. The solid is substantially air-stable, but solutions in organic solvents of these compounds decompose within hours (STREM catalogue: "Chemicals for research", Catalogue No. 19, 2001-2003) . The use of this complex type as a precursor in homogeneous catalysis is described, for example, in US-B-6,316,380. In EP-A-508 264, Pd(dba)2 substituted by sulphoalkyl groups is used as homogeneous catalyst in C-C coupling. A known example of Pd(0) stabilized by 1,5-diene ligand is Pd(COD)2. This is synthesized in DE-A-25 55 374 from Pd(COD)Cl2 in the presence of an organometallic compound, for example Li2(COT) (COT = cyclooctatraene), sodium naphthalide or organoaluminium compounds, in solvents having no active protons. The above patent application also describes the synthesis of Pd(C2H4)3 from Pd(COD)2. Pd(COD)2 is an unstable solid which decomposes within hours under atmospheric conditions. This property makes this compound industrially utilizable only to a limited extent. J. Krause, G. Cestaric, K.-J. Haack, K. Seevogel, W. Storm, K.R. Porschke (J. Am. Chem. Soc. 1999, 121, 9807-9823 and Chem. Commun. 1998, 12, 1291) describe the synthesis of molecularly defined hepta-1,6-diene-, diallyl ether- and tetramethyldivinyldisiloxane- palladium(0), which are examples of Pd(0) stabilized by 1,6-diene ligands. The synthesis follows substantially the route described for Pd(COD)2. Oxygen-free solvents have to be used for the synthesis and the materials have decomposition temperatures close to room temperature . For application in homogeneous catalysis, 1,6-diene- Pd(0)-phosphine and -carbene complexes have been identified. These compounds exhibit high activities in the industrially used Heck reaction and the Suzuki C-C coupling reaction, and are described by M.G. Andreu, A. Zapf, M. Beller in Chem. Comm., 2000, 245 and in DE-A-100 62 577. In the prior art, 1,4-diene-stabilized Pd(0) compounds are used industrially. These exhibit sufficient stability, but solutions of these compounds are not storage-stable. 1,5- and 1,6-diene-stabilized Pd(0) compounds are distinctly less stable than the 1,4-diene-stabilized Pd(0) compounds. In all diene- stabilized Pd(0) compounds, it is typically necessary to work under inert gas and with dried solvents having no active protons in order to isolate molecularly defined Pd2(diene)3 or Pd(diene)2 compounds. In addition, highly sensitive organolithium compounds which pose potential health risks are used in the synthesis, which makes industrial-scale utilization costly and inconvenient. For this reason, these compound classes have not been used industrially on a large scale to date. It is therefore an object of the present invention to provide a novel inexpensive process for preparing palladium(0) compounds. Solutions of these compounds should be substantially stable thermally and toward atmospheric conditions. This enables access to economically viable, versatile, novel precursors for applications in homogeneous catalysis, heterogeneous catalysis and complex chemistry. In particular, the invention relates to a process for preparing a Palladium(0) compound, comprising reaction of a palladium compound with one or more compounds of the general formula (I) in the presence of a base: in which: each A is independently a CR7R8 radical where one of the A radicals may be oxygen, sulphur, an NR9 group or an SiR10R11 group, or where the A radicals may be a constituent of a 5- to 20-membered ring system, x is an integer from 2 to 4, and each R1 to R11 is independently selected from R, OR, halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si (R)3, Si (OR)3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is a hydrogen atom, a substituted or unsubstituted C1-10-alkyl radical, a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, and the substituents on the alkyl radical or the alkenyl radical are selected from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, and the substituents on the aryl radical are selected from halogen, C1-10-alkyl, O-C1-10-alkyl, phenyl, 0- phenyl, OH, NH2 and halogenated C1-10-alkyl, where R2 and R3 and/or R5 and R6 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom-containing ring. In a further embodiment, the invention relates to a process for preparing a Palladium(0) compound, comprising reaction of a palladium compound with one or more compounds of the general formula II in the presence of a base: in which: n is an integer from 3 to 20, each R3 to R15 is independently selected from R, OR, halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si (R)3, Si (OR) 3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is hydrogen, a substituted or unsubstituted C1-10-alkyl radical, a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom- containing C5-10-aryl radical, and the substituents on the alkyl radical or the alkenyl radical are selected from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, and the substituents on the aryl radical are selected from halogen, C1-10-alkyl, O- C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, where R13 and R14 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom-containing ring, and each R12 is independently selected from hydrogen, a hydroxyl group, a substituted or unsubstituted C1-10- alkyl radical (in particular an unsubstituted or halogenated C1-10-alkyl radical) , an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted; in particular an unsubstituted or halogenated-O-C1-10-alkyl radical), a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, where the substituents are as defined for R13 and R15. In yet a further embodiment, the invention relates to a process for preparing a Palladium(0) compound, comprising reaction of a palladium compound with one or more compounds of the general formula III in the presence of a base: Term-O-{ [Si (R16) (CR19CR17R18) 0] v [Si (R20)2O] w}-Term (III) in which v and w are each independently 0 or an integer of from 1 to 1000 and v+w is from 0 to 1000, each R16 is independently selected from a hydrogen atom, a hydroxyl group, a substituted or unsubstituted C1-10- alkyl radical (in particular an unsubstituted or halogenated C1-10-alkyl radical), an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted; in particular an unsubstituted or halogenated -O-C1-10-alkyl radical), a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, where the substituents are as defined for R17 and R19, each R17 to R19 is independently selected from R, OR, halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si (OR)3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is hydrogen, a substituted or unsubstituted C1-10-alkyl radical, a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom- containing C5-10-aryl radical, and the substituents on the alkyl radical or the alkenyl radical are selected from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, and the substituents on the aryl radical are selected from halogen, C1-10-alkyl, 0- C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, where R17 and R19 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom-containing ring, each R20 is independently selected from hydrogen, a hydroxyl group, a substituted or unsubstituted C1-10- alkyl radical (in particular an unsubstituted or halogenated C1-10-alkyl radical) , an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted in particular an unsubstituted or halogenated -O-C1-10-alkyl radical), a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, where the substituents are as defined for R17 and R19, and each Term radical is independently (R16)2 (CR17R18CR19) Si- or (R16)3Si-. Surprisingly, the above-described processes, unlike the processes known to date, can be carried out at temperatures above 0°C. In addition, the reaction does not have to be carried out with exclusion of air or with dried solvents. In the palladium(O) compounds, palladium is present as palladium(0). The oxidation state of palladium in the compounds can be determined by known processes, for example by reacting with uncharged ligands (for example phosphines) , isolating and characterizing the resulting compound with NMR, or by concentrating the solution by evaporation and determining the oxidation state by means of XPS. Palladium compound The palladium compound used as the starting compound is not particularly restricted. It may be used either in the form of solids or in the form of aqueous or hydrochloric acid solutions. Preference is given to using palladium compounds having palladium in the +2 or +4 oxidation state. Examples thereof are PdX2, PdX4, M2PdX4, M2PdX6, (NH3)2PdX2 and [Pd(NH3)4]X2, where M is a cation (e.g.: a hydrogen atom, an alkali metal (in particular Na+ or K+) or NR4+ (R = hydrogen, C1-4 alkyl)) and X is an anion (e.g.: halogen (in particular chlorine), NO3-) . Particularly preferred palladium compounds are PdCl2, PdCl4, Pd(NO3)2, [Pd (NH3)4] Cl2, (NH3)2PdCl2, H2PdCl4, H2PdCl6, Na2PdCl4, Na2PdCl6, K2PdCl4 and K2PdCl6. Ligand of the general formula I The palladium compound is reacted with one or more compounds of the general formula I Each A is independently a CR7R8 radical where one of the A radicals may be oxygen, sulphur, an NR9 group or an SiR10R11 group, or where the A radicals may be a constituent of a 5- to 20-membered ring system. x is an integer of from 2 to 4. Each R1 to R11 is independently selected from R, OR, halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si(OR)3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is hydrogen, a substituted or unsubstituted C1-10-alkyl radical, a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom- containing C5-10-aryl radical, and the substituents on the alkyl radical or the alkenyl radical are selected from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, and the substituents on the aryl radical are selected from halogen, C1-10-alkyl, O- C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, where R2 and R3 and/or R5 and R6 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom-containing ring. Examples of heteroatom-containing rings are rings which derive from the following structures: thiophenes, furans, pyrans, pyrroles and the like. Other rings are likewise possible. In a preferred embodiment, R1 to R6 are each independently hydrogen atoms, C1-4-alkyl radicals or halogenated C1-4-alkyl radicals; R1 to R6 are more preferably hydrogen atoms. In a further preferred embodiment, R7 and R8 are preferably each independently hydrogen atoms, C1-4-alkyl radicals or halogenated C1-4-alkyl radicals; R7 and R8 are more preferably hydrogen atoms. In yet a further embodiment, R9 is preferably independently a hydrogen atom, a C1-4-alkyl radical, a halogenated C1-4-alkyl radical, a -C(O)-C1-4 alkyl radical or a halogenated -C (0)-C1-4 alkyl radical. In a further embodiment, R10 and R11 are each independently selected from a hydroxyl group, a C1-4 alkyl radical, an -O-C1-4 alkyl radical, a halogenated C1-4-alkyl radical or a halogenated -O-C1-4-alkyl radical. R10 and R11 are more preferably each independently a C1-4-alkyl radical or a halogenated C1-4- alkyl radical. R is preferably a hydrogen atom, a C1-4-alkyl radical or a halogenated C1-4-alkyl radical. Halogens refer to fluorine, chlorine, bromine and iodine, preferably fluorine and chlorine. The radicals substituted by them may be mono- or polysubstituted, preferably perhalogenated. The compounds of the formula I are preferably symmetrical. In one embodiment, the -(A)x- group is preferably a group of the formula -CH2-X-CH2- and -X- is selected from -0-, -S-, -SiR2-, -NR- and -NC(O)R, where R is a hydrogen atom, a Ci-4-alkyl radical, a halogenated C1-4- alkyl radical, an O-C1-4-alkyl radical, a halogenated O-C1-4-alkyl radical, a C1-4-alkenyl radical or an optionally heteroatom-containing C5-6-aryl radical. Illustrative examples of compounds of the general formula I are 1,5-hexadiene, 1,6-heptadiene and 1,7-octadiene. Further compounds which may serve as illustration are diallyl ether, diallylamine, diallyl- methylamine, diallylethylamine, N-acetyldiallylamine, diallyl sulphide, diallylsilane, diallyldimethylsilane, difurfuryl ether, difurfurylamine, bis(thiophen-2-yl- methyl)amine, difurfuryl sulphide and 1,3-divinyl- benzene. Ligand of the general formula II The present invention further provides a process for preparing a palladium(0) compound, comprising reaction of a palladium compound with one or more compounds of the general formula II in the presence of a base: n is an integer from 3 to 20; n is preferably an integer from 3 to 6. Each R13 to R15 is independently selected from R, OR, halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si (OR)3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is hydrogen, a substituted or unsubstituted C1-10-alkyl radical, a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom- containing C5-10-aryl radical, and the substituents on the alkyl radical or the alkenyl radical are selected from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, and the substituents on the aryl radical are selected, from halogen, C1-10-alkyl, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, where R13 and R14 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom-containing ring. Examples of heteroatom-containing rings are rings which derive from the following structures: thiophenes, furans, pyrans, pyrroles and the like. Other rings are likewise possible. In a preferred embodiment, R13 to R15 are each independently hydrogen atoms, C1-4-alkyl radicals or halogenated C1-4-alkyl radicals; R13 to R15 are more preferably hydrogen atoms. Each R12 is independently selected from hydrogen, a hydroxyl group, a substituted or unsubstituted C1-10- alkyl radical (in particular an unsubstituted or halogenated C1-10-alkyl radical) , an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted; in particular an unsubstituted or halogenated -O-C1-10-alkyl radical) , a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical. The substituents are each as defined for R13 to R15. Each R12 is preferably selected independently from a hydroxyl group, a C1-4-alkyl radical, an -O-C1-4-alkyl radical, a halogenated Ci-4-alkyl radical or a halogenated -O-C1-4- alkyl radical. Each R12 is more preferably each independently a C1-4-alkyl radical or a halogenated C1-4- alkyl radical. R is preferably a hydrogen atom, a C1-4-alkyl radical or a halogenated C1-4-alkyl radical. Halogens refer to fluorine, chlorine, bromine and iodine, preferably fluorine and chlorine. The radicals substituted with them may be mono- or polysubstituted, preferably perhalogenated. Ligand of the general formula III The present invention also provides a process for preparing a palladium(0) compound, comprising reaction of a palladium compound with one or more compounds of the general formula III in the presence of a base: Term-O-{ [Si(R16) (CR19CR17R18) 0] v[Si (R20) 2O] W}-Term (III) . This formula encompasses both compounds in which the [Si (R16) (CR19CR17R18)O] and [Si(R20)2O] units occur in blocks and compounds in which individual [Si (R16) (CR19CR17R18)O] and [Si(R20)2O] units are distributed randomly in the chain. Mixed forms are likewise possible. v and w are each independently 0 or an integer from 1 to 1000 and v+w is from 0 to 1000. v and w are preferably each independently 0 or an integer from 1 to 100 and v and w is from 0 to 100; more preferably v and w are each independently 0 or an integer from 1 to 20 and v+w is from 0 to 20. Each R16 is independently selected from a hydrogen atom, a hydroxyl group, a substituted or unsubstituted C1-10- alkyl radical (in particular an unsubstituted or halogenated C1-10-alkyl radical), an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted; in particular an unsubstituted or halogenated -O-C1-10-alkyl radical), a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical. The substituents are each as defined for R17 and R19. Each R16 is preferably each independently selected from a hydroxyl group, a C1-4-alkyl radical, an -O-C1-4-alkyl radical, a halogenated C1-4-alkyl radical or a halogenated -O-C1-4-alkyl-radical. Each R16 is more preferably each independently an C1-4-alkyl radical or a halogenated C1-4-alkyl radical. Each R17 to R19 is independently selected from R, OR, halogen, CN, N02, NR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si(OR)3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is an hydrogen, a substituted or unsubstituted C1-10-alkyl radical, a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, and the substituents on the alkyl radical or the alkenyl radical are selected from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, and the substituents on the aryl, radical are selected from halogen, C1-10-alkyl, O-C1-10-alkyl, phenyl, 0- phenyl, OH, NH2 and halogenated C1-10-alkyl, where R17 and R19 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom-containing ring. The examples of heteroatom-containing rings are rings which derive from the following structures: thiophenes, furans, pyrans, pyrroles and the like. Other rings are likewise possible. In a preferred embodiment, R17 to R19 are each independently hydrogen atoms, halogens, C1-4-alkyl radicals or halogenated C1-4-alkyl radicals; R17 to R19 are more preferably hydrogen atoms. Each R20 is independently selected from a hydrogen atom, a hydroxyl group, a substituted or unsubstituted C1-10- alkyl radical (in particular an unsubstituted or halogenated C1-10-alkyl radical), an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted; in particular an unsubstituted or halogenated -O-C1-10-alkyl radical) , a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical. The substituents are each as defined for R17 and R19. Each R20 is preferably independently selected from a hydrogen atom, a hydroxyl group, a C1-4-alkyl radical, an -O-C1-4- alkyl radical, a halogenated C1-4-alkyl radical or a halogenated -O-C1-4-alkyl radical. Each R20 is more preferably independently a hydrogen atom, a C1-4-alkyl radical or a halogenated C1-4-alkyl radical. Each Term radical is independently (R16)2(CR17R18CR19)Si- or (R16)3Si-. The unsaturated radical is preferably (R16)2(CR17R18CR19)Si-. R is preferably a hydrogen atom, a C1-4-alkyl radical or a halogenated C1-4-alkyl radical. Halogens refer to fluorine, chlorine, bromine and iodine, preferably fluorine and chlorine. The radicals substituted with them may be mono- or polysubstituted, preferably perhalogenated. In a preferred embodiment, w is 0. In this case, the compounds of the general formula (III) have the following form: Term-O-[Si(R16) (CR19CR17R18)0]V-Term where R16 to R19, Term and v are each as defined above. Illustrative examples of compounds of the general formulae II and III are divinyldisiloxane, 1,1,3,3- tetramethyl-1,3-divinyldisiloxane, 1,1,3,3-tetramethyl- 1,3-dithien-2-yldisiloxane, 1,1,3,3-tetramethoxy-1, 3- divinyldisiloxane, 1,3-dimethyl-1,3-divinyldisiloxane- diol, 1,3,5, 7-tetravinyl-l, 3,5, 7-tetramethylcyclotetra- siloxane and 1,3,5-trimethyl-1,3,5-trivinylcyclo- trisiloxane. Particular preference is given to 1,1,3,3-tetramethyl-1,3-divinyldisiloxane, 1,3,5,7- tetravinyl-1,3,5,7-tetramethylcyclotetrasiloxane and 1,3,5-trimethyl-l,3,5-trivinylcyclotrisiloxane. It goes without saying that the palladium compound can be reacted with mixtures of the compounds of the general formula I, II and III. In the reaction of the palladium compound with one or more of the compounds of the general formula I, II and III, preference is given to no further ligands in addition to the compounds of the general formula I, II and III during the reaction. Base The palladium compound is reacted with one or more compounds of the general formula I, II or III in the presence of a base. In the context of the invention, "base" refers to inorganic and organic (preferably inorganic) bases, but not organometallic bases. The bases should not decompose in water. Suitable bases are, for example, salts of Br0nsted acids. Preference is given to using carbonates, hydrogencarbonates, acetates, formates, ascorbates, oxalates and hydroxides. These may be used in the form of their ammonium (NR4+ where R = H or C1-4-alkyl) , alkali metal (for example sodium or potassium) and alkaline earth metal salts. Solvent The components are reacted typically in a solvent. The solvents are not particularly restricted. Examples of possible solvents are water, alcohols, hydrocarbons (e.g. aromatic hydrocarbons such as benzene and toluene or aliphatic hydrocarbons such as pentane, hexane and heptane), open-chain or cyclic ethers, amides and esters. However, preference is given to water, C1-6 alcohols (e.g. C1-4 alcohols such as methanol, ethanol, propanol and butanol) and C2-6 ethers as solvents. Mixtures of these solvents may likewise be used. Reducing agent In order to accelerate the reaction or achieve very substantial conversion, the reaction may optionally be effected in the presence of a reducing agent. Suitable reducing agents are those which, compared to the palladium compound used, have a lower redox potential under the selected reaction conditions. For example, formic acid and salts thereof, oxalic acid and salts thereof, hydrazine, glucose, ascorbic acid or formaldehyde can be used. Instead of using a separate reducing agent, it is likewise possible to use a solvent which has reducing properties. Performance of the process In one possible embodiment of the process according to the invention, the palladium compound and the compound of the general formula I, II or III is preferably dissolved in a solvent and the base is suspended in the solution. The reactants are reacted with one another. To this end, the reactants are introduced into a reactor and stirred. The reaction may be effected at a temperature of -78°C to +200°C, preferably of -10°C to +100°C and more preferably of 0°C to +50°C. The pressure is generally 0.1 mbar to 100 bar, preferably 0.2 to 2 bar. Particular preference is given to ambient pressure ±0.2 bar. The reaction time is commonly 5 minutes to 1 week, preferably 5 minutes to 24 hours, more preferably 30 minutes to 24 hours. As mentioned above, it is not necessary to work with exclusion of air, which is particularly advantageous for the industrial-scale application of the process according to the invention. Based on 1 equivalent of palladium in the form of the compound used, 1 to 100 equivalents, preferably 3 to 100 equivalents, more preferably 8 to 20 equivalents, of the compound of the general formula I, II or III are used. The base is used in an amount of 1 to 100 equivalents preferably of 2 to 100 equivalents, more preferably of 2.5 to 10 equivalents, based on 1 equivalent of palladium. If present, the reducing agent may be added in an amount of 1 to 100 equivalents based on 1 equivalent of palladium. Instead of using a separate reducing agent, it. is likewise possible to use a solvent which has reducing properties. In this case, the amount of the reducing agent (solvent) is not particularly restricted, but rather it can be used in any excess based on 1 equivalent of palladium. The palladium (0) compounds may be used as such after the reaction. However, it is possible to purify and/or to concentrate the solutions before use. Useful purification steps are, for example, the filtering-off of by-products, the drying of the solution (for example over molecular sieves or MgSO4) or the purification over activated carbon. The solution may be concentrated, for example, by distillation. The palladium(0) compounds prepared by the process according to the invention are also storage-stable and can be handled under air, generally at temperatures up to 30°C, in some cases up to 60°C and higher. They typically have a metal content of 0.01% by weight to 40% by weight, preferably of 0.01% by weight to 30% by weight, more preferably of 0.01% by weight to 20% by weight, and a total halogen content of not more than 5% by weight, preferably not more than 2% by weight, more preferably not more than 1% by weight. The palladium(O) compounds may, either alone or as a mixture, be used as a precursor for catalysts for organic chemistry reactions, by mixing them with a ligand, for example phosphines, phosphites, phosphonites, amines, alkenes, thioethers, alkynes or carbenes, each of which may also be generated in situ. This mixture may be used directly as a catalyst, or the resulting complex may be obtained in substance by customary processes from the mixture. The inventive palladium(0) compounds may, either alone or as a mixture, also be used directly without using additional ligands as a catalyst precursor in organic chemistry reactions. The examples which follow are intended to further illustrate the invention. However, the invention is not restricted to these illustrative embodiments, but rather is defined by the claims. EXAMPLES General method for the synthesis of palladium(0) compounds One equivalent of sodium tetrachloropalladate was dissolved in methanol. To this solution were added 8 equivalents of sodium hydrogencarbonate and 10 equivalents of a compound of the general formula I. The solution was stirred for 4 hours. The methanol was distilled off and the residue stirred over a desiccant and activated carbon. The solids were filtered off and the filtrate was concentrated by distillation. Depending on the distillation conditions, stable palladium solutions having palladium contents of 0.01 to 20% by weight were obtained. According to this method, reaction mixtures were prepared with the di- to tetraenes specified in Table 1. The palladium and chlorine content was determined by means of ICP-OES after digestion or by wickbold combustion. Method for the synthesis of phosphine-diene-Pd(O) complexes One palladium equivalent of the palladium solution obtained from the reaction of 1,1,3,3-tetramethyl-1,3- divinyldisiloxane was admixed with one equivalent of a 5% by weight ethereal tricyclohexylphosphine solution. The resulting precipitate is filtered off and dried. The product was identified by means of 1H, 31P and 13C NMR spectroscopy as tricyclohexylphosphine-(1,1,3,3- tetramethyl-1,3-divinyldisiloxane)-Pd(0) complex. Table 1 We Claim: 1. Process for preparing a palladium (0) compound, comprising reaction of a palladium compound PdX2, PdX4, M2PdX4, M2PdX6, (NH3)2PdX2 and [Pd(NH3)4]X2, where M is a cation (e.g.: a hydrogen atom, an alkali metal (in particular Na+ or K+) or NR4+ (R = hydrogen, C1-4 alkyl)) and X is an anion (e.g.: halogen (in particular chlorine), NO3-) with one or more compounds of the general formula I in the presence of a base: in which each A is independently a CR7R8-radical where one of the A radicals may be oxygen, sulphur, an NR9 group or an SiR10R11 group, or where the A radicals may be a constituent of a 5- to 20-membered ring system, x is an integer from 2 to 4, and each R1 to R11 is independently selected from R, OR, halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si(OR)3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is a hydrogen atom, a substituted or unsubstituted C1-10- alkenyl radical, or a substituted or unsubstituted, optionally heteroatom- containing C5-10-aryl radical, and the substitutents on the alkyl radical or the alkenyl radical are selected from haloge, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10- alkyl, and the substituents on the aryl radical are selected from halogen, C1-10-alkyl, O-C1-10- alkyl, phenyl, O-phenyl, OH, NH2 and halogenated CC1-10-alkyl, where R2 and R3 and/or R5 and R6 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom-containing ring. 2. Process according to Claim 1, wherein x is 3. 3. Process according to either of the preceding claims, wherein R1 to R6 are each hydrogen atoms. 4. Process according to any of the preceding claims, wherein -(A)X- is a group of the formula -CH2-X-CH2- and -X- is selected from -0-, -S-, -SiR2-, -NR- and -NC(O)R, and R is hydrogen, a C1-4 -alkyl radical or a halogenated C1-4-alkyl. 5. Process according to Claim 1, wherein the compound of the general formula I is selected from 1,5-hexadiene, 1,6-heptadiene and 1,7-octadiene. 6. Process according to Claim 1, wherein the compound of the general formula I is selected from diallyl ether, diallylamine, diallylmethylamine, diallylethylamine, N-acetyldiallylamine, diallyl sulphide, diallylsilane, diallyldimethylsilane, difurfuryl ether, difurfurylamine, bis(thiophen-2- ylmethyl)amine, difurfuryl sulphide and 1,3- divinylbenzene. Process for preparing a Palladium(0) compound, comprising reaction of a palladium compound with one or more compounds of the general formula II in the presence of a base: in which: n is an integer from 3 to 20, each R13 to R15 is independently selected from R, OR, halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si (R) 3, Si (OR) 3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is hydrogen, a substituted or unsubstituted C1-10-alkyl radical, a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, and the substituents on the alkyl radical or the alkenyl radical are selected from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10- alkyl, and the substituents on the aryl radical are selected from halogen, C1-10-alkyl, O-C1-10- alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, where R13 and R14 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom- containing ring, and each R12 is independently selected from hydrogen, a hydroxyl group, a substituted or unsubstituted C1-10-alkyl radical, an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted), a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, where the substituents are as defined for R13 and R15. 8. Process according to Claim 7, wherein n is an integer from 3 to 6 and each R12 is independently a C1-4-alkyl radical or a halogenated C1-4-alkyl radical. 9. Process for preparing a Palladium(0) compound comprising reaction of a palladium compound with one or more compounds of, the general formula III in the presence of a base Term-O-{ [Si(R16) (CR19CR17R1S\|)O]v[Si(R20)20]W}-Term (III) in which v and w are each independently 0 or an integer of from 1 to 1000 and v+w is from 0 to 1000, each R16 is independently selected from hydrogen, a hydroxyl group, a substituted or unsubstituted C1-10-alkyl radical, an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted), a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical or a substituted or urisubstituted, optionally heteroatom-containing C1-10-aryl radical, where the substituents are as defined for R17 and R19, each R17 to R19 is independently selected from R, OR, halogen, CN, NO2, WR2, C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si(OR)3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2, in which R is a hydrogen atom, a substituted or unsubstituted C1-10-alkyl radical, a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, and the substituents on the alkyl radical or the alkenyl radical are selected from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10- alkyl, and the substituents on the aryl radical are selected from halogen, C1-10-alkyl, O-CC1-10- alkyl, phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl, where R17 and R19 together with the carbon atoms bonded thereto may be a constituent of a 5- to 7-membered, optionally heteroatom- containing ring, each R20 is independently selected from hydrogen, a hydroxyl group, a substituted or unsubstituted C1-10-alkyl radical, an -O-C1-10-alkyl radical (where the alkyl radical may be substituted or unsubstituted), a substituted or unsubstituted, mono- or polyunsaturated C1-10-alkenyl radical, or a substituted or unsubstituted, optionally heteroatom-containing C5-10-aryl radical, where the substituents are as defined for R17 and R19, and each Term is independently (R16)2(CR17R18CR19) Si- or (R16)3Si-. 10. Process according to Claim 9, wherein the compound of the general formula (III) has the general formula: Term-O-[Si(R16)(CR19CR17R18)O]V-Term where R16 to R19, Term and v are each as defined in Claim 9. 11. Process according to any of Claims 7 to 10, wherein the compound of the general formula II or III is selected from divinyldisiloxane, 1,1,3,3- tetramethyl-1,3-divinyldisiloxane, 1,1,3,3-tetra- methyl-1,3-dithien-2-yldisiloxane, 1,1,3,3-tetra- methoxy-1,3-divinyldisiloxane, 1,3-dimethyl-1,3- divinyldisiloxanediol, 1,3,5, 7-tetravinyl-1,3,5,7- tetramethylcyclotetrasiloxane and 1, 3, 5-trimethyl- 1,3,5-trivinylcyclotrisiloxane. 12. Process according to any of Claims 7 to 10, wherein the compound of the general formula II or III is selected from 1,1,3,3-tetramethyl-1,3- divinyldisiloxane, 1,3,5, 7-tetravinyl-l,3,5,7- tetramethylcyclotetrasiloxane and 1, 3, 5-trimethyl- 1,3,5-trivinylcyclotrisiloxane. 13. Process according to any of the preceding claims, wherein the palladium compound is selected from PdX2, PdX4, M2PdX4, M2PdX6, (NH3)2PdX2 and [Pd(NH3) 4]X2, where M is a hydrogen atom, an alkali metal or NR4+ (R = hydrogen, C1-4-alkyl) and X is a halogen or NO3-. 14. Process according to Claim 13, wherein X is chlorine. 15. Process according to any of the preceding claims, wherein the reaction is effected in the presence of a solvent or solvent mixture. 16. Process according to Claim 15, wherein the solvent is selected from water, C1-6-alcohols and C2-6- ethers and mixtures thereof. 17. Process according to any of the preceding claims, wherein the base is selected from alkali metal. salts, alkaline earth metal salts and ammonium salts (ammonium as NR4+ where R = H or C1-4-alkyl) of carbonates, hydrogencarbonates and hydroxides. 18. Process according to any of the preceding claims, also comprising a purification step. 19. Process according to any of the preceding claims, also comprising a concentration step. 20. Process according to any of the preceding claims, wherein the reaction of the palladium compound with one or more compounds of the general formula I, II or III is carried out in the presence of one or more ligands other than the compound of the general formula I, II or III. 21. Process according to any of the preceding claims, further comprising the reaction of the palladium compound with one or more ligands other than the compound of the general formula I, II or III. 22. Palladium(O) compound obtainable by a process according to claim 1, wherein the compound of the general formula I is hexadiene or octadiene. 23. Palladium(O) compound obtainable by a process according to claim 7, wherein the compound of the general formula II, is l,3,5,7-tetravinyl-l,3,5,7- tetramethylcyclotetrasiloxane. The present invention relates to a process for preparing a palladium(0) compound, comprising the reaction of a palladium compound with one or more compounds of the general formula I, II or III in the presence of a base: Term-O-{[Si(R16) (CR19CR17R18) O] v [Si (R20) 2O] w} -Term (III). The Palladium(0) compounds are suitable as homogeneous catalysts, as a precursor for preparing homogeneous catalysts, as a precursor for preparing homogeneous catalysts in situ or as a precursor for preparing heterogeneous catalysts.

Full Text

Process for preparing palladium(0) compounds
The present invention relates to a process for
preparing palladium(0) compounds.
In the form of its compounds, palladium finds use as a
catalyst in numerous industrial processes.
More than 80% of the industrially produced chemicals
are prepared by catalytic processes. Catalytic
processes are generally more economically viable and
environmentally friendly than corresponding
stoichiometric organic reactions. For the attainment of
high yields and selectivities in homogeneous catalytic
processes, a wide range of ligand systems has to be
used, which in turn requires precursor metal compounds
having a wide range of uses. This makes clear the need
for constant improvement in the catalyst systems and
their preparation processes.
For these applications, one possibility is in
particular palladium compounds which contain palladium
in the 0 oxidation state. In general, palladium(0)
compounds are stabilized by compounds which can provide
a free electron pair for coordination. This free
electron pair may be provided, for example, by an
unsaturated hydrocarbon or by heteroatoms such as
phosphorus or nitrogen. Stably storable compounds are
commercially obtainable principally only in solid form.
However, compounds which are in liquid form are desired

in catalysis. This greatly eases their usability.
Often, solid compounds are dissolved in a solvent for
this purpose, but solutions of solid Pd(0) compounds
are usually unstable and have to be used immediately.
In homogeneous catalysis applications, the precursors
used are preferably compounds which can be mixed in a
simple manner with ligands, for example different
phosphines, so as to be able to prepare a wide range of
catalysis systems. This is realized, for example, in
the case of the Pd(0) compounds stabilized with
unsaturated hydrocarbon ligands.
Numerous Pd(0) complexes with unsaturated compounds in
the ligands sphere are known and are described, for
example, in Wilkinson, Abel "Comprehensive
Organometallic Chemistry", Vol. 6, p. 243ff "Complexes
of Palladium(0)".
Pd(0) compounds stabilized by unsaturated hydrocarbons
may be differentiated according to the ligands into
complexes stabilized by monodentate and by multidentate
(chelating) ligands. An example of a Pd(0) complex
stabilized by monodentate hydrocarbon ligands is
Pd(ethylene)3, which decomposes at room temperature and
under air.
Stabler Pd(0) compounds are obtained by chelating, for
example bidentate, unsaturated hydrocarbon ligands such
as dienes. Dienes are classified according to the
separation of the two diene functions into 1,4-diene
ligands, 1,5-diene ligands, 1,6-diene ligands,
1,7-diene ligands, etc.
1,4-Diene-stabilized palladium(O) finds wide use as a
ligand, for example, in the form of 1,5-diphenyl-1,4-
pentadien-3-one (dba). One description of the synthesis

is given by M.F. Rettig et al. in Inorg. Synth., 1990,
28. The product is isolated from the synthesis solution
as a sparingly soluble precipitate. The solid is
substantially air-stable, but solutions in organic
solvents of these compounds decompose within hours
(STREM catalogue: "Chemicals for research", Catalogue
No. 19, 2001-2003) .
The use of this complex type as a precursor in
homogeneous catalysis is described, for example, in
US-B-6,316,380. In EP-A-508 264, Pd(dba)2 substituted
by sulphoalkyl groups is used as homogeneous catalyst
in C-C coupling.
A known example of Pd(0) stabilized by 1,5-diene ligand
is Pd(COD)2. This is synthesized in DE-A-25 55 374 from
Pd(COD)Cl2 in the presence of an organometallic
compound, for example Li2(COT) (COT = cyclooctatraene),
sodium naphthalide or organoaluminium compounds, in
solvents having no active protons. The above patent
application also describes the synthesis of Pd(C2H4)3
from Pd(COD)2. Pd(COD)2 is an unstable solid which
decomposes within hours under atmospheric conditions.
This property makes this compound industrially
utilizable only to a limited extent.
J. Krause, G. Cestaric, K.-J. Haack, K. Seevogel, W.
Storm, K.R. Porschke (J. Am. Chem. Soc. 1999, 121,
9807-9823 and Chem. Commun. 1998, 12, 1291) describe
the synthesis of molecularly defined hepta-1,6-diene-,
diallyl ether- and tetramethyldivinyldisiloxane-
palladium(0), which are examples of Pd(0) stabilized by
1,6-diene ligands. The synthesis follows substantially
the route described for Pd(COD)2. Oxygen-free solvents
have to be used for the synthesis and the materials
have decomposition temperatures close to room

temperature .
For application in homogeneous catalysis, 1,6-diene-
Pd(0)-phosphine and -carbene complexes have been
identified. These compounds exhibit high activities in
the industrially used Heck reaction and the Suzuki C-C
coupling reaction, and are described by M.G. Andreu, A.
Zapf, M. Beller in Chem. Comm., 2000, 245 and in
DE-A-100 62 577.
In the prior art, 1,4-diene-stabilized Pd(0) compounds
are used industrially. These exhibit sufficient
stability, but solutions of these compounds are not
storage-stable. 1,5- and 1,6-diene-stabilized Pd(0)
compounds are distinctly less stable than the
1,4-diene-stabilized Pd(0) compounds. In all diene-
stabilized Pd(0) compounds, it is typically necessary
to work under inert gas and with dried solvents having
no active protons in order to isolate molecularly
defined Pd2(diene)3 or Pd(diene)2 compounds. In
addition, highly sensitive organolithium compounds
which pose potential health risks are used in the
synthesis, which makes industrial-scale utilization
costly and inconvenient. For this reason, these
compound classes have not been used industrially on a
large scale to date.
It is therefore an object of the present invention to
provide a novel inexpensive process for preparing
palladium(0) compounds. Solutions of these compounds
should be substantially stable thermally and toward
atmospheric conditions. This enables access to
economically viable, versatile, novel precursors for
applications in homogeneous catalysis, heterogeneous
catalysis and complex chemistry.

In particular, the invention relates to a process for
preparing a Palladium(0) compound, comprising reaction
of a palladium compound with one or more compounds of
the general formula (I) in the presence of a base:

in which:
each A is independently a CR7R8 radical where one of the
A radicals may be oxygen, sulphur, an NR9 group or an
SiR10R11 group, or where the A radicals may be a
constituent of a 5- to 20-membered ring system,
x is an integer from 2 to 4, and
each R1 to R11 is independently selected from R, OR,
halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2,
NHCO2R, NHCOR, CH=CH-CO2R, Si (R)3, Si (OR)3, SiR(OR)2,
SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2,
in which R is a hydrogen atom, a substituted or
unsubstituted C1-10-alkyl radical, a substituted or
unsubstituted, mono- or polyunsaturated C1-10-alkenyl
radical, or a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical, and the
substituents on the alkyl radical or the alkenyl
radical are selected from halogen, O-C1-10-alkyl,
phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl,
and the substituents on the aryl radical are selected
from halogen, C1-10-alkyl, O-C1-10-alkyl, phenyl, 0-
phenyl, OH, NH2 and halogenated C1-10-alkyl, where R2 and
R3 and/or R5 and R6 together with the carbon atoms
bonded thereto may be a constituent of a 5- to
7-membered, optionally heteroatom-containing ring.

In a further embodiment, the invention relates to a
process for preparing a Palladium(0) compound,
comprising reaction of a palladium compound with one or
more compounds of the general formula II in the
presence of a base:

in which:
n is an integer from 3 to 20,
each R3 to R15 is independently selected from R, OR,
halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2,
NHCO2R, NHCOR, CH=CH-CO2R, Si (R)3, Si (OR) 3, SiR(OR)2,
SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2,
in which R is hydrogen, a substituted or unsubstituted
C1-10-alkyl radical, a substituted or unsubstituted,
mono- or polyunsaturated C1-10-alkenyl radical, or a
substituted or unsubstituted, optionally heteroatom-
containing C5-10-aryl radical, and the substituents on
the alkyl radical or the alkenyl radical are selected
from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2
and halogenated C1-10-alkyl, and the substituents on the
aryl radical are selected from halogen, C1-10-alkyl, O-
C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated
C1-10-alkyl, where R13 and R14 together with the carbon
atoms bonded thereto may be a constituent of a 5- to
7-membered, optionally heteroatom-containing ring, and
each R12 is independently selected from hydrogen, a
hydroxyl group, a substituted or unsubstituted C1-10-
alkyl radical (in particular an unsubstituted or
halogenated C1-10-alkyl radical) , an -O-C1-10-alkyl
radical (where the alkyl radical may be substituted or
unsubstituted; in particular an unsubstituted or
halogenated-O-C1-10-alkyl radical), a substituted or

unsubstituted, mono- or polyunsaturated C1-10-alkenyl
radical or a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical, where the
substituents are as defined for R13 and R15.
In yet a further embodiment, the invention relates to a
process for preparing a Palladium(0) compound,
comprising reaction of a palladium compound with one or
more compounds of the general formula III in the
presence of a base:
Term-O-{ [Si (R16) (CR19CR17R18) 0] v [Si (R20)2O] w}-Term (III)
in which
v and w are each independently 0 or an integer of from
1 to 1000 and v+w is from 0 to 1000,
each R16 is independently selected from a hydrogen atom,
a hydroxyl group, a substituted or unsubstituted C1-10-
alkyl radical (in particular an unsubstituted or
halogenated C1-10-alkyl radical), an -O-C1-10-alkyl
radical (where the alkyl radical may be substituted or
unsubstituted; in particular an unsubstituted or
halogenated -O-C1-10-alkyl radical), a substituted or
unsubstituted, mono- or polyunsaturated C1-10-alkenyl
radical or a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical, where the
substituents are as defined for R17 and R19,
each R17 to R19 is independently selected from R, OR,
halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2,
NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si (OR)3, SiR(OR)2,
SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2,
in which R is hydrogen, a substituted or unsubstituted
C1-10-alkyl radical, a substituted or unsubstituted,
mono- or polyunsaturated C1-10-alkenyl radical, or a

substituted or unsubstituted, optionally heteroatom-
containing C5-10-aryl radical, and the substituents on
the alkyl radical or the alkenyl radical are selected
from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2
and halogenated C1-10-alkyl, and the substituents on the
aryl radical are selected from halogen, C1-10-alkyl, 0-
C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated
C1-10-alkyl, where R17 and R19 together with the carbon
atoms bonded thereto may be a constituent of a 5- to
7-membered, optionally heteroatom-containing ring,
each R20 is independently selected from hydrogen, a
hydroxyl group, a substituted or unsubstituted C1-10-
alkyl radical (in particular an unsubstituted or
halogenated C1-10-alkyl radical) , an -O-C1-10-alkyl
radical (where the alkyl radical may be substituted or
unsubstituted in particular an unsubstituted or
halogenated -O-C1-10-alkyl radical), a substituted or
unsubstituted, mono- or polyunsaturated C1-10-alkenyl
radical, or a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical, where the
substituents are as defined for R17 and R19, and
each Term radical is independently (R16)2 (CR17R18CR19) Si-
or (R16)3Si-.
Surprisingly, the above-described processes, unlike the
processes known to date, can be carried out at
temperatures above 0°C. In addition, the reaction does
not have to be carried out with exclusion of air or
with dried solvents.
In the palladium(O) compounds, palladium is present as
palladium(0). The oxidation state of palladium in the
compounds can be determined by known processes, for
example by reacting with uncharged ligands (for example

phosphines) , isolating and characterizing the resulting
compound with NMR, or by concentrating the solution by
evaporation and determining the oxidation state by
means of XPS.
Palladium compound
The palladium compound used as the starting compound is
not particularly restricted. It may be used either in
the form of solids or in the form of aqueous or
hydrochloric acid solutions. Preference is given to
using palladium compounds having palladium in the +2 or
+4 oxidation state. Examples thereof are PdX2, PdX4,
M2PdX4, M2PdX6, (NH3)2PdX2 and [Pd(NH3)4]X2, where M is a
cation (e.g.: a hydrogen atom, an alkali metal (in
particular Na+ or K+) or NR*4+ (R* = hydrogen, C1-4
alkyl)) and X is an anion (e.g.: halogen (in particular
chlorine), NO3-) . Particularly preferred palladium
compounds are PdCl2, PdCl4, Pd(NO3)2, [Pd (NH3)4] Cl2,
(NH3)2PdCl2, H2PdCl4, H2PdCl6, Na2PdCl4, Na2PdCl6, K2PdCl4
and K2PdCl6.
Ligand of the general formula I
The palladium compound is reacted with one or more
compounds of the general formula I

Each A is independently a CR7R8 radical where one of the
A radicals may be oxygen, sulphur, an NR9 group or an
SiR10R11 group, or where the A radicals may be a
constituent of a 5- to 20-membered ring system.
x is an integer of from 2 to 4.
Each R1 to R11 is independently selected from R, OR,
halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2,
NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si(OR)3, SiR(OR)2,
SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2,
in which R is hydrogen, a substituted or unsubstituted
C1-10-alkyl radical, a substituted or unsubstituted,
mono- or polyunsaturated C1-10-alkenyl radical, or a
substituted or unsubstituted, optionally heteroatom-
containing C5-10-aryl radical, and the substituents on
the alkyl radical or the alkenyl radical are selected
from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2
and halogenated C1-10-alkyl, and the substituents on the
aryl radical are selected from halogen, C1-10-alkyl, O-
C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated
C1-10-alkyl, where R2 and R3 and/or R5 and R6 together
with the carbon atoms bonded thereto may be a
constituent of a 5- to 7-membered, optionally
heteroatom-containing ring.
Examples of heteroatom-containing rings are rings which
derive from the following structures: thiophenes,
furans, pyrans, pyrroles and the like. Other rings are
likewise possible.
In a preferred embodiment, R1 to R6 are each
independently hydrogen atoms, C1-4-alkyl radicals or
halogenated C1-4-alkyl radicals; R1 to R6 are more
preferably hydrogen atoms.

In a further preferred embodiment, R7 and R8 are
preferably each independently hydrogen atoms, C1-4-alkyl
radicals or halogenated C1-4-alkyl radicals; R7 and R8
are more preferably hydrogen atoms.
In yet a further embodiment, R9 is preferably
independently a hydrogen atom, a C1-4-alkyl radical, a
halogenated C1-4-alkyl radical, a -C(O)-C1-4 alkyl
radical or a halogenated -C (0)-C1-4 alkyl radical.
In a further embodiment, R10 and R11 are each
independently selected from a hydroxyl group, a C1-4
alkyl radical, an -O-C1-4 alkyl radical, a halogenated
C1-4-alkyl radical or a halogenated -O-C1-4-alkyl
radical. R10 and R11 are more preferably each
independently a C1-4-alkyl radical or a halogenated C1-4-
alkyl radical.
R is preferably a hydrogen atom, a C1-4-alkyl radical or
a halogenated C1-4-alkyl radical.
Halogens refer to fluorine, chlorine, bromine and
iodine, preferably fluorine and chlorine. The radicals
substituted by them may be mono- or polysubstituted,
preferably perhalogenated.
The compounds of the formula I are preferably
symmetrical.
In one embodiment, the -(A)x- group is preferably a
group of the formula -CH2-X-CH2- and -X- is selected
from -0-, -S-, -SiR2-, -NR- and -NC(O)R, where R is a
hydrogen atom, a Ci-4-alkyl radical, a halogenated C1-4-
alkyl radical, an O-C1-4-alkyl radical, a halogenated
O-C1-4-alkyl radical, a C1-4-alkenyl radical or an
optionally heteroatom-containing C5-6-aryl radical.

Illustrative examples of compounds of the general
formula I are 1,5-hexadiene, 1,6-heptadiene and
1,7-octadiene. Further compounds which may serve as
illustration are diallyl ether, diallylamine, diallyl-
methylamine, diallylethylamine, N-acetyldiallylamine,
diallyl sulphide, diallylsilane, diallyldimethylsilane,
difurfuryl ether, difurfurylamine, bis(thiophen-2-yl-
methyl)amine, difurfuryl sulphide and 1,3-divinyl-
benzene.
Ligand of the general formula II
The present invention further provides a process for
preparing a palladium(0) compound, comprising reaction
of a palladium compound with one or more compounds of
the general formula II in the presence of a base:

n is an integer from 3 to 20; n is preferably an
integer from 3 to 6.
Each R13 to R15 is independently selected from R, OR,
halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R, CONR2,
NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si (OR)3, SiR(OR)2,
SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2,
in which R is hydrogen, a substituted or unsubstituted
C1-10-alkyl radical, a substituted or unsubstituted,
mono- or polyunsaturated C1-10-alkenyl radical, or a
substituted or unsubstituted, optionally heteroatom-

containing C5-10-aryl radical, and the substituents on
the alkyl radical or the alkenyl radical are selected
from halogen, O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2
and halogenated C1-10-alkyl, and the substituents on the
aryl radical are selected, from halogen, C1-10-alkyl,
O-C1-10-alkyl, phenyl, O-phenyl, OH, NH2 and halogenated
C1-10-alkyl, where R13 and R14 together with the carbon
atoms bonded thereto may be a constituent of a 5- to
7-membered, optionally heteroatom-containing ring.
Examples of heteroatom-containing rings are rings which
derive from the following structures: thiophenes,
furans, pyrans, pyrroles and the like. Other rings are
likewise possible.
In a preferred embodiment, R13 to R15 are each
independently hydrogen atoms, C1-4-alkyl radicals or
halogenated C1-4-alkyl radicals; R13 to R15 are more
preferably hydrogen atoms.
Each R12 is independently selected from hydrogen, a
hydroxyl group, a substituted or unsubstituted C1-10-
alkyl radical (in particular an unsubstituted or
halogenated C1-10-alkyl radical) , an -O-C1-10-alkyl
radical (where the alkyl radical may be substituted or
unsubstituted; in particular an unsubstituted or
halogenated -O-C1-10-alkyl radical) , a substituted or
unsubstituted, mono- or polyunsaturated C1-10-alkenyl
radical or a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical. The
substituents are each as defined for R13 to R15. Each R12
is preferably selected independently from a hydroxyl
group, a C1-4-alkyl radical, an -O-C1-4-alkyl radical, a
halogenated Ci-4-alkyl radical or a halogenated -O-C1-4-
alkyl radical. Each R12 is more preferably each

independently a C1-4-alkyl radical or a halogenated C1-4-
alkyl radical.
R is preferably a hydrogen atom, a C1-4-alkyl radical or
a halogenated C1-4-alkyl radical.
Halogens refer to fluorine, chlorine, bromine and
iodine, preferably fluorine and chlorine. The radicals
substituted with them may be mono- or polysubstituted,
preferably perhalogenated.
Ligand of the general formula III
The present invention also provides a process for
preparing a palladium(0) compound, comprising reaction
of a palladium compound with one or more compounds of
the general formula III in the presence of a base:
Term-O-{ [Si(R16) (CR19CR17R18) 0] v[Si (R20) 2O] W}-Term (III) .
This formula encompasses both compounds in which the
[Si (R16) (CR19CR17R18)O] and [Si(R20)2O] units occur in
blocks and compounds in which individual
[Si (R16) (CR19CR17R18)O] and [Si(R20)2O] units are
distributed randomly in the chain. Mixed forms are
likewise possible.
v and w are each independently 0 or an integer from 1
to 1000 and v+w is from 0 to 1000. v and w are
preferably each independently 0 or an integer from 1 to
100 and v and w is from 0 to 100; more preferably v and
w are each independently 0 or an integer from 1 to 20
and v+w is from 0 to 20.
Each R16 is independently selected from a hydrogen atom,
a hydroxyl group, a substituted or unsubstituted C1-10-

alkyl radical (in particular an unsubstituted or
halogenated C1-10-alkyl radical), an -O-C1-10-alkyl
radical (where the alkyl radical may be substituted or
unsubstituted; in particular an unsubstituted or
halogenated -O-C1-10-alkyl radical), a substituted or
unsubstituted, mono- or polyunsaturated C1-10-alkenyl
radical or a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical. The
substituents are each as defined for R17 and R19. Each
R16 is preferably each independently selected from a
hydroxyl group, a C1-4-alkyl radical, an -O-C1-4-alkyl
radical, a halogenated C1-4-alkyl radical or a
halogenated -O-C1-4-alkyl-radical. Each R16 is more
preferably each independently an C1-4-alkyl radical or a
halogenated C1-4-alkyl radical.
Each R17 to R19 is independently selected from R, OR,
halogen, CN, N02, NR2, C(O)R, C(O)OR, OC(O)R, CONR2,
NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si(OR)3, SiR(OR)2,
SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H, PO(OR)2,
in which R is an hydrogen, a substituted or
unsubstituted C1-10-alkyl radical, a substituted or
unsubstituted, mono- or polyunsaturated C1-10-alkenyl
radical, or a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical, and the
substituents on the alkyl radical or the alkenyl
radical are selected from halogen, O-C1-10-alkyl,
phenyl, O-phenyl, OH, NH2 and halogenated C1-10-alkyl,
and the substituents on the aryl, radical are selected
from halogen, C1-10-alkyl, O-C1-10-alkyl, phenyl, 0-
phenyl, OH, NH2 and halogenated C1-10-alkyl, where R17
and R19 together with the carbon atoms bonded thereto
may be a constituent of a 5- to 7-membered, optionally
heteroatom-containing ring.

The examples of heteroatom-containing rings are rings
which derive from the following structures: thiophenes,
furans, pyrans, pyrroles and the like. Other rings are
likewise possible.
In a preferred embodiment, R17 to R19 are each
independently hydrogen atoms, halogens, C1-4-alkyl
radicals or halogenated C1-4-alkyl radicals; R17 to R19
are more preferably hydrogen atoms.
Each R20 is independently selected from a hydrogen atom,
a hydroxyl group, a substituted or unsubstituted C1-10-
alkyl radical (in particular an unsubstituted or
halogenated C1-10-alkyl radical), an -O-C1-10-alkyl
radical (where the alkyl radical may be substituted or
unsubstituted; in particular an unsubstituted or
halogenated -O-C1-10-alkyl radical) , a substituted or
unsubstituted, mono- or polyunsaturated C1-10-alkenyl
radical, or a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical. The
substituents are each as defined for R17 and R19. Each
R20 is preferably independently selected from a hydrogen
atom, a hydroxyl group, a C1-4-alkyl radical, an -O-C1-4-
alkyl radical, a halogenated C1-4-alkyl radical or a
halogenated -O-C1-4-alkyl radical. Each R20 is more
preferably independently a hydrogen atom, a C1-4-alkyl
radical or a halogenated C1-4-alkyl radical.
Each Term radical is independently (R16)2(CR17R18CR19)Si-
or (R16)3Si-. The unsaturated radical is preferably
(R16)2(CR17R18CR19)Si-.
R is preferably a hydrogen atom, a C1-4-alkyl radical or
a halogenated C1-4-alkyl radical.
Halogens refer to fluorine, chlorine, bromine and
iodine, preferably fluorine and chlorine. The radicals

substituted with them may be mono- or polysubstituted,
preferably perhalogenated.
In a preferred embodiment, w is 0. In this case, the
compounds of the general formula (III) have the
following form:
Term-O-[Si(R16) (CR19CR17R18)0]V-Term
where R16 to R19, Term and v are each as defined above.
Illustrative examples of compounds of the general
formulae II and III are divinyldisiloxane, 1,1,3,3-
tetramethyl-1,3-divinyldisiloxane, 1,1,3,3-tetramethyl-
1,3-dithien-2-yldisiloxane, 1,1,3,3-tetramethoxy-1, 3-
divinyldisiloxane, 1,3-dimethyl-1,3-divinyldisiloxane-
diol, 1,3,5, 7-tetravinyl-l, 3,5, 7-tetramethylcyclotetra-
siloxane and 1,3,5-trimethyl-1,3,5-trivinylcyclo-
trisiloxane. Particular preference is given to
1,1,3,3-tetramethyl-1,3-divinyldisiloxane, 1,3,5,7-
tetravinyl-1,3,5,7-tetramethylcyclotetrasiloxane and
1,3,5-trimethyl-l,3,5-trivinylcyclotrisiloxane.
It goes without saying that the palladium compound can
be reacted with mixtures of the compounds of the
general formula I, II and III. In the reaction of the
palladium compound with one or more of the compounds of
the general formula I, II and III, preference is given
to no further ligands in addition to the compounds of
the general formula I, II and III during the reaction.
Base
The palladium compound is reacted with one or more
compounds of the general formula I, II or III in the
presence of a base. In the context of the invention,

"base" refers to inorganic and organic (preferably
inorganic) bases, but not organometallic bases. The
bases should not decompose in water. Suitable bases
are, for example, salts of Br0nsted acids. Preference
is given to using carbonates, hydrogencarbonates,
acetates, formates, ascorbates, oxalates and
hydroxides. These may be used in the form of their
ammonium (NR4+ where R = H or C1-4-alkyl) , alkali metal
(for example sodium or potassium) and alkaline earth
metal salts.
Solvent
The components are reacted typically in a solvent. The
solvents are not particularly restricted. Examples of
possible solvents are water, alcohols, hydrocarbons
(e.g. aromatic hydrocarbons such as benzene and toluene
or aliphatic hydrocarbons such as pentane, hexane and
heptane), open-chain or cyclic ethers, amides and
esters. However, preference is given to water, C1-6
alcohols (e.g. C1-4 alcohols such as methanol, ethanol,
propanol and butanol) and C2-6 ethers as solvents.
Mixtures of these solvents may likewise be used.
Reducing agent
In order to accelerate the reaction or achieve very
substantial conversion, the reaction may optionally be
effected in the presence of a reducing agent. Suitable
reducing agents are those which, compared to the
palladium compound used, have a lower redox potential
under the selected reaction conditions. For example,
formic acid and salts thereof, oxalic acid and salts

thereof, hydrazine, glucose, ascorbic acid or
formaldehyde can be used. Instead of using a separate
reducing agent, it is likewise possible to use a
solvent which has reducing properties.
Performance of the process
In one possible embodiment of the process according to
the invention, the palladium compound and the compound
of the general formula I, II or III is preferably
dissolved in a solvent and the base is suspended in the
solution. The reactants are reacted with one another.
To this end, the reactants are introduced into a
reactor and stirred. The reaction may be effected at a
temperature of -78°C to +200°C, preferably of -10°C to
+100°C and more preferably of 0°C to +50°C. The
pressure is generally 0.1 mbar to 100 bar, preferably
0.2 to 2 bar. Particular preference is given to ambient
pressure ±0.2 bar. The reaction time is commonly
5 minutes to 1 week, preferably 5 minutes to 24 hours,
more preferably 30 minutes to 24 hours. As mentioned
above, it is not necessary to work with exclusion of
air, which is particularly advantageous for the
industrial-scale application of the process according
to the invention.
Based on 1 equivalent of palladium in the form of the
compound used, 1 to 100 equivalents, preferably 3 to
100 equivalents, more preferably 8 to 20 equivalents,
of the compound of the general formula I, II or III are
used. The base is used in an amount of 1 to
100 equivalents preferably of 2 to 100 equivalents,
more preferably of 2.5 to 10 equivalents, based on
1 equivalent of palladium. If present, the reducing

agent may be added in an amount of 1 to 100 equivalents
based on 1 equivalent of palladium. Instead of using a
separate reducing agent, it. is likewise possible to use
a solvent which has reducing properties. In this case,
the amount of the reducing agent (solvent) is not
particularly restricted, but rather it can be used in
any excess based on 1 equivalent of palladium.
The palladium (0) compounds may be used as such after
the reaction. However, it is possible to purify and/or
to concentrate the solutions before use. Useful
purification steps are, for example, the filtering-off
of by-products, the drying of the solution (for example
over molecular sieves or MgSO4) or the purification
over activated carbon. The solution may be
concentrated, for example, by distillation.
The palladium(0) compounds prepared by the process
according to the invention are also storage-stable and
can be handled under air, generally at temperatures up
to 30°C, in some cases up to 60°C and higher. They
typically have a metal content of 0.01% by weight to
40% by weight, preferably of 0.01% by weight to 30% by
weight, more preferably of 0.01% by weight to 20% by
weight, and a total halogen content of not more than 5%
by weight, preferably not more than 2% by weight, more
preferably not more than 1% by weight.
The palladium(O) compounds may, either alone or as a
mixture, be used as a precursor for catalysts for
organic chemistry reactions, by mixing them with a
ligand, for example phosphines, phosphites,
phosphonites, amines, alkenes, thioethers, alkynes or
carbenes, each of which may also be generated in situ.
This mixture may be used directly as a catalyst, or the

resulting complex may be obtained in substance by
customary processes from the mixture.
The inventive palladium(0) compounds may, either alone
or as a mixture, also be used directly without using
additional ligands as a catalyst precursor in organic
chemistry reactions.
The examples which follow are intended to further
illustrate the invention. However, the invention is not
restricted to these illustrative embodiments, but
rather is defined by the claims.
EXAMPLES
General method for the synthesis of palladium(0)
compounds
One equivalent of sodium tetrachloropalladate was
dissolved in methanol. To this solution were added
8 equivalents of sodium hydrogencarbonate and
10 equivalents of a compound of the general formula I.
The solution was stirred for 4 hours. The methanol was
distilled off and the residue stirred over a desiccant
and activated carbon. The solids were filtered off and
the filtrate was concentrated by distillation.
Depending on the distillation conditions, stable
palladium solutions having palladium contents of 0.01
to 20% by weight were obtained.
According to this method, reaction mixtures were
prepared with the di- to tetraenes specified in
Table 1.
The palladium and chlorine content was determined by
means of ICP-OES after digestion or by wickbold
combustion.

Method for the synthesis of phosphine-diene-Pd(O)
complexes
One palladium equivalent of the palladium solution
obtained from the reaction of 1,1,3,3-tetramethyl-1,3-
divinyldisiloxane was admixed with one equivalent of a
5% by weight ethereal tricyclohexylphosphine solution.
The resulting precipitate is filtered off and dried.
The product was identified by means of 1H, 31P and 13C
NMR spectroscopy as tricyclohexylphosphine-(1,1,3,3-
tetramethyl-1,3-divinyldisiloxane)-Pd(0) complex.
Table 1

We Claim:
1. Process for preparing a palladium (0) compound, comprising reaction of a
palladium compound PdX2, PdX4, M2PdX4, M2PdX6, (NH3)2PdX2 and
[Pd(NH3)4]X2, where M is a cation (e.g.: a hydrogen atom, an alkali metal (in
particular Na+ or K+) or NR*4+ (R* = hydrogen, C1-4 alkyl)) and X is an anion
(e.g.: halogen (in particular chlorine), NO3-) with one or more compounds of
the general formula I in the presence of a base:

in which
each A is independently a CR7R8-radical where one of the A radicals may be
oxygen, sulphur, an NR9 group or an SiR10R11 group, or where the A radicals
may be a constituent of a 5- to 20-membered ring system,
x is an integer from 2 to 4, and
each R1 to R11 is independently selected from R, OR, halogen, CN, NO2, NR2,
C(O)R, C(O)OR, OC(O)R, CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3,
Si(OR)3, SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2, PO3H,
PO(OR)2, in which R is a hydrogen atom, a substituted or unsubstituted C1-10-
alkenyl radical, or a substituted or unsubstituted, optionally heteroatom-
containing C5-10-aryl radical, and the substitutents on the alkyl radical or the
alkenyl radical are selected from haloge, O-C1-10-alkyl,

phenyl, O-phenyl, OH, NH2 and halogenated C1-10-
alkyl, and the substituents on the aryl radical
are selected from halogen, C1-10-alkyl, O-C1-10-
alkyl, phenyl, O-phenyl, OH, NH2 and halogenated
CC1-10-alkyl, where R2 and R3 and/or R5 and R6
together with the carbon atoms bonded thereto may
be a constituent of a 5- to 7-membered, optionally
heteroatom-containing ring.
2. Process according to Claim 1, wherein x is 3.
3. Process according to either of the preceding
claims, wherein R1 to R6 are each hydrogen atoms.
4. Process according to any of the preceding claims,
wherein -(A)X- is a group of the formula
-CH2-X-CH2- and -X- is selected from -0-, -S-,
-SiR2-, -NR- and -NC(O)R, and R is hydrogen, a C1-4
-alkyl radical or a halogenated C1-4-alkyl.
5. Process according to Claim 1, wherein the compound
of the general formula I is selected from
1,5-hexadiene, 1,6-heptadiene and 1,7-octadiene.
6. Process according to Claim 1, wherein the compound
of the general formula I is selected from diallyl
ether, diallylamine, diallylmethylamine,
diallylethylamine, N-acetyldiallylamine, diallyl
sulphide, diallylsilane, diallyldimethylsilane,
difurfuryl ether, difurfurylamine, bis(thiophen-2-
ylmethyl)amine, difurfuryl sulphide and 1,3-
divinylbenzene.
Process for preparing a Palladium(0) compound,
comprising reaction of a palladium compound with
one or more compounds of the general formula II in
the presence of a base:

in which:
n is an integer from 3 to 20,
each R13 to R15 is independently selected from R,
OR, halogen, CN, NO2, NR2, C(O)R, C(O)OR, OC(O)R,
CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si (R) 3, Si (OR) 3,
SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2,
PO3H, PO(OR)2, in which R is hydrogen, a
substituted or unsubstituted C1-10-alkyl radical, a
substituted or unsubstituted, mono- or
polyunsaturated C1-10-alkenyl radical, or a
substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical, and the
substituents on the alkyl radical or the alkenyl
radical are selected from halogen, O-C1-10-alkyl,
phenyl, O-phenyl, OH, NH2 and halogenated C1-10-
alkyl, and the substituents on the aryl radical
are selected from halogen, C1-10-alkyl, O-C1-10-
alkyl, phenyl, O-phenyl, OH, NH2 and halogenated
C1-10-alkyl, where R13 and R14 together with the
carbon atoms bonded thereto may be a constituent
of a 5- to 7-membered, optionally heteroatom-
containing ring, and
each R12 is independently selected from hydrogen, a
hydroxyl group, a substituted or unsubstituted
C1-10-alkyl radical, an -O-C1-10-alkyl radical (where
the alkyl radical may be substituted or
unsubstituted), a substituted or unsubstituted,
mono- or polyunsaturated C1-10-alkenyl radical or a
substituted or unsubstituted, optionally

heteroatom-containing C5-10-aryl radical, where the
substituents are as defined for R13 and R15.
8. Process according to Claim 7, wherein n is an
integer from 3 to 6 and each R12 is independently a
C1-4-alkyl radical or a halogenated C1-4-alkyl
radical.
9. Process for preparing a Palladium(0) compound
comprising reaction of a palladium compound with
one or more compounds of, the general formula III
in the presence of a base
Term-O-{ [Si(R16) (CR19CR17R1S|)O]v[Si(R20)20]W}-Term (III)
in which
v and w are each independently 0 or an integer of
from 1 to 1000 and v+w is from 0 to 1000,
each R16 is independently selected from hydrogen, a
hydroxyl group, a substituted or unsubstituted
C1-10-alkyl radical, an -O-C1-10-alkyl radical (where
the alkyl radical may be substituted or
unsubstituted), a substituted or unsubstituted,
mono- or polyunsaturated C1-10-alkenyl radical or a
substituted or urisubstituted, optionally
heteroatom-containing C1-10-aryl radical, where the
substituents are as defined for R17 and R19,
each R17 to R19 is independently selected from R,
OR, halogen, CN, NO2, WR2, C(O)R, C(O)OR, OC(O)R,
CONR2, NHCO2R, NHCOR, CH=CH-CO2R, Si(R)3, Si(OR)3,
SiR(OR)2, SiR2(OR), SO3R, SO2R, SOR, SR, PR2, POR2,
PO3H, PO(OR)2, in which R is a hydrogen atom, a
substituted or unsubstituted C1-10-alkyl radical, a
substituted or unsubstituted, mono- or
polyunsaturated C1-10-alkenyl radical, or a
substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical, and the
substituents on the alkyl radical or the alkenyl
radical are selected from halogen, O-C1-10-alkyl,
phenyl, O-phenyl, OH, NH2 and halogenated C1-10-
alkyl, and the substituents on the aryl radical
are selected from halogen, C1-10-alkyl, O-CC1-10-
alkyl, phenyl, O-phenyl, OH, NH2 and halogenated
C1-10-alkyl, where R17 and R19 together with the
carbon atoms bonded thereto may be a constituent
of a 5- to 7-membered, optionally heteroatom-
containing ring,
each R20 is independently selected from hydrogen, a
hydroxyl group, a substituted or unsubstituted
C1-10-alkyl radical, an -O-C1-10-alkyl radical (where
the alkyl radical may be substituted or
unsubstituted), a substituted or unsubstituted,
mono- or polyunsaturated C1-10-alkenyl radical, or
a substituted or unsubstituted, optionally
heteroatom-containing C5-10-aryl radical, where the
substituents are as defined for R17 and R19, and
each Term is independently (R16)2(CR17R18CR19) Si- or
(R16)3Si-.
10. Process according to Claim 9, wherein the compound
of the general formula (III) has the general
formula:
Term-O-[Si(R16)(CR19CR17R18)O]V-Term
where R16 to R19, Term and v are each as defined in
Claim 9.
11. Process according to any of Claims 7 to 10,
wherein the compound of the general formula II or
III is selected from divinyldisiloxane, 1,1,3,3-
tetramethyl-1,3-divinyldisiloxane, 1,1,3,3-tetra-
methyl-1,3-dithien-2-yldisiloxane, 1,1,3,3-tetra-
methoxy-1,3-divinyldisiloxane, 1,3-dimethyl-1,3-
divinyldisiloxanediol, 1,3,5, 7-tetravinyl-1,3,5,7-
tetramethylcyclotetrasiloxane and 1, 3, 5-trimethyl-
1,3,5-trivinylcyclotrisiloxane.
12. Process according to any of Claims 7 to 10,
wherein the compound of the general formula II or
III is selected from 1,1,3,3-tetramethyl-1,3-
divinyldisiloxane, 1,3,5, 7-tetravinyl-l,3,5,7-
tetramethylcyclotetrasiloxane and 1, 3, 5-trimethyl-
1,3,5-trivinylcyclotrisiloxane.
13. Process according to any of the preceding claims,
wherein the palladium compound is selected from
PdX2, PdX4, M2PdX4, M2PdX6, (NH3)2PdX2 and
[Pd(NH3) 4]X2, where M is a hydrogen atom, an alkali
metal or NR*4+ (R* = hydrogen, C1-4-alkyl) and X is
a halogen or NO3-.
14. Process according to Claim 13, wherein X is
chlorine.
15. Process according to any of the preceding claims,
wherein the reaction is effected in the presence
of a solvent or solvent mixture.
16. Process according to Claim 15, wherein the solvent
is selected from water, C1-6-alcohols and C2-6-
ethers and mixtures thereof.
17. Process according to any of the preceding claims,
wherein the base is selected from alkali metal.

salts, alkaline earth metal salts and ammonium salts (ammonium as NR4+ where R = H
or C1-4-alkyl) of carbonates, hydrogencarbonates and hydroxides.
18. Process according to any of the preceding claims, also comprising a
purification step.
19. Process according to any of the preceding claims, also comprising a
concentration step.
20. Process according to any of the preceding claims, wherein the reaction of the
palladium compound with one or more compounds of the general formula I,
II or III is carried out in the presence of one or more ligands other than the
compound of the general formula I, II or III.
21. Process according to any of the preceding claims, further comprising the
reaction of the palladium compound with one or more ligands other than the
compound of the general formula I, II or III.
22. Palladium(O) compound obtainable by a process according to claim 1,
wherein the compound of the general formula I is hexadiene or octadiene.
23. Palladium(O) compound obtainable by a process according to claim 7,
wherein the compound of the general formula II, is l,3,5,7-tetravinyl-l,3,5,7-
tetramethylcyclotetrasiloxane.
The present invention relates to a process for
preparing a palladium(0) compound, comprising the
reaction of a palladium compound with one or more
compounds of the general formula I, II or III in the
presence of a base:
Term-O-{[Si(R16) (CR19CR17R18) O] v [Si (R20) 2O] w} -Term (III).
The Palladium(0) compounds are suitable as homogeneous
catalysts, as a precursor for preparing homogeneous
catalysts, as a precursor for preparing homogeneous
catalysts in situ or as a precursor for preparing
heterogeneous catalysts.

Documents:

00755-kolnp-2005-abstract.pdf

00755-kolnp-2005-claims.pdf

00755-kolnp-2005-description complete.pdf

00755-kolnp-2005-form 1.pdf

00755-kolnp-2005-form 2.pdf

00755-kolnp-2005-form 3.pdf

00755-kolnp-2005-form 5.pdf

00755-kolnp-2005-international publication.pdf

755-kolnp-2005-granted-abstract.pdf

755-kolnp-2005-granted-claims.pdf

755-kolnp-2005-granted-correspondence.pdf

755-kolnp-2005-granted-description (complete).pdf

755-kolnp-2005-granted-drawings.pdf

755-kolnp-2005-granted-form 1.pdf

755-kolnp-2005-granted-form 18.pdf

755-kolnp-2005-granted-form 2.pdf

755-kolnp-2005-granted-form 26.pdf

755-kolnp-2005-granted-form 3.pdf

755-kolnp-2005-granted-form 5.pdf

755-kolnp-2005-granted-letter patent.pdf

755-kolnp-2005-granted-reply to examination report.pdf

755-kolnp-2005-granted-specification.pdf

abstract-00755-kolnp-2005.jpg

« Previous Patent

Next Patent »

Patent Number

217406

Indian Patent Application Number

00755/KOLNP/2005

PG Journal Number

13/2008

Publication Date

28-Mar-2008

Grant Date

26-Mar-2008

Date of Filing

29-Apr-2005

Name of Patentee

UMICORE AG & CO, KG

Applicant Address

RODENBACHER CHAUSSEE 4, 63457 HANAU-WOLFGANG, GERMANY.

Inventors:

#	Inventor's Name	Inventor's Address
1	KAYSER , BERND	KARLSTRASSE 114, 80335, MUNCHEN, GERMANY.
2	BRIEL , O LIVER	GELEISTRASSE 81, 63967 OFFENBACH, GERMANY.
3	KLEINWATCHER, INGO	SENDGASSE 51, 63457 HANU, GERMANY.
4	KARCH, RALF	KATHE-KOLLITZ-STRASSE 24, 63801 KLEINOSTHEIM

PCT International Classification Number

C07F 15/00

PCT International Application Number

PCT/EP2003/012085

PCT International Filing date

2003-10-30

PCT Conventions:

#	PCT Application Number	Date of Convention	Priority Country
1	102 50 910.8	2002-10-31	Germany