| Title of Invention | AN APPARATUS FOR CHEMICALLY PROCESSING A SEMICONDUCTOR WAFER |
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| Abstract | A semiconductor wafer processing and analysis apparatus (20) includes a processing micro chamber (22) for closely receiving a semiconductor wafer (27) therein. The chamber may be opened for loading and removing the semiconductor wafers and then closed for processing of the wafer wherein chemical reagents and other fluids are introduced into the chamber. Small clearances are provided between the upper surface, the lower surfaces, and the perimeter edge of the wafer and the corresponding portions of the processing chamber. A high-speed collection system is provided for collecting and removing the spent reagents and fluids from the chamber for either on-line or off-line analysis or for waste treatment. |
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0120-chenp-2006 complete specification as granted.pdf
120-CHENP-2006 CORRESPONDENCE OTHERS.pdf
120-CHENP-2006 CORRESPONDENCE PO.pdf
120-CHENP-2006 POWER OF ATTORNEY.pdf
| Patent Number | 234195 | ||||||||
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| Indian Patent Application Number | 120/CHENP/2006 | ||||||||
| PG Journal Number | 24/2009 | ||||||||
| Publication Date | 12-Jun-2009 | ||||||||
| Grant Date | 08-May-2009 | ||||||||
| Date of Filing | 10-Jan-2006 | ||||||||
| Name of Patentee | WEN, Sophia | ||||||||
| Applicant Address | 16262 S.E. Bluff Road, Sandy, OR 97055, | ||||||||
Inventors:
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| PCT International Classification Number | H01L 21/00 | ||||||||
| PCT International Application Number | PCT/US2004/018516 | ||||||||
| PCT International Filing date | 2004-06-10 | ||||||||
PCT Conventions:
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